Abstract:
Object interference in biological samples generated by lateral shearing interference microscopes is addressed by a shearing microscope slide comprising a periodic structure having alternating reference and sample regions. In some embodiments, the reference regions are configured to provide references that remove sample overlap in a sheared microscopic measurement. A system for generating sheared microscopic measurements is also provided that comprises an inlet configured to receive a sample material, an outlet configured to release a portion of the sample material, and a periodic structure having a plurality of interleaved reference and sample channels. In some cases, the sample channels are configured to accommodate a flow of sample material from the inlet to the outlet and the reference channels are configured to provide references that remove sample overlap in a sheared microscopic measurement.
Abstract:
Prediction of a distribution of light in an illumination pupil of an illumination system includes identifying component(s) of the illumination system the adjustment of which affects this distribution and simulating the distribution based on a point spread function defined in part by the identified components. The point spread function has functional relationship with configurable setting of the illumination settings.
Abstract:
System and method for monitoring of performance of a mirror array of a digital scanner with a use of a lateral shearing interferometer (operated in either static or a phase-shifting condition) to either simply identify problematic pixels for further troubleshooting or measure the exact magnitude of the mirror's deformation.
Abstract:
Laser radar systems include a pentaprism configured to scan a measurement beam with respect to a target surface. A focusing optical assembly includes a corner cube that is used to adjust measurement beam focus. Target distance is estimated based on heterodyne frequencies between a return beam and a local oscillator beam. The local oscillator beam is configured to propagate to and from the focusing optical assembly before mixing with the return beam. In some examples, heterodyne frequencies are calibrated with respect to target distance using a Fabry-Perot interferometer having mirrors fixed to a lithium aluminosilicate glass-ceramic tube.
Abstract:
An encoder head configured for use with a lithographic exposure tool. The head is devoid of the multiplicity of optical corner-cubes and includes, instead, a single, geometrically substantially perfect cuboid of optically-isotropic material complemented, in operation, with a birefringent lens to form a contraption that, as a unit, splits a single beam of light delivered to the contraption into four measurement (sub-)beams of light (two in xz-plane, two in yz-plane) and causes each of measurement sub-beams to interact with the wafer-stage diffraction grating at the same location twice: upon the first pass by the grating and upon the second pass by the grating. The use of the contraption solves problems of (i) structural complexity of a conventional encoder head for use in an exposure tool, (ii) burdensome alignment of the multitude of optical prisms in the process of forming such encoder head, and (iii) cyclic non-linear errors associated with measurements involving conventional corner-cubes-based encoder heads while, at the same time, reducing the geometrical footprint of the encoder head. The contraption is complemented with a birefringent prismatic element positioned across the axis of the contraption between the cuboid and the birefringent lens.
Abstract:
New and useful concepts for an autofocus system and method are provided. A basic concept uses fringe projection in an autofocus system and method. A further aspect provides spatial filtering concepts for the fringe projection concept. In yet another aspect, the fringe projection autofocus system and method is provided with temporal phase shifting using no moving parts. In a still further aspect, the fringe projection autofocus system and method is provided with unambiguous height measurement concepts.
Abstract:
Autofocus system (AF) employing, in addition to specified optical units, fringe projection and fringe detection systems (FPS, FDS) and specifically-configured data processing system. AFS is configured to project with FPS a sinusoidal fringe pattern, formed by a pattern source, on a substrate and to image the so projected pattern from substrate onto optical detector with FDS to form optical image from which topology of the substrate is defined as substrate moves relative to the projected pattern. Pattern source may include diffraction grating oriented that the projected pattern is inclined relative to direction of substrate scanning Topology profile is corrected for tilt of substrate, Goos-Hanchen errors, and for fringe-pattern-induced errors outside a chosen spatial-frequency range. To reduce errors of topology profile, at least five values of phase difference are used. AFS is configured to define temporal phase shifting in optical image without using any moving parts in the AFS.
Abstract:
Laser radar systems include a pentaprism configured to scan a measurement beam with respect to a target surface. A focusing optical assembly includes a corner cube that is used to adjust measurement beam focus. Target distance is estimated based on heterodyne frequencies between a return beam and a local oscillator beam. The local oscillator beam is configured to propagate to and from the focusing optical assembly before mixing with the return beam. In some examples, heterodyne frequencies are calibrated with respect to target distance using a Fabry-Perot interferometer having mirrors fixed to a lithium aluminosilicate glass-ceramic tube.
Abstract:
Interferometer system and method for use in a level sensor of an exposure apparatus and autofocus system employing same. Operating either at a single or multiple wavelengths, the interferometric system employs two diffraction orders, formed by diffraction grating of the system, as reference and sample beams and is structured to ensure that only light contained in one of the two orders interacts with a wafer under test, thereby ensuring that no interference fringes are projected onto the sample. The diffraction grating is positioned such that its grooves are nominally perpendicular to the direction of wafer scan. Based on measurement data representing interference between reference and sample beams at the detector, a determination of change in position of the wafer in the sample arm is made with increased sensitivity and/or resolution.
Abstract:
Fringe projection autofocus systems are provided with variable pitch diffraction gratings or multiple diffraction gratings so that a reference beam and a measurement beam propagate along a common path. Alternatively, an input beam can be directed to a diffraction grating so that the selected diffraction orders propagate along a common path. In some examples, distinct spectral bands are used for reference and measurement beams.