公开(公告)号：US20130273478A1

公开(公告)日：2013-10-17

申请号：US13835154

申请日：2013-03-15

Applicant: CANON KABUSHIKI KAISHA

Inventor： Kentaro Sano ,  Masato Muraki ,  Akira Miyake ,  Yoshikiyo Yui

IPC: H01J3/12

CPC classification number: H01J3/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121

Abstract: The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

Abstract translation: 本发明提供了一种发射带电粒子束的带电粒子光学系统，该系统包括静电透镜，以及沿着静电透镜的光轴与静电透镜相对的栅格电极，并配置为在合成中形成静电场 其中所述栅极与所述静电透镜相对的所述电极表面与所述静电透镜在所述光轴方向上具有距所述静电透镜的距离随着所述静电透镜的位置而变化的距离 电极表面。

公开(公告)号：US20130256555A1

公开(公告)日：2013-10-03

申请号：US13850626

申请日：2013-03-26

Applicant: NUFLARE TECHNOLOGY, INC.

Inventor： Takahito NAKAYAMA

IPC: H01J3/12

CPC classification number: H01J3/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/304 ,  H01J37/3174 ,  H01J2237/30433 ,  H01J2237/31776

Abstract: A shaping offset adjustment method, comprising: checking a reference point formed by an overlap of first and second shaping apertures included in a charged particle beam drawing apparatus; changing a position of the first shaping aperture by deflecting a charged particle beam so that an overlap area of the first and second shaping apertures has a predetermined shot size; measuring a current value of the charged particle beam passing through the overlap area; performing fitting on a relationship between the shot size and the corresponding current value using a cubic polynomial to calculate coefficients of the cubic polynomial achieving best fit; and correcting a shaping offset amount using the calculated coefficients of the cubic polynomial.

Abstract translation: 一种成形偏移调整方法，包括：检查由包含在带电粒子束描绘装置中的第一和第二成形孔的重叠形成的参考点; 通过偏转带电粒子束来改变第一成形孔的位置，使得第一和第二成形孔的重叠区域具有预定的射出尺寸; 测量通过重叠区域的带电粒子束的电流值; 使用三次多项式对拍摄尺寸和对应的当前值之间的关系进行拟合，以计算实现最佳拟合的三次多项式的系数; 以及使用所计算的三次多项式的系数来校正整形偏移量。

公开(公告)号：US06855945B1

公开(公告)日：2005-02-15

申请号：US10350705

申请日：2003-01-27

Applicant: Stephen H. Silder

Inventor： Stephen H. Silder

IPC: G21K7/00 ,  H01J3/12 ,  H01J37/09 ,  G21K1/00 ,  H01J29/48

CPC classification number: H01J37/09 ,  G21K1/02 ,  H01J3/12 ,  H01J2237/28

Abstract: A thin flat disc with an orifice or orifices to size and control electron and other charged particulate beams. The disc is made of electrically conductive chemical vapor deposition (CVD) diamond. In addition the disc contains one or more high precision fine to ultra-fine orifices.

Abstract translation: 一个具有孔口或孔口的薄平盘，用于调整和控制电子和其他带电粒子束。 该盘由导电化学气相沉积（CVD）金刚石制成。 此外，光盘还包含一个或多个高精度的超细微孔。

公开(公告)号：US5661295A

公开(公告)日：1997-08-26

申请号：US504708

申请日：1995-07-20

Applicant: Atsushi Fukui ,  Kanji Nishii ,  Kenji Takamoto ,  Masami Ito

Inventor： Atsushi Fukui ,  Kanji Nishii ,  Kenji Takamoto ,  Masami Ito

IPC: G01B11/00 ,  G01D5/38 ,  G02B5/18 ,  G02B27/42 ,  G03F9/00 ,  G01B9/02 ,  H01J3/12

CPC classification number: G03F9/70 ,  G01D5/38

Abstract: An optical encoder includes: a light source; a first grating plate having a first diffraction grating for diffracting a light beam emitted from the light source; a second grating plate having a second diffraction grating for further diffracting the light beam diffracted by the first diffraction grating; a reflector for reflecting the light beam from the second grating plate so as to allow the light beam to reenter the second grating plate; and a light-receiving portion for receiving the light beam reflected by the reflector and successively diffracted by the second and first grating plates, wherein a diffraction angle of plus and minus first-order diffracted light beams of the first diffraction grating is substantially equal to that of the plus and minus first-order diffracted light beams of the second diffraction grating, and the light-receiving portion generates an electric signal in accordance with the amount of the plus and minus first-order diffracted light beams of the first diffraction grating.

