METAL-SEMICONDUCTOR WAFER BONDING FOR HIGH-Q DEVICES
    48.
    发明申请
    METAL-SEMICONDUCTOR WAFER BONDING FOR HIGH-Q DEVICES 有权
    金属半导体波形焊接用于高Q器件

    公开(公告)号:US20150118819A1

    公开(公告)日:2015-04-30

    申请号:US14554718

    申请日:2014-11-26

    CPC classification number: H01L29/66174 H01G4/1272 H01G4/33 H01L28/40 H01L28/75

    Abstract: Methods and apparatus for metal semiconductor wafer bonding for high-Q devices are provided. An exemplary capacitor includes a first plate formed on a glass substrate, a second plate, and a dielectric layer. No organic bonding agent is used between the first plate and the glass substrate, and the dielectric layer can be an intrinsic semiconductor. A extrinsic semiconductor layer that is heavily doped contacts the dielectric layer. The dielectric and extrinsic semiconductor layers are sandwiched between the first and second plates. An intermetallic layer is formed between the first plate and the dielectric layer. The intermetallic layer is thermo compression bonded to the first plate and the dielectric layer. The capacitor can be coupled in a circuit as a high-Q capacitor and/or a varactor, and can be integrated with a mobile device.

    Abstract translation: 提供了用于高Q装置的金属半导体晶片接合的方法和装置。 示例性电容器包括形成在玻璃基板,第二板和介电层上的第一板。 在第一板和玻璃基板之间不使用有机粘合剂,并且电介质层可以是本征半导体。 重掺杂的非本征半导体层接触电介质层。 电介质和非本征半导体层夹在第一和第二板之间。 在第一板和电介质层之间形成金属间层。 金属间化合物层被热压接合到第一板和电介质层。 电容器可以作为高Q电容器和/或变容二极管耦合在电路中,并且可以与移动设备集成。

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