Abstract:
When using micro-resonant structures, it is possible to use the same source of charged particles to cause multiple resonant structures to emit electromagnetic radiation. This reduces the number of sources that are required for multi-element configurations, such as displays with plural rows (or columns) of pixels. In one such embodiment, at least one deflector is placed in between first and second resonant structures. After the beam passes by at least a portion of the first resonant structure, it is directed to a path such that it can be directed towards the second resonant structure. The amount of deflection needed to direct the beam toward the second resonant structure is based on the amount of deflection, if any, that the beam underwent as it passed by the first resonant structure. This process can be repeated in series as necessary to produce a set of resonant structures in series.
Abstract:
An electronic receiver for decoding data encoded into electromagnetic radiation (e.g., light) is described. The light is received at an ultra-small resonant structure. The resonant structure generates an electric field in response to the incident light and light received from a local oscillator. An electron beam passing near the resonant structure is altered on at least one characteristic as a result of the electric field. Data is encoded into the light by a characteristic that is seen in the electric field during resonance and therefore in the electron beam as it passes the electric field. Alterations in the electron beam are thus correlated to data values encoded into the light.
Abstract:
A charged particle beam including charged particles (e.g., electrons) is generated from a charged particle source (e.g., a cathode or scanning electron beam). As the beam is projected, it passes between plural alternating electric fields. The attraction of the charged particles to their oppositely charged fields accelerates the charged particles, thereby increasing their velocities in the corresponding (positive or negative) direction. The charged particles therefore follow an oscillating trajectory. When the electric fields are selected to produce oscillating trajectories having the same (or nearly the same) as a multiple of the frequency of the emitted x-rays, the resulting photons can be made to constructively interfere with each other to produce a coherent x-ray source.
Abstract:
A display of wavelength elements can be produced from resonant structures that emit light (and other electromagnetic radiation having a dominant frequency higher than that of microwave) when exposed to a beam of charged particles, such as electrons from an electron beam. An exemplary display with three wavelengths per pixel utilizes three resonant structures per pixel. The spacings and lengths of the fingers of the resonant structures control the light emitted from the wavelength elements. Alternatively, multiple resonant structures per wavelength can be used as well.
Abstract:
We describe a process to produce ultra-small structures of between ones of nanometers to hundreds of micrometers in size, in which the structures are compact, nonporous and exhibit smooth vertical surfaces. Such processing is accomplished with pulsed electroplating techniques using ultra-short pulses in a controlled and predictable manner.
Abstract:
We describe a new method for etching patterns in silver, copper, or gold, or other plate metal thin films. A pattern of a hard mask is placed onto the surface of the thin film, followed by a step of reactive ion etching using a plasma formed using a gas feed of some combination of some amounts of methane (CH4) and hydrogen (H2), and some or no amount of Argon (Ar). The areas of silver, copper or gold not covered by the hard mask are etched while the hard mask protects those areas that will form the raised portions of thin film in the final structure.
Abstract translation:我们描述了一种蚀刻银,铜或金或其他板金属薄膜图案的新方法。 将硬掩模的图案放置在薄膜的表面上,然后使用使用一些组合的一些量的甲烷(CH 3 SO 4)的气体进料形成的等离子体进行反应离子蚀刻的步骤 )和氢(H 2 H 2),以及一些或不含氩量(Ar)。 蚀刻没有被硬掩模覆盖的银,铜或金的区域,而硬掩模保护在最终结构中将形成薄膜的凸起部分的那些区域。
Abstract:
A Mireau interference microscope is corrected for spherical and other aberrations induced by the beamsplitter and mirror support windows by incorporating a cover glass correcting-objective lens. The support windows for the beamsplitter and mirror have a combined thickness within the adjustment range of the cover glass correcting-objective lens.
Abstract:
A conveyor is disclosed suitable for conveying objects such as containers to a processing station. The conveyor includes a plurality of connected links, and at least one gripping member extending from each of the links. Each gripping member is movable relative to its respective link for gripping a container by the neck of the container. A guide structure is disposed on the link for mating a component of the processing station to the neck of the container for processing the container. The processing station may be a filler such as a rotary filler, a capper, or a rinser. Related individual links, conveying systems, and filler components are also disclosed.
Abstract:
An interference spectroscopy instrument provides simultaneous measurement of specular scattering over multiple wavelengths and angles. The spectroscopy instrument includes an interference microscope illuminated by Koehler illumination and a video camera located to image the back focal plane of the microscope's objective lens while the path-length difference is varied between the reference and object paths. Multichannel Fourier analysis transforms the resultant intensity information into specular reflectivity data as a function of wavelength. This multitude of measured data provides a more sensitive scatterometry tool having superior performance in the measurement of small patterns on semiconductor devices and in measuring overlay on such devices.
Abstract:
An aplanatic microlens consisting of a sphere which is less than one millimeters in diameter. The sphere is made of a transparent material and has a plane surface ground into it so that the radial distance from the center of the sphere to the nearest point on the plane surface is equal to the radius of the sphere divided by the ratio of the index of refraction of the transparent material and the index of refraction of the medium which will surround the lens in use.