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    Electrostatic corrector
    2.
    发明授权
    Electrostatic corrector 有权
    静电校正器

    公开(公告)号：US08723134B2

    公开(公告)日：2014-05-13

    申请号：US12914252

    申请日：2010-10-28

    Applicant: Roland Janzen

    Inventor： Roland Janzen

    IPC: H01J37/153

    CPC classification number: H01J37/153 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/26 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/1516 ,  H01J2237/1532

    Abstract: A correction device for a charged particle beam device for decreasing, correcting or inverting (that is adjusting) the spherical aberration of a charged particle beam is described. The correction principle is similar to that of common multipole-Correctors. But unlike common devices of that kind this new correction device gets along entirely with plane apertures having specially shaped holes in order to supply the multipoles required for correction and is therefore predestined for miniaturization and the use in multi column devices.

    Abstract translation: 描述了用于减少，校正或反转（即调整）带电粒子束的球面像差的带电粒子束装置的校正装置。 校正原理与普通多极校正器相似。 但是与这种常见的装置不同，这种新的校正装置完全与具有特殊形状的孔的平面孔相交，以便提供校正所需的多极，因此被预定为用于小型化和在多列装置中的使用。

    Charged particle optical system, drawing apparatus, and method of manufacturing article
    3.
    发明授权
    Charged particle optical system, drawing apparatus, and method of manufacturing article 失效
    带电粒子光学系统，拉丝装置和制造方法

    公开(公告)号：US08716672B2

    公开(公告)日：2014-05-06

    申请号：US13835154

    申请日：2013-03-15

    Applicant: Canon Kabushiki Kaisha

    Inventor： Kentaro Sano ,  Masato Muraki ,  Akira Miyake ,  Yoshikiyo Yui

    IPC: H01J3/14 ,  H01J3/12 ,  H01J1/46

    CPC classification number: H01J3/12 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/12 ,  H01J37/3177 ,  H01J2237/1205 ,  H01J2237/121

    Abstract: The present invention provides a charged particle optical system which emits a charged particle beam, the system including an electrostatic lens, and a grid electrode opposed to the electrostatic lens along an optical axis of the electrostatic lens, and configured to form an electrostatic field in cooperation with the electrostatic lens, wherein the grid electrode is configured such that an electrode surface, opposed to the electrostatic lens, of the grid electrode has a distance, from the electrostatic lens in a direction of the optical axis, which varies with a position in the electrode surface.

    Abstract translation: 本发明提供了一种发射带电粒子束的带电粒子光学系统，该系统包括静电透镜，以及沿着静电透镜的光轴与静电透镜相对的栅格电极，并配置为在合成中形成静电场 其中所述栅极与所述静电透镜相对的所述电极表面与所述静电透镜在所述光轴方向上具有距所述静电透镜的距离随着所述静电透镜的位置而变化的距离 电极表面。

    Multiple beam charged particle optical system
    4.
    发明授权
    Multiple beam charged particle optical system 有权
    多光束带电粒子光学系统

    公开(公告)号：US08648318B2

    公开(公告)日：2014-02-11

    申请号：US13071225

    申请日：2011-03-24

    Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    IPC: H01J37/317 ,  H01J37/147 ,  H01J37/26

    CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

    Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

    Focused Charged Particle Column for Operation at Different Beam Energies at a Target
    5.
    发明申请
    Focused Charged Particle Column for Operation at Different Beam Energies at a Target 有权
    聚焦带电粒子柱在目标不同光束能量下运行

    公开(公告)号：US20130327952A1

    公开(公告)日：2013-12-12

    申请号：US13490650

    申请日：2012-06-07

    Applicant: Mostafa Maazouz ,  Jonathan H. Orloff

    Inventor： Mostafa Maazouz ,  Jonathan H. Orloff

    IPC: G21K5/04

    CPC classification number: H01J37/153 ,  H01J37/04 ,  H01J37/12 ,  H01J37/21 ,  H01J2237/047 ,  H01J2237/04924 ,  H01J2237/12 ,  H01J2237/121 ,  H01J2237/31749

    Abstract: A charged particle column having improved performance at multiple beam energies. The column employs a four-element objective lens to enable improved beam focusing performance at both high and low beam energies at a target, with differing focus voltage configurations for different beam energies. By changing the voltages applied to the four electrodes of the objective lens, different focusing conditions may be rapidly configured, enabling rapid toggling between optimized imaging and optimized processing of a target.

