公开(公告)号：US07416541B2

公开(公告)日：2008-08-26

申请号：US11121291

申请日：2005-05-03

Applicant: Vadim Vladimirovich Yuzhakov ,  Faiz Feisal Sherman ,  Grover David Owens ,  Vladimir Gartstein

Inventor： Vadim Vladimirovich Yuzhakov ,  Faiz Feisal Sherman ,  Grover David Owens ,  Vladimir Gartstein

IPC: A61M5/32 ,  A61B17/20 ,  A61B17/32 ,  A61B17/34

CPC classification number: B81C99/0085 ,  A61M5/1723 ,  A61M37/0015 ,  A61M2037/0023 ,  A61M2037/003 ,  A61M2037/0053 ,  A61M2037/0061 ,  A61N1/30 ,  B81B2201/055

Abstract: Improved microneedle arrays are provided having a sufficiently large separation distance between each of the individual microneedles to ensure penetration of the skin while having a sufficiently small separation distance to provide high transdermal transport rates. A very useful range of separation distances between microneedles is in the range of 100-300 microns, and more preferably in the range of 100-200 microns. The outer diameter and microneedle length is also very important, and in combination with the separation distance will be crucial as to whether or not the microneedles will actually penetrate the stratum corneum of skin. For circular microneedles, a useful outer diameter range is from 20-100 microns, and more preferably in the range of 20-50 microns. For circular microneedles that do not have sharp edges, a useful length for use with interstitial fluids is in the range of 50-200 microns, and more preferably in the range of 100-150 microns; for use with other biological fluids, a useful length is in the range of 200 microns-3 mm, and more preferably in the range of 200-400 microns. For circular microneedles having sharp side edges, a useful length for use with interstitial fluids is in the range of 50-200 microns, and more preferably in the range of 80-150 microns; for use with other biological fluids, a useful length is again in the range of 200 microns-3 mm, and more preferably in the range of 200-400 microns. For solid microneedles having a star-shaped profile with sharp edges for its star-shaped blades, a useful length for use with interstitial fluids is in the range of 50-200 microns, and more preferably in the range of 80-150 microns; for use with other biological fluids, a useful length is again in the range of 200 microns-3 mm, and more preferably in the range of 200-400 microns, while the radius of each of its blades is in the range of 10-50 microns, and more preferably in the range of 10-15 microns.

公开(公告)号：US20080138582A1

公开(公告)日：2008-06-12

申请号：US11807764

申请日：2007-05-29

Applicant: Rajmohan Bhandari ,  Sandeep Negi ,  Florian Solzbacher ,  Richard A. Normann

Inventor： Rajmohan Bhandari ,  Sandeep Negi ,  Florian Solzbacher ,  Richard A. Normann

IPC: H01B13/00 ,  B32B3/00

CPC classification number: B81C1/00111 ,  A61M2037/0053 ,  A61N1/0551 ,  B81B2201/055 ,  Y10T428/24479

Abstract: Methods for wafer-scale fabrication of needle arrays can include mechanically modifying a wafer to produce a plurality of vertically-extending columns. The columns are etched to round and reshape the columns into substantially uniformly shaped needles. Needle arrays having needle width non-uniformity of less than about 3% and length non-uniformity of less than about 2% can be produced.

Abstract translation: 用于晶圆尺寸制造针阵列的方法可以包括机械地改变晶片以产生多个垂直延伸的柱。 将柱蚀刻成圆形并将柱重新形成基本均匀成形的针。 可以制造具有小于约3％的针宽不均匀性和小于约2％的长度不均匀性的针阵列。

公开(公告)号：US20070233016A1

公开(公告)日：2007-10-04

申请号：US11754368

申请日：2007-05-29

Applicant: Shih-Chi Kuo ,  Yu-Kon Chou

Inventor： Shih-Chi Kuo ,  Yu-Kon Chou

IPC: A61M5/32

CPC classification number: B81C1/00111 ,  A61B17/205 ,  A61M37/0015 ,  A61M2037/0053 ,  B81B2201/055 ,  Y10T29/302 ,  Y10T29/304 ,  Y10T29/308 ,  Y10T29/49982

