公开(公告)号：US20190062198A1

公开(公告)日：2019-02-28

申请号：US16061122

申请日：2016-12-16

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Michael HÜNERMANN ,  Achim HOFMANN ,  Heinz FABIAN ,  Matthias OTTER ,  Thomas KAYSER

IPC: C03C3/06 ,  C03B20/00 ,  C03B37/027 ,  C03B19/06 ,  C03C25/1065 ,  C03B37/012 ,  C03C13/04 ,  G02B6/02

CPC classification number: C03C3/06 ,  C03B19/066 ,  C03B19/108 ,  C03B19/1095 ,  C03B20/00 ,  C03B37/01211 ,  C03B37/027 ,  C03B2201/03 ,  C03B2201/04 ,  C03C1/026 ,  C03C13/045 ,  C03C25/1065 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2203/10 ,  C03C2213/00 ,  G02B6/02042 ,  G02B6/02395

Abstract: One aspect relates to a light guide comprising a jacket and one or more cores, wherein the jacket surrounds the cores. Each core has a refractive index profile perpendicular to the maximum extension of the core, wherein at least one refractive index nK of each refractive index profile is greater than the refractive index nM1 of the jacket. The jacket is made of silicon dioxide and has an OH content of less than 10 ppm, a chlorine content of less than 60 ppm, and an aluminium content of less than 200 ppb. One aspect also relates to a silicon dioxide granulate I, characterized by a chlorine content of less than 200 ppm and an aluminium content of less than 200 ppb, in each case based on the total weight of the silicon dioxide granulate I.

公开(公告)号：US09919948B2

公开(公告)日：2018-03-20

申请号：US15176259

申请日：2016-06-08

Applicant: Momentive Performance Materials Inc.

Inventor： Kipyung Ahn ,  Guangjun Xu ,  Martin Panchula ,  Samuel Conzone ,  Tianjun Rong ,  Konstantin S. Zuyev ,  Yen Zhou

IPC: C03C3/06 ,  A61J1/00 ,  B65D1/00 ,  C03C4/00 ,  C03B1/00 ,  A61J1/14 ,  C03C4/08 ,  C03C4/20 ,  C03B17/04

CPC classification number: C03C3/06 ,  A61J1/00 ,  A61J1/1468 ,  B65D1/00 ,  C03B1/00 ,  C03B17/04 ,  C03C4/00 ,  C03C4/085 ,  C03C4/20 ,  C03C2201/11 ,  C03C2201/23 ,  C03C2201/32 ,  C03C2201/3423 ,  C03C2201/42 ,  C03C2203/10 ,  C03C2204/00 ,  Y10T428/131

Abstract: A high silica glass composition comprising about 92 to about 99.9999 wt. % SiO2 and from about 0.0001 to about 8 wt. % of at least one dopant selected from Al2O3, CeO2, TiO2, La2O3, Y2O3, Nd2O3, other rare earth oxides, and mixtures of two or more thereof. The glass composition has a working point temperature ranging from 600 to 2,000° C. These compositions exhibit stability similar to pure fused quartz, but have a moderate working temperature to enable cost effective fabrication of pharmaceutical packages. The glass is particularly useful as a packaging material for pharmaceutical applications, such as, for example pre-filled syringes, ampoules and vials.

公开(公告)号：US09834468B2

公开(公告)日：2017-12-05

申请号：US14769382

申请日：2014-02-19

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Bodo Kuehn

IPC: F21V9/00 ,  G02B5/02 ,  G02C7/10 ,  G02F1/361 ,  G03B11/00 ,  C03C3/06 ,  C03B19/14 ,  C03B32/00 ,  G02B1/00 ,  G02B1/02 ,  C03B32/02 ,  C03C4/04 ,  C03C15/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B32/00 ,  C03B32/02 ,  C03B2201/07 ,  C03B2201/075 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/24 ,  C03C4/04 ,  C03C2201/11 ,  C03C2201/12 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/24 ,  C03C2203/54 ,  C03C2204/00 ,  G02B1/00 ,  G02B1/02 ,  Y02P40/57

Abstract: An optical component made of synthetic quartz glass includes a glass structure substantially free of oxygen defect sites and having a hydrogen content of 0.1×1016 to 1.0×1018 molecules/cm3, an SiH group content of less than 2×1017 molecules/cm3, a hydroxyl group content of 0.1 to 100 wt. ppm, and an Active temperature of less than 1070° C. The optical component undergoes a laser-induced change in the refractive index in response to irradiation by a radiation with a wavelength of 193 nm using 5×109 pulses with a pulse width of 125 ns and a respective energy density of 500 μJ/cm2 at a pulse repetition frequency of 2000 Hz. The change totals a first measured value M193 nm when measured using the applied wavelength of 193 nm and a second measured value M633 nm when measured using a measured wavelength of 633 nm. The ratio M193 nm/M633 nm is less than 1.7.

