QUARTZ GLASS MEMBER FOR PLASMA ETCHING
    6.
    发明申请
    QUARTZ GLASS MEMBER FOR PLASMA ETCHING 审中-公开
    用于等离子体蚀刻的QUARTZ玻璃成员

    公开(公告)号:US20110232847A1

    公开(公告)日:2011-09-29

    申请号:US12671903

    申请日:2008-07-24

    Abstract: Provided is a doped quartz glass member for plasma etching, which is used in a plasma etching process and is free from any problematic fluoride accumulation during use. The quartz glass member for plasma etching is used as a jig for semiconductor production in a plasma etching process, and includes at least two or more kinds of metal elements in a total amount of 0.01 wt % or more to less than 0.1 wt %, in which the metal elements are formed of at least one kind of a first metal element selected from metal elements belonging to Group 3B of the periodic table and at least one kind of a second metal element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids.

    Abstract translation: 提供了用于等离子体蚀刻的掺杂石英玻璃构件,其用于等离子体蚀刻工艺中,并且在使用期间没有任何有问题的氟化物积聚。 用于等离子体蚀刻的石英玻璃构件用作等离子体蚀刻工艺中的半导体制造的夹具,并且包括总量为0.01重量%以上至小于0.1重量%的至少两种以上的金属元素, 金属元素由选自属于周期表第3B族的金属元素中的至少一种第一金属元素和选自Mg,Ca,Sr等的至少一种第二金属元素形成, Ba,Sc,Y,Ti,Zr,Hf,镧系元素和锕系元素。

    Optical fiber with tin doped core-cladding interface
    10.
    发明授权
    Optical fiber with tin doped core-cladding interface 有权
    具有锡掺杂芯 - 包层界面的光纤

    公开(公告)号:US07493009B2

    公开(公告)日:2009-02-17

    申请号:US11753746

    申请日:2007-05-25

    Applicant: Daniel S. Homa

    Inventor: Daniel S. Homa

    Abstract: The present invention concerns an optical fiber 10 comprising a substantially pure silica glass core 12, a concentric tin-doped core/cladding interface region 14, and a concentric fluorine-doped depressed cladding layer 16. The tin-doped core/cladding interface region 14 comprises a low concentration gradient of tin dioxide, which advantageously results in a de minimis refractive index change, resistance to hydrogen incursion, and thermal stability of any fiber Bragg gratings written into the interface region 14.

    Abstract translation: 本发明涉及一种光纤10,其包括基本上纯的二氧化硅玻璃芯12,同心的锡掺杂的芯/包层界面区域14和同心的氟掺杂凹陷包层16.掺杂锡的芯/包层界面区域14 包括二氧化锡的低浓度梯度,其有利地导致写入界面区域14的任何光纤布拉格光栅的最小折射率变化,耐氢侵入性和热稳定性。

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