Abstract: A microneedle array device and its fabrication method are provided. The microneedle array device comprises a supporting pad and a plurality of microneedles. Each microneedle has a top portion with a via thereon, thereby the microfluid may flow in or out. The intersection between the top portion and the inner tube of a microneedle forms a convex needle structure, and is almost perpendicular to the upper surface. For each microneedle, a hollow closed tube is formed between the top portion and the supporting pad. The fabrication method uses substrates with high transmittance and a plurality of convex area thereon as upper and lower caps, and applies a photolithography process to fabricate a microneedle array mold. It then sputters or electroplates metal material on the mold. The microneedle array is formed after having taken off the mold.

Abstract translation: 提供了一种微针阵列器件及其制造方法。 微针阵列装置包括支撑垫和多个微针。 每个微针具有顶部，其上具有通孔，从而微流体可以流入或流出。 微针的顶部和内管之间的交点形成凸针结构，并且几乎垂直于上表面。 对于每个微针，在顶部和支撑垫之间形成中空封闭的管。 该制造方法使用具有高透射率的衬底和其上的多个凸起区域作为上盖和下盖，并且应用光刻工艺来制造微针阵列模具。 然后将模具上的金属材料溅射或电镀。 在脱模后形成微针阵列。

公开(公告)号：US20070023386A1

公开(公告)日：2007-02-01

申请号：US11542974

申请日：2006-10-04

Applicant: Stanley Kravitz ,  David Ingersoll ,  Carrie Schmidt ,  Jeb Flemming

Inventor： Stanley Kravitz ,  David Ingersoll ,  Carrie Schmidt ,  Jeb Flemming

IPC: C23F1/00 ,  B44C1/22

CPC classification number: C23F1/00 ,  A61M37/0015 ,  A61M2037/0053 ,  B81B2201/055 ,  B81C1/00111 ,  C03C15/00 ,  C03C23/002 ,  C03C23/007

Abstract: An inexpensive and rapid method for fabricating arrays of hollow microneedles uses a photoetchable glass. Furthermore, the glass hollow microneedle array can be used to form a negative mold for replicating microneedles in biocompatible polymers or metals. These microneedle arrays can be used to extract fluids from plants or animals. Glucose transport through these hollow microneedles arrays has been found to be orders of magnitude more rapid than natural diffusion.

Abstract translation: 用于制造中空微针阵列的廉价且快速的方法使用可光取代玻璃。 此外，玻璃中空微针阵列可用于形成用于在生物相容性聚合物或金属中复制微针的负模。 这些微针阵列可用于从植物或动物中提取液体。 已经发现通过这些中空微针阵列的葡萄糖传输比自然扩散更快的数量级。

公开(公告)号：US20060202385A1

公开(公告)日：2006-09-14

申请号：US10505035

申请日：2003-11-10

Applicant: Yuan Xu ,  Chee Lim ,  Pei Ying Tan

Inventor： Yuan Xu ,  Chee Lim ,  Pei Ying Tan

IPC: B29C33/40

CPC classification number: B81C1/00111 ,  A61M37/0015 ,  A61M2037/003 ,  A61M2037/0046 ,  A61M2037/0053 ,  B29C33/3878 ,  B29C33/42 ,  B29C45/00 ,  B29C2045/0094 ,  B29L2031/7544 ,  B29L2031/756 ,  B81B2201/055 ,  B81C2201/034

Abstract: A master mould is made by wire cutting a plate in two or more directions to provide a base with an array of master mould needles protruding therefrom. The size and shape of the master mould needles can readily be varied by varying the angles of upward and downward cuts in the two or more directions. The master mould is used to make a secondary mould by hot embossing a secondary mould plate onto the master mould. This forms through-holes in the secondary mould. The secondary mould is plated with a layer of metal, which forms a microneedle array.