公开(公告)号：US09568818B2

公开(公告)日：2017-02-14

申请号：US14862707

申请日：2015-09-23

Applicant: Heraeus Quarzglas GmbH & Co. KG

Inventor： Stefan Ochs ,  Klaus Becker

IPC: C03C3/06 ,  G03F1/22 ,  C03B19/06 ,  C03C3/04 ,  C03B19/14 ,  C03C23/00 ,  C03B32/00 ,  G03F7/00

CPC classification number: G03F1/22 ,  C03B19/06 ,  C03B19/14 ,  C03B19/1453 ,  C03B19/1461 ,  C03B32/00 ,  C03B2201/075 ,  C03B2201/12 ,  C03B2201/23 ,  C03B2201/42 ,  C03C3/04 ,  C03C3/06 ,  C03C21/007 ,  C03C23/00 ,  C03C23/007 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54 ,  G03F1/24 ,  G03F1/60 ,  G03F7/00

Abstract: A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.

Abstract translation: 用于EUV光刻的共同掺杂钛和氟的二氧化硅玻璃毛坯的制造方法包括（a）通过含硅和钛的前体物质的火焰水解制备TiO 2 -SiO 2烟炱体，（b）氟化TiO 2 -SiO2烟灰体，形成氟掺杂的TiO 2 -SiO 2烟炱体，（c）在含水蒸气的气氛中处理氟掺杂的TiO 2 -SiO 2烟炱体以形成调节的烟灰体，（d） 烟灰体形成空白。 空白样品厚度为10mm时，在400〜700nm的波长范围内具有至少60％的内透射率，10〜100wt。范围内的平均OH含量。 ppm，平均氟含量在2500至10,000重量％的范围内。 ppm。 钛在氧化形式Ti3 +和Ti4 +中存在于坯料中。

公开(公告)号：US20150376049A1

公开(公告)日：2015-12-31

申请号：US14766276

申请日：2014-02-04

Applicant: HERAEUS QUARZGLAS GMBH & CO. KG

Inventor： Stephan THOMAS ,  Klaus BECKER ,  Stefan OCHS

IPC: C03C3/06 ,  C03B25/02 ,  C03B19/14

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B19/1469 ,  C03B25/02 ,  C03B32/00 ,  C03B2201/21 ,  C03B2201/23 ,  C03B2201/42 ,  C03C2201/21 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/52 ,  G02B5/0891 ,  G03F7/70316 ,  G03F7/70958

Abstract: A blank of TiO2—SiO2 glass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc. The TiO2—SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920° C. and 970° C. a dependence expressed as the differential quotient dTzc/dTf of its zero crossing temperature Tzc on the fictive temperature Tf of less than 0.3.

Abstract translation: 用于EUV光刻的用于镜面基板的TiO 2 -SiO 2玻璃的空白对于适应以优化热膨胀系数的进展以及因此也是过零点温度Tzc的进展的需求很低。 TiO 2 -SiO 2玻璃具有在920℃和970℃之间的范围内的假想温度Tf的平均值。表示为其过零点温度Tzc的差分商dTzc / dTf对虚构温度Tf的依赖关系 小于0.3。

公开(公告)号：US08329604B2

公开(公告)日：2012-12-11

申请号：US12351998

申请日：2009-01-12

Applicant: Yasutomi Iwahashi ,  Akio Koike

Inventor： Yasutomi Iwahashi ,  Akio Koike

IPC: C03C3/06 ,  C03C3/04

CPC classification number: C03B19/1415 ,  C03B19/1461 ,  C03B2201/12 ,  C03B2201/42 ,  C03C3/06 ,  C03C2201/12 ,  C03C2201/23 ,  C03C2201/42 ,  C03C2203/40 ,  C03C2203/54

Abstract: A silica glass containing TiO2, which has a fictive temperature of at most 1,200° C., a F concentration of at least 100 ppm and a coefficient of thermal expansion of 0±200 ppb/° C. from 0 to 100° C.A process for producing a silica glass containing TiO2, which comprises a step of forming a porous glass body on a target quartz glass particles obtained by flame hydrolysis of glass-forming materials, a step of obtaining a fluorine-containing porous glass body, a step of obtaining a fluorine-containing vitrified glass body, a step of obtaining a fluorine-containing formed glass body and a step of carrying out annealing treatment.

