SI-TRACEABLE RYDBERG ATOM RADIOFREQUENCY POWER METER AND DETERMINING POWER OF RADIO FREQUENCY RADIATION

    公开(公告)号:US20200292606A1

    公开(公告)日:2020-09-17

    申请号:US16818330

    申请日:2020-03-13

    Abstract: A SI-traceable Rydberg atom radiofrequency power meter determines power of reference radiofrequency radiation and includes: a reference radiofrequency source that provides reference radiofrequency radiation; a vapor cell including: a pair of parallel-plate waveguides; a vapor cell wall including parallel opposing faces of the parallel-plate waveguides; and the vapor space physically bounded by the vapor cell wall to contain gas atoms in an optical overlap volume; and a transmission detector that receives the output light from the vapor cell and produces a transmission signal from the transmission detector for determination of power of the reference radiofrequency radiation, wherein the SI-traceable Rydberg atom radiofrequency power meter determines power of the reference radiofrequency radiation by electromagnetically induced transparency of the gas atoms in a Rydberg electronic state, the determination of power being traceable to the International System of Units (SI).

    APPARATUS FOR CRITICAL-DIMENSION LOCALIZATION MICROSCOPY

    公开(公告)号:US20200132437A1

    公开(公告)日:2020-04-30

    申请号:US16663959

    申请日:2019-10-25

    Abstract: Performing critical-dimension localization microscopy includes: subjecting a first dimensional member and a second dimensional member of a reference artifact to critical-dimension metrology, the first and second dimensional members, in combination, including a critical dimension and each independently providing optical contrast; determining a primary length of the critical dimension to be traceable to International System of Units meter; imaging in a calibrant optical field, by optical microscopy, the first dimensional member and the second dimensional member, the calibrant optical field disposed in an ocular optical field; determining, from the optical microscopy of the first dimensional member and the second dimensional member, a secondary length and a secondary length uncertainty of the critical dimension subjected to the critical-dimension metrology; and calibrating the calibrant optical field and the secondary length, to the primary length to establish traceability of the secondary length to the International System of Units meter to perform critical-dimension localization microscopy.

    DEFORMOMETER FOR DETERMINING DEFORMATION OF AN OPTICAL CAVITY OPTIC

    公开(公告)号:US20200041379A1

    公开(公告)日:2020-02-06

    申请号:US16520687

    申请日:2019-07-24

    Abstract: A deformometer includes: a cavity body; entry and exit optical cavity optics, such that the optical cavity produces filtered combined light from combined light; a first laser that provides first light; a second laser that provides second light; an optical combiner that: receives the first light; receives the second light; combines the first light and the second light; produces combined light from the first light and the second light; and communicates the combined light to the entry optical cavity optic; a beam splitter that: receives the filtered combined light; splits the filtered combined light; a first light detector in optical communication with the beam splitter and that: receives the first filtered light from the beam splitter; and produces a first cavity signal from the first filtered light; and a second light detector that: receives the second filtered light; and produces a second cavity signal from the second filtered light.

    DEFORMOMETER FOR DETERMINING DEFORMATION OF AN OPTICAL CAVITY OPTIC

    公开(公告)号:US20200041257A1

    公开(公告)日:2020-02-06

    申请号:US16520677

    申请日:2019-07-24

    Abstract: A deformometer includes: a cavity body; entry and exit optical cavity optics, such that the optical cavity produces filtered combined light from combined light; a first laser that provides first light; a second laser that provides second light; an optical combiner that: receives the first light; receives the second light; combines the first light and the second light; produces combined light from the first light and the second light; and communicates the combined light to the entry optical cavity optic; a beam splitter that: receives the filtered combined light; splits the filtered combined light; a first light detector in optical communication with the beam splitter and that: receives the first filtered light from the beam splitter; and produces a first cavity signal from the first filtered light; and a second light detector that: receives the second filtered light; and produces a second cavity signal from the second filtered light.

    MICROMECHANICAL VIBRASOLATOR
    57.
    发明申请

    公开(公告)号:US20190267965A1

    公开(公告)日:2019-08-29

    申请号:US16376533

    申请日:2019-04-05

    Abstract: A micromechanical vibrasolator isolates vibration of a micromechanical resonator and includes: phononic bandgap mirrors, monophones connected serially; phonophore arms in an alternating sequence of phonophore arm-monophone-phonophore arm; abutments in acoustic communication with the phononic bandgap mirrors; wherein the micromechanical resonator is interposed between the phononic bandgap mirrors with phononic bandgap mirror arranged in parallel on opposing sides of the micromechanical resonator arranged perpendicular to a direction of vibration of an in-plane vibrational mode of the micromechanical resonator.

    Process for making a self-aligned waveguide

    公开(公告)号:US10312568B2

    公开(公告)日:2019-06-04

    申请号:US15841920

    申请日:2017-12-14

    Inventor: David P. Pappas

    Abstract: A process for making a self-aligned waveguide includes: disposing a central conductor layer on a substrate; disposing a mask layer on the central conductor layer; forming a mask from the mask layer; removing a portion of the central conductor layer; forming an undercut interposed between substrate and the mask; forming a central conductor; disposing a ground conductor layer on the mask and the substrate; removing a portion of the ground conductor layer disposed on the mask; forming a ground plane conductor from the ground conductor layer in response to removing the portion of the ground conductor layer; and removing the mask to make the self-aligned waveguide in which the undercut provides self-alignment of each of the inner walls of the ground plane conductor to each of the sidewalls of the central conductor, and the ground plane conductor is electrically isolated from the central conductor.

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