Silica glass containing TiO2 and optical material for EUV lithography
    42.
    发明申请
    Silica glass containing TiO2 and optical material for EUV lithography 有权
    含二氧化硅的玻璃和用于EUV光刻的光学材料

    公开(公告)号:US20050245383A1

    公开(公告)日:2005-11-03

    申请号:US11174533

    申请日:2005-07-06

    Abstract: A silica glass containing TiO2, characterized in that the fluctuation of the refractive index (Δn) is at most 2×10−4 within an area of 30 mm×30 mm in at least one plane. A silica glass containing TiO2, characterized in that the TiO2 concentration is at least 1 mass %, and the striae pitch is at most 10 μm. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, and the fluctuation of the refractive index (Δn) is at most 2×10−4 in a plane perpendicular to the incident light direction. An optical material for EUV lithography, characterized in that it is made of a silica glass containing TiO2, wherein the TiO2 concentration is at least 1 mass %, and the difference between the maximum value and the minimum value of the TiO2 concentration is at most 0.06 mass % in a plane perpendicular to the incident light direction.

    Abstract translation: 含有TiO 2的二氧化硅玻璃,其特征在于,在30mm×30mm的区域内,折射率(Deltan)的波动至多为2×10 -4〜 飞机 含有TiO 2的二氧化硅玻璃,其特征在于TiO 2浓度为1质量%以上,条纹间距为10μm以下。 一种用于EUV光刻的光学材料,其特征在于其由含有TiO 2的二氧化硅玻璃制成,并且折射率(Deltan)的波动为至多2×10 -4 >垂直于入射光方向的平面。 一种用于EUV光刻的光学材料,其特征在于其由含有TiO 2的二氧化硅玻璃制成,其中TiO 2浓度为至少1质量%,并且差异 在垂直于入射光方向的平面中,TiO 2 2 浓度的最大值和最小值之间的浓度至多为0.06质量%。

    Method for making index-profiled optical device
    50.
    发明授权
    Method for making index-profiled optical device 失效
    制造折射率光学装置的方法

    公开(公告)号:US4620861A

    公开(公告)日:1986-11-04

    申请号:US794833

    申请日:1985-11-04

    Inventor: George E. Berkey

    Abstract: Glass preforms for optical fibers or the like having refractive index profiles which vary in stepped or graded fashion across the preform, are made from porous glass preforms by introducing a first dopant into the porous preform during manufacture, partially sintering the preform to selectively modify the internal surface area thereof, introducing a second vapor-infusible dopant into the selectively sintered preform to cause selective doping of the porous glass, and then consolidating the resulting doped preform to clear glass.

    Abstract translation: 用于具有折射率分布的折射率分布的玻璃预成型件在预制件中以阶梯或梯度方式变化,由多孔玻璃预制件制成,通过在制造期间将第一掺杂剂引入多孔预制件中,部分地烧结预成型件以选择性地修饰内部 将第二蒸气不可渗透的掺杂剂引入选择性烧结的预制件中以引起多孔玻璃的选择性掺杂,然后将所得到的掺杂预成型件固结成透明玻璃。

Patent Agency Ranking