Abstract translation: 含有TiO 2的二氧化硅玻璃，其假想温度为至多1200℃，F浓度为至少100ppm，热膨胀系数为0±200ppb /℃，为0〜100℃。 含有TiO 2的二氧化硅玻璃的制造方法，其包括在通过玻璃形成材料的火焰水解得到的目标石英玻璃粒子上形成多孔玻璃体的工序，得到含氟多孔玻璃体的工序， 获得含氟玻璃化玻璃体，获得含氟成形玻璃体的步骤和进行退火处理的步骤。

公开(公告)号：US20120291488A1

公开(公告)日：2012-11-22

申请号：US13558698

申请日：2012-07-26

Applicant: Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

Inventor： Tetsuji Ueda ,  Michinari Ohuchi ,  Hiroyuki Nishimura ,  Akira Fujinoki ,  Masahiro Nakatsuka ,  Hidetsugu Yoshida

IPC: C03C4/12 ,  C03C21/00 ,  C03B20/00

CPC classification number: C03B19/1438 ,  C03B19/1453 ,  C03B2201/07 ,  C03B2201/23 ,  C03B2201/40 ,  C03C3/06 ,  C03C4/0071 ,  C03C4/085 ,  C03C4/12 ,  C03C23/0095 ,  C03C2201/23 ,  C03C2201/40 ,  C03C2203/44

Abstract: It is an object of the present invention to provide a copper-containing silica glass which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength of 400 nm or less, and which is excellent in long term stability even in the high output use. The copper-containing silica glass is made to have copper of from 5 wtppm to 200 wtppm, which emits fluorescence having a peak in a wavelength range of from 520 nm to 580 nm under irradiation of ultraviolet light with a wavelength ranging from 160 nm to 400 nm, and in which an internal transmittance per 2.5 mm thickness at a wavelength of 530 nm is 95% or more.

Abstract translation: 本发明的目的是提供一种在400nm以下的紫外线照射下发射波长范围为520nm〜580nm的荧光的含铜石英玻璃，其为 即使在高产量使用方面，长期稳定性也优异。 含铜二氧化硅玻璃被制成具有5重量ppm至200重量ppm的铜，其在波长范围为160nm至400nm的紫外线照射下发射波长范围为520nm至580nm的峰值的荧光 nm，并且其中在波长530nm处每2.5mm厚的内部透射率为95％以上。

公开(公告)号：US20120213685A1

公开(公告)日：2012-08-23

申请号：US13459624

申请日：2012-04-30

Applicant: Ryusuke MORITA ,  Takuya NAKAGAWA ,  Kei IWATA ,  Masaaki TAKATA

Inventor： Ryusuke MORITA ,  Takuya NAKAGAWA ,  Kei IWATA ,  Masaaki TAKATA

IPC: C01B33/12 ,  C03B20/00

CPC classification number: C03C3/06 ,  C03B19/1453 ,  C03B2201/03 ,  C03B2201/04 ,  C03C4/0085 ,  C03C2201/21 ,  C03C2201/23 ,  G03F1/50 ,  G03F7/70958 ,  Y02P40/57

Abstract: The present invention relates to an optical member for deep ultraviolet having a wavelength of 250 nm or shorter, containing a synthetic silica glass which does not substantially contain a halogen element, has a maximum OH group content of less than 10 ppm by weight, has contents of ODC (oxygen deficient centers) and E-prime center of each less than 1×1014 cm−3, does not substantially contain SiH and peroxy linkage, and has a fictive temperature of 1,050° C. or lower.

