SHEARING INTERFEROMETRY MEASUREMENT DEVICE FOR MICROSCOPY

    公开(公告)号:US20210302150A1

    公开(公告)日:2021-09-30

    申请号:US17262656

    申请日:2019-07-22

    Abstract: Object interference in biological samples generated by lateral shearing interference microscopes is addressed by a shearing microscope slide comprising a periodic structure having alternating reference and sample regions. In some embodiments, the reference regions are configured to provide references that remove sample overlap in a sheared microscopic measurement. A system for generating sheared microscopic measurements is also provided that comprises an inlet configured to receive a sample material, an outlet configured to release a portion of the sample material, and a periodic structure having a plurality of interleaved reference and sample channels. In some cases, the sample channels are configured to accommodate a flow of sample material from the inlet to the outlet and the reference channels are configured to provide references that remove sample overlap in a sheared microscopic measurement.

    ENCODER HEAD WITH A BIREFRINGENT LENS ELEMENT AND EXPOSURE SYSTEM UTILIZING THE SAME

    公开(公告)号:US20180181006A1

    公开(公告)日:2018-06-28

    申请号:US15889412

    申请日:2018-02-06

    Abstract: An encoder head configured for use with a lithographic exposure tool. The head is devoid of the multiplicity of optical corner-cubes and includes, instead, a single, geometrically substantially perfect cuboid of optically-isotropic material complemented, in operation, with a birefringent lens to form a contraption that, as a unit, splits a single beam of light delivered to the contraption into four measurement (sub-)beams of light (two in xz-plane, two in yz-plane) and causes each of measurement sub-beams to interact with the wafer-stage diffraction grating at the same location twice: upon the first pass by the grating and upon the second pass by the grating. The use of the contraption solves problems of (i) structural complexity of a conventional encoder head for use in an exposure tool, (ii) burdensome alignment of the multitude of optical prisms in the process of forming such encoder head, and (iii) cyclic non-linear errors associated with measurements involving conventional corner-cubes-based encoder heads while, at the same time, reducing the geometrical footprint of the encoder head. The contraption is complemented with a birefringent prismatic element positioned across the axis of the contraption between the cuboid and the birefringent lens.

    AUTOFOCUS SYSTEM AND METHOD
    46.
    发明申请

    公开(公告)号:US20180031368A1

    公开(公告)日:2018-02-01

    申请号:US15727814

    申请日:2017-10-09

    CPC classification number: G01B11/25 G01B11/0608 G03F7/70641

    Abstract: New and useful concepts for an autofocus system and method are provided. A basic concept uses fringe projection in an autofocus system and method. A further aspect provides spatial filtering concepts for the fringe projection concept. In yet another aspect, the fringe projection autofocus system and method is provided with temporal phase shifting using no moving parts. In a still further aspect, the fringe projection autofocus system and method is provided with unambiguous height measurement concepts.

    Autofocus system and method
    47.
    发明授权

    公开(公告)号:US09810530B2

    公开(公告)日:2017-11-07

    申请号:US14593190

    申请日:2015-01-09

    CPC classification number: G01B11/25 G01B11/0608 G03F7/70641

    Abstract: Autofocus system (AF) employing, in addition to specified optical units, fringe projection and fringe detection systems (FPS, FDS) and specifically-configured data processing system. AFS is configured to project with FPS a sinusoidal fringe pattern, formed by a pattern source, on a substrate and to image the so projected pattern from substrate onto optical detector with FDS to form optical image from which topology of the substrate is defined as substrate moves relative to the projected pattern. Pattern source may include diffraction grating oriented that the projected pattern is inclined relative to direction of substrate scanning Topology profile is corrected for tilt of substrate, Goos-Hanchen errors, and for fringe-pattern-induced errors outside a chosen spatial-frequency range. To reduce errors of topology profile, at least five values of phase difference are used. AFS is configured to define temporal phase shifting in optical image without using any moving parts in the AFS.

    INTERFEROMETRIC LEVEL SENSOR
    49.
    发明申请
    INTERFEROMETRIC LEVEL SENSOR 审中-公开
    液位传感器

    公开(公告)号:US20160025480A1

    公开(公告)日:2016-01-28

    申请号:US14808197

    申请日:2015-07-24

    CPC classification number: G01B9/02097 G01B2210/56

    Abstract: Interferometer system and method for use in a level sensor of an exposure apparatus and autofocus system employing same. Operating either at a single or multiple wavelengths, the interferometric system employs two diffraction orders, formed by diffraction grating of the system, as reference and sample beams and is structured to ensure that only light contained in one of the two orders interacts with a wafer under test, thereby ensuring that no interference fringes are projected onto the sample. The diffraction grating is positioned such that its grooves are nominally perpendicular to the direction of wafer scan. Based on measurement data representing interference between reference and sample beams at the detector, a determination of change in position of the wafer in the sample arm is made with increased sensitivity and/or resolution.

    Abstract translation: 用于曝光装置的液位传感器的干涉仪系统和方法以及采用该曝光装置的自动对焦系统。 干涉测量系统以单个或多个波长工作,采用由系统的衍射光栅形成的两个衍射级,作为参考和样品光束,并且被构造成确保仅两条命令之一中包含的光与下面的晶片相互作用 测试,从而确保样品上没有投影干涉条纹。 衍射光栅被定位成使得其凹槽名义上垂直于晶片扫描的方向。 基于表示在检测器处的​​参考光束和样品光束之间的干涉的测量数据,以提高的灵敏度和/或分辨率确定样品臂中晶片的位置变化。

    Rules for reducing the sensitivity of fringe projection autofocus to air temperature changes
    50.
    发明授权
    Rules for reducing the sensitivity of fringe projection autofocus to air temperature changes 有权
    降低边缘投影自动对焦对气温变化的敏感度的规则

    公开(公告)号:US09243901B2

    公开(公告)日:2016-01-26

    申请号:US13801961

    申请日:2013-03-13

    CPC classification number: G01B11/2527 G02B27/4255 G03F9/7026

    Abstract: Fringe projection autofocus systems are provided with variable pitch diffraction gratings or multiple diffraction gratings so that a reference beam and a measurement beam propagate along a common path. Alternatively, an input beam can be directed to a diffraction grating so that the selected diffraction orders propagate along a common path. In some examples, distinct spectral bands are used for reference and measurement beams.

    Abstract translation: 边缘投影自动对焦系统具有可变节距衍射光栅或多个衍射光栅,使得参考光束和测量光束沿着公共路径传播。 或者,输入光束可以被引导到衍射光栅,使得所选择的衍射级沿着公共路径传播。 在一些示例中,不同的光谱带用于参考和测量光束。

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