    Abstract translation: 带电粒子柱在多光束能量下具有改进的性能。 该列采用四元件物镜，以在目标的高和低光束能量下实现改进的光束聚焦性能，对于不同的光束能量具有不同的聚焦电压配置。 通过改变施加到物镜的四个电极的电压，可以快速地配置不同的聚焦条件，使得能够在优化的成像和目标的优化处理之间快速切换。

    METHOD AND APPARATUS FOR CONTROLLING AN ELECTROSTATIC LENS ABOUT A CENTRAL RAY TRAJECTORY OF AN ION BEAM
    7.
    发明申请
    METHOD AND APPARATUS FOR CONTROLLING AN ELECTROSTATIC LENS ABOUT A CENTRAL RAY TRAJECTORY OF AN ION BEAM 有权
    用于控制静电镜的方法和装置关于离子束的中心射线

    公开(公告)号：US20120168637A1

    公开(公告)日：2012-07-05

    申请号：US12981096

    申请日：2010-12-29

    Applicant: Svetlana Radovanov ,  Peter L. Kellerman ,  Frank Sinclair ,  Robert C. Lindberg

    Inventor： Svetlana Radovanov ,  Peter L. Kellerman ,  Frank Sinclair ,  Robert C. Lindberg

    IPC: H01J3/14

    CPC classification number: H01J37/12 ,  H01J37/15 ,  H01J37/3171 ,  H01J2237/121 ,  H01J2237/151

    Abstract: A method of controlling deflection of a charged particle beam in an electrostatic lens includes establishing a symmetrical electrostatic lens configuration comprising a plurality of electrodes disposed at unadjusted positions that are symmetric with respect to the central ray trajectory with applied unadjusted voltages that create fields symmetric with respect to the central ray trajectory. A symmetric electric field is calculated corresponding to the set of unadjusted voltages. A plurality of lower electrodes is arranged at adjusted positions that are asymmetric with respect to the central ray trajectory. A set of adjusted voltages is obtained for the plurality of lower electrodes, wherein the set of adjusted voltages corresponds to a set of respective potentials of the symmetric electric field at respective adjusted asymmetric positions. The adjusted voltages are applied to the asymmetric lens configuration when the charged particle beam passes therethrough.

    Abstract translation: 控制带电粒子束在静电透镜中的偏转的方法包括建立对称的静电透镜配置，其包括设置在相对于中心射线轨迹对称的未调整位置的多个电极，所施加的未调节电压产生对称的场 到中心射线轨迹。 对应于未调整电压组的对称电场。 多个下电极被布置在相对于中心射线轨迹不对称的调整位置处。 对于多个下电极获得一组调整的电压，其中所述一组调整的电压对应于在各自调整的非对称位置处的对称电场的各个电位的集合。 当带电粒子束通过时，经调整的电压施加到非对称透镜构型上。

    Multiple beam charged particle optical system
    8.
    发明授权
    Multiple beam charged particle optical system 有权
    多光束带电粒子光学系统

    公开(公告)号：US08134135B2

    公开(公告)日：2012-03-13

    申请号：US11880872

    申请日：2007-07-23

    Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    IPC: H01J37/302 ,  H01J37/04

    CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

    Abstract: The invention relates to a multiple beam charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. In further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

    Abstract translation: 本发明涉及一种多束带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 在进一步的阐述中，透镜与限流孔结合，相对于所述结构的透镜对准，所述透镜中由所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM
    9.
    发明申请
    MULTIPLE BEAM CHARGED PARTICLE OPTICAL SYSTEM 有权
    多束光束粒子光学系统

    公开(公告)号：US20110163244A1

    公开(公告)日：2011-07-07

    申请号：US13050875

    申请日：2011-03-17

    Applicant: Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    Inventor： Pieter Kruit ,  Yanxia Zhang ,  Martijn J. Van Bruggen ,  Stijn Willem Herman Karel Steenbrink

    IPC: H01J3/14

    CPC classification number: H01J37/12 ,  H01J37/153 ,  H01J2237/04924 ,  H01J2237/1205 ,  H01J2237/121 ,  H01J2237/317

    Abstract: The invention relates to a multiple be charged particle optical system, comprising an electrostatic lens structure with at least one electrode, provided with apertures, wherein the effective size of a lens field effected by said electrode at a said aperture is made ultimately small. The system may comprise a diverging charged particle beam part, in which the lens structure is included. The physical dimension of the lens is made ultimately small, in particular smaller than one mm, more in particular less than a few tens of microns. En further elaboration, a lens is combined with a current limiting aperture, aligned such relative to a lens of said structure, that a virtual aperture effected by said current limiting aperture in said lens is situated in an optimum position with respect to minimizing aberrations total.

    Abstract translation: 本发明涉及一种多带电粒子光学系统，其包括具有至少一个具有孔的电极的静电透镜结构，其中由所述孔处的所述电极实现的透镜场的有效尺寸最小化。 该系统可以包括发散的带电粒子束部分，其中包括透镜结构。 透镜的物理尺寸最终变小，特别是小于1mm，更特别地小于几十微米。 进一步阐述，透镜与限流孔结合，相对于所述结构的透镜对准，使得由所述透镜中的所述电流限制孔影响的虚拟孔位于最小化像差总数的最佳位置。

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