Abstract translation: 本发明涉及一种波长为250nm以下的深紫外线用光学构件，其含有基本上不含卤素元素的合成石英玻璃，其OH基含量的最大值小于10重量ppm，含有 的ODC（缺氧中心）和E-prime中心各自小于1×1014cm-3，基本上不含有SiH和过氧键，并且具有1050℃或更低的假想温度。

公开(公告)号：US08211817B2

公开(公告)日：2012-07-03

申请号：US12440683

申请日：2007-09-11

Applicant: Kazuyoshi Arai ,  Tsutomu Takahata ,  Shinkichi Hasimoto ,  Masahito Uchida ,  Nobusuke Yamada ,  Yoshinori Harada ,  Hideharu Horikoshi

Inventor： Kazuyoshi Arai ,  Tsutomu Takahata ,  Shinkichi Hasimoto ,  Masahito Uchida ,  Nobusuke Yamada ,  Yoshinori Harada ,  Hideharu Horikoshi

IPC: C03C3/06 ,  C03C10/16 ,  C03B27/012 ,  C03B19/01 ,  C03B19/00

CPC classification number: C03C4/0085 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C03C3/06 ,  C03C4/10 ,  C03C2201/23 ,  C03C2201/50 ,  C03C2201/54 ,  Y02P40/57

Abstract: Fused silica glass having an internal transmittance of UV with 245 nm wavelength, being at least 95% at 10 mm thickness, a OH content of not larger than 5 ppm, and a content of Li, Na, K, Mg, Ca and Cu each being smaller than 0.1 ppm. Preferably the glass has a viscosity coefficient at 1215° C. of at least 1011.5 Pa·s; and a Cu ion diffusion coefficient of not larger than 1×10−10 cm2/sec in a depth range of greater than 20 μm up to 100 μm, from the surface, when leaving to stand at 1050° C. in air for 24 hours. The glass is made by cristobalitizing powdery silica raw material; then, fusing the cristobalitized silica material in a non-reducing atmosphere. The glass exhibits a high transmittance of ultraviolet, visible and infrared rays, has high purity and heat resistance, and exhibits a reduced diffusion rate of metal impurities, therefore, it is suitable for various optical goods, semiconductor-production apparatus members, and liquid crystal display production apparatus members.

Abstract translation: 具有245nm波长的UV的内部透射率，10mm厚度至少95％，OH含量不大于5ppm，Li，Na，K，Mg，Ca和Cu的含量的熔融石英玻璃 小于0.1ppm。 优选地，玻璃的1215℃下的粘度系数至少为1011.5Pa·s; 在大于20μm至100μm的深度范围内的Cu离子扩散系数不大于1×10 -10 cm 2 / sec，在1050℃在空气中放置24小时时， 。 玻璃由粉状二氧化硅原料碎片化制成; 然后将非平衡二氧化硅材料在非还原气氛中熔融。 该玻璃的紫外线，可见光和红外线的透射率高，纯度高，耐热性高，金属杂质的扩散速度降低，因此适用于各种光学制品，半导体制造装置部件和液晶 展示生产设备成员。

公开(公告)号：US08136372B2

公开(公告)日：2012-03-20

申请号：US13106165

申请日：2011-05-12

Applicant: Michael A Mueller ,  Michael Thomas Murtagh

Inventor： Michael A Mueller ,  Michael Thomas Murtagh

IPC: C03B31/00 ,  C03B33/00 ,  C03B32/00 ,  C03B37/00 ,  C03B19/06

CPC classification number: C03C3/06 ,  C03C4/0085 ,  C03C2201/22 ,  C03C2201/23 ,  C03C2203/54 ,  G03F7/70958

Abstract: A method of making a fused silica article having a combined concentration of protium and deuterium in a range from about 1×1016 molecules/cm3 up to about 6×1019 molecules/cm3. In some embodiments, deuterium is present in an amount greater than its natural isotopic abundance. The method includes the steps of providing a fused silica boule, diffusing at least one of protium and deuterium into the boule, and annealing the boule to form the fused silica article. A method of diffusing hydrogen into fused silica and a fused silica article loaded with hydrogen formed by the method are also described.

Abstract translation: 制备具有约1×10 16分子/ cm 3至多约6×10 19分子/ cm 3范围内的ium和氘的组合浓度的熔融二氧化硅制品的方法。 在一些实施方案中，氘的存在量大于其天然同位素丰度。 该方法包括以下步骤：提供熔融二氧化硅焦耳，将钚和氘中的至少一种扩散到该原子核中，以及对该坯进行退火以形成熔融二氧化硅制品。 还描述了将氢扩散到熔融二氧化硅中的方法和通过该方法形成的负载有氢的熔融二氧化硅制品。