公开(公告)号：US20060015061A1

公开(公告)日：2006-01-19

申请号：US10994105

申请日：2004-11-19

Applicant: Shih-Chi Kuo ,  Yu-Kon Chou

Inventor： Shih-Chi Kuo ,  Yu-Kon Chou

IPC: A61B17/20

CPC classification number: B81C1/00111 ,  A61B17/205 ,  A61M37/0015 ,  A61M2037/0053 ,  B81B2201/055 ,  Y10T29/302 ,  Y10T29/304 ,  Y10T29/308 ,  Y10T29/49982

Abstract: A microneedle array device and its fabrication method are provided. The microneedle array device comprises a supporting pad and plural of microneedles. Each microneedle has a top portion with a via thereon, thereby the microfluid may flow in or out. The intersection between the top portion and the inner tube of a microneedle forms a convex needle structure, and is almost perpendicular to the upper surface. For each microneedle, a hollow closed tube is formed between the top portion and the supporting pad. The fabrication method uses the substrates with high transmittance and plural of convex area thereon as the upper and lower caps, and applies a photolithography process to fabricate a microneedle array mold. It then sputters or electroplates metal material on the mold. The microneedle array is formed after having taken off the mold. It is a simple fabrication process.

Abstract translation: 提供了一种微针阵列器件及其制造方法。 微针阵列装置包括支撑垫和多个微针。 每个微针具有顶部，其上具有通孔，从而微流体可以流入或流出。 微针的顶部和内管之间的交点形成凸针结构，并且几乎垂直于上表面。 对于每个微针，在顶部和支撑垫之间形成中空封闭的管。 该制造方法使用具有高透射率和多个凸起区域的基板作为上盖和下盖，并且应用光刻工艺来制造微针阵列模具。 然后将模具上的金属材料溅射或电镀。 在脱模后形成微针阵列。 这是一个简单的制作过程。

公开(公告)号：US20040260251A1

公开(公告)日：2004-12-23

申请号：US10462628

申请日：2003-06-17

Applicant: Industrial Technology Research Institute

Inventor： Kai-Cheng Chang ,  Guang-Chyeng Fan

IPC: A61M005/32

CPC classification number: B81C1/00111 ,  A61M37/00 ,  A61M37/0015 ,  A61M2037/0023 ,  A61M2037/003 ,  B81B2201/055

Abstract: The present invention is related to a flexible substrate structure for microneedle arrays and its manufacturing method, whose structure mainly comprising: tapered shape objects and flexible substrate. Wherein, structure of the tapered shape object is composed of a tip, sidewalls, and a base. Meanwhile, the flexible substrate winds tightly around sidewalls of tapered shape objects and is set up on, yet covers the base surface of tapered shape object which faces the tip of tapered shape object. Because the structure applies a flexible substrate along with tapered shape objects, hence, the fit-to-body capability is increased and allows thereof more appropriate for backside drug delivery, as well as sufficiently bring the characteristic of large-area manufacturing into full play.

Abstract translation: 本发明涉及一种用于微针阵列的柔性衬底结构及其制造方法，其结构主要包括：锥形形状物体和柔性衬底。 其中，锥形物体的结构由尖端，侧壁和基部构成。 同时，柔性基板紧紧地卷绕在锥形形状物体的侧壁周围，并且被设置在其上，同时覆盖面对锥形物体的尖端的锥形物体的基面。 由于该结构与锥形物体一起应用柔性基板，因此，适合身体的能力增加，并且允许其适合于背侧药物递送，并且充分地充分发挥了大面积制造的特征。

公开(公告)号：US06790372B2

公开(公告)日：2004-09-14

申请号：US10162848

申请日：2002-06-05

Applicant: Shuvo Roy ,  Aaron J. Fleischman

Inventor： Shuvo Roy ,  Aaron J. Fleischman

IPC: B61C100

CPC classification number: B81C1/00111 ,  A61M37/0015 ,  A61M2037/003 ,  A61M2037/0038 ,  A61M2037/0053 ,  B81B2201/055

Abstract: A microneedle array module is disclosed comprising a multiplicity of microneedles affixed to and protruding outwardly from a front surface of a substrate to form the array, each microneedle of the array having a hollow section which extends through its center to an opening in the tip thereof. A method of fabricating the microneedle array module is also disclosed comprising the steps of: providing etch resistant mask layers to one and another opposite surfaces of a substrate to predetermined thicknesses; patterning the etch resistant mask layer of the one surface for outer dimensions of the microneedles of the array; patterning the etch resistant mask layer of the other surface for inner dimensions of the microneedles of the array; etching unmasked portions of the substrate from one and the other surfaces to first and second predetermined depths, respectively; and removing the mask layers from the one and the other surfaces. One embodiment of the method includes the steps of: providing an etch resistant mask layer to the other surface of the substrate to a predetermined thickness; patterning the etch resistant mask layer of the other surface to define a reservoir region in the substrate; and etching away the unmasked reservoir region of the substrate to form a reservoir well in the other surface of the substrate. A layer of material may be provided to the other surface to enclose the reservoir well and a passageway is provided through the layer to the well region.