Abstract translation: 光学编码器包括：光源; 第一光栅板，具有用于衍射从光源发射的光束的第一衍射光栅; 第二光栅板，具有用于进一步衍射由第一衍射光栅衍射的光束的第二衍射光栅; 用于反射来自第二光栅板的光束以使光束重新进入第二光栅板的反射器; 以及光接收部分，用于接收由反射器反射并被第二和第一光栅板连续衍射的光束，其中第一衍射光栅的正，负一级衍射光束的衍射角基本上等于 第二衍射光栅的正，负一级衍射光束，并且光接收部分根据第一衍射光栅的正，负一级衍射光束的量产生电信号。

公开(公告)号：US4823003A

公开(公告)日：1989-04-18

申请号：US73754

申请日：1987-07-13

Applicant: George C. King ,  Frank H. Read

Inventor： George C. King ,  Frank H. Read

IPC: H01J37/153 ,  H01J3/12 ,  H01J49/06 ,  H01J49/20 ,  H01J49/22 ,  H01J49/48 ,  H01J40/00 ,  H01J47/00

CPC classification number: H01J49/22 ,  H01J3/12 ,  H01J49/06 ,  H01J49/20 ,  H01J49/48

Abstract: A charged particle optical system, e.g. an energy or mass analyzer or a lens system, has a plurality of corrector electrodes (20 to 23) spaced apart across a particle beam passing from a monoenergetic source (4) to a focus (6) and dividing the beam into individual portions with central trajectories (30,31,32) the connector electrodes being electrically biassed to deflect the particles of the beam so as to reduce the aberration caused by portions with central trajectories intersecting the optical axis at different distances from the desired focus.

公开(公告)号：US4303864A

公开(公告)日：1981-12-01

申请号：US88224

申请日：1979-10-25

Applicant: Albert V. Crewe ,  David A. Kopf

Inventor： Albert V. Crewe ,  David A. Kopf

IPC: H01J3/12 ,  H01J37/153 ,  G21K1/08 ,  H01J3/14 ,  H01J3/26

CPC classification number: B82Y15/00 ,  H01J3/12 ,  H01J37/153

Abstract: A means is provided for compensating for spherical aberration in charged particle beam devices. The means includes a sextupole positioned between two focusing lenses.

Abstract translation: 提供了用于补偿带电粒子束装置中的球面像差的装置。 该装置包括位于两个聚焦透镜之间的六极。

公开(公告)号：US4200794A

公开(公告)日：1980-04-29

申请号：US958657

申请日：1978-11-08

Applicant: Sterling P. Newberry ,  John R. Burgess

Inventor： Sterling P. Newberry ,  John R. Burgess

IPC: H01J3/12 ,  H01J3/18 ,  H01J9/02 ,  H01J29/18 ,  H01J29/46 ,  H01J29/62 ,  H01J29/74 ,  H01J29/80 ,  G21K1/08 ,  G21K5/00

CPC classification number: H01J9/02 ,  H01J29/803

Abstract: A combined fine focusing micro lens array and micro deflector assembly for use in electron beam tubes of the fly's eye type is provided. The assembly comprises a fine focusing micro lens array sub-assembly formed from a plurality of spaced-apart stacked parallel thin planar apertured silicon semiconductor lens plates each having an array of micro lens aperture openings. The lens plates each have highly conductive surfaces and are secured to glass rods for holding the plates in stacked parallel spaced-apart relationship with the apertures axially aligned in parallel. A micro deflector assembly is adjacent to the micro lens array sub-assembly. A micro deflector element axially aligned with each respective fine focusing lens element serves for deflecting an electron beam passing through along orthogonal x-y directional axes of movement normal to the electron beam path. The deflector elements are comprised by two orthogonally arrayed sets of parallel spaced-apart deflector bars with alternate bars of each set of deflector bars being interconnected electrically for common connection to a respective source of fine x-y deflection potential.The thin planar apertured silicon lens plates comprising the micro lens array are held together in stacked parallel assembled relationship by spaced-apart glass support rods whose longitudinal axes extend at right angles to the plates and to which the planar silicon lens plates are secured at their periphery. The two orthogonally arrayed sets of parallel spaced-apart deflection bars forming the sets of micro-deflector elements likewise preferably comprise parallel plates or bars of polycrystalline silicon having a highly conductive metalized surface. The micro deflector bars likewise are held in assembled spaced-apart parallel relationship by respective sets of spaced-apart parallel supporting glass rods whose longitudinal axes extend in a plane parallel to the plane of the deflector bars but at right angles thereto and to which the ends of the deflector bars are thermally bonded. The fine focusing micro lens array and micro deflector sub-assembly thus comprised, are secured together in assembled relation by additional glass support rods being disposed about the outer peripheries of the micro lens and micro deflector sub-assemblies and being secured thereto by thermal bonding such as by fusion.

公开(公告)号：US3599025A

公开(公告)日：1971-08-10

申请号：US3599025D

申请日：1968-08-14

Applicant: LJUBOV DMITRIEVNA AXENOVA

Inventor： AXENOVA LJUBOV DMITRIEVNA

IPC: H01J29/62 ,  H01J31/28 ,  H01J3/12

CPC classification number: H01J29/624

Abstract: An image orthicon tube is provided with a photocathode and a target spaced therefrom. Interposed therebetween is an accelerating electrode and a further electrode interposed between the accelerating electrode and the photocathode. The accelerating electrode is supported opposite the photocathode by a distance equivalent to the longitudinal length of the further electrode. The further electrode is maintained at the same potential as that of the photocathode.