公开(公告)号：US06767341B2

公开(公告)日：2004-07-27

申请号：US09880377

申请日：2001-06-13

Applicant: Steve T. Cho

Inventor： Steve T. Cho

IPC: A61M532

CPC classification number: B81C1/00111 ,  A61B5/14514 ,  A61B5/150022 ,  A61B5/150221 ,  A61B5/150282 ,  A61B5/150748 ,  A61B5/15087 ,  A61B5/150969 ,  A61B5/150984 ,  A61B5/157 ,  A61M37/0015 ,  A61M2037/0023 ,  A61M2037/003 ,  A61M2037/0038 ,  A61M2037/0053 ,  B81B2201/055

Abstract: The present invention provides a microneedle incorporating a base that is broad relative to a height of the microneedle, to minimize breakage. The microneedle further includes a fluid channel and a beveled non-coring tip. Preferably arrays of such microneedles are fabricated utilizing conventional semiconductor derived micro-scale fabrication techniques. A dot pattern mask is formed on an upper surface of a silicon substrate, with each orifice of the dot pattern mask corresponding to a desired location of a microneedle. Orifices are formed that pass completely through the substrate by etching. A nitride pattern mask is formed to mask all areas in which a nitride layer is not desired. A nitride layer is then deposited on the bottom of the silicon substrate, on the walls of the orifice, and on the top of the silicon substrate around the periphery of the orifice. The nitride layer around the periphery of the orifice is offset somewhat, such that one side of the orifice has a larger nitride layer. Anisotropic etching is used to remove a substantial portion of the substrate, creating a plurality of angular, blunt, and generally pyramidal-shaped microneedles. A subsequent removal of the nitride layer, followed by an isotropic etching step, softens and rounds out the blunt angular microneedles, providing generally conical-shaped microneedles. The uneven nitride layer adjacent the orifice ensures that the microneedles will include a beveled tip. Such microneedle arrays are preferably incorporated into handheld diagnostic and drug delivery systems.

公开(公告)号：US20040126707A1

公开(公告)日：2004-07-01

申请号：US10329449

申请日：2002-12-27

Applicant: Industrial Technology Research Institute

Inventor： Ming-Yueh Liu ,  Heng-Chun Huang ,  Jauh-Jung Yang ,  Kun-Chih Pan

IPC: G03F007/00

CPC classification number: B81C1/00111 ,  A61B5/14514 ,  A61B5/150022 ,  A61B5/150282 ,  A61B5/150984 ,  A61M37/0015 ,  A61M2037/003 ,  A61M2037/0053 ,  B81B2201/055

Abstract: A method for manufacturing a 3-D high aspect-ratio microneedle array device, comprising steps of: providing a substrate, with a photoresist layer coated thereon; performing photolithography on the photoresist layer by using a gray-tone mask so as to form a patterned photoresist layer; performing high-selectivity etching on the patterned photoresist layer and the substrate by using inductively coupled plasma etching so as to transfer the pattern onto the substrate and form a structure; applying a material on the structure; and de-molding the structure from the substrate.

Abstract translation: 一种制造3-D高宽比微针阵列器件的方法，包括以下步骤：提供衬底，其上涂覆有光致抗蚀剂层; 通过使用灰色调掩模对光致抗蚀剂层进行光刻，以形成图案化的光致抗蚀剂层; 通过使用电感耦合等离子体蚀刻对图案化的光致抗蚀剂层和衬底进行高选择性蚀刻，以将图案转移到衬底上并形成结构; 在结构上施加材料; 以及从所述基底上去除所述结构。