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51.发明授权Method for generating extreme ultraviolet light and device for generating extreme ultraviolet light 有权用于产生极紫外光的方法和用于产生极紫外光的装置公开(公告)号：US09277635B2
公开(公告)日：2016-03-01
申请号：US14643782
申请日：2015-03-10
Applicant: GIGAPHOTON INC.
Inventor： Masato Moriya , Hideyuki Hayashi , Osamu Wakabayashi
IPC: H01G2/00 , H05G2/00 , H01J37/22 , H01J37/304
CPC classification number: H05G2/008 , H01J37/228 , H01J37/3045 , H01J2237/20292 , H05G2/005 , H05G2/006
Abstract: An extreme ultraviolet light generation device may comprise: a chamber provided with a through-hole; an introduction optical system configured to introduce the pulse laser beam into a first predetermined region inside the chamber through the through-hole; a target supply device configured to output the target toward the first predetermined region; a light source configured to irradiate a second predetermined region with light whose optical path in the second predetermined region has a transverse section that is longer along a direction perpendicular to a direction of movement of the target than along the direction of movement of the target, the second predetermined region including part of a trajectory of the target between the target supply device and the first predetermined region; and an optical sensor configured to detect light incident on the optical sensor from the second predetermined region to detect the target passing through the second predetermined region.
Abstract translation: 极紫外线发生装置可以包括：设置有通孔的室; 导入光学系统，被配置为通过所述通孔将所述脉冲激光束引入所述腔室内的第一预定区域; 目标供给装置，被配置为朝向所述第一预定区域输出所述目标; 光源，被配置为用第二预定区域的光线照射第二预定区域中的光路，沿着与目标的移动方向垂直的方向的垂直于目标的移动方向的横向部分具有横向部分， 所述第二预定区域包括所述目标供给装置和所述第一预定区域之间的所述目标的轨迹的一部分; 以及光学传感器，被配置为从所述第二预定区域检测入射在所述光学传感器上的光，以检测通过所述第二预定区域的目标。
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公开(公告)号：US09198273B2
公开(公告)日：2015-11-24
申请号：US14339172
申请日：2014-07-23
Applicant: GIGAPHOTON INC.
Inventor： Miwa Igarashi , Yukio Watanabe , Kouji Ashikawa , Norio Iwai , Osamu Wakabayashi
Abstract: An apparatus for generating extreme ultraviolet light may include a reference member, a chamber fixed to the reference member, the chamber including at least one window, a laser beam introduction optical system configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism configured to position the laser beam introduction optical system to the reference member.
Abstract translation: 用于产生极紫外光的装置可以包括参考构件，固定到参考构件的腔室，所述腔室包括至少一个窗口，激光束引入光学系统，其配置成通过至少一个外部供应的激光束 一个窗口，以及配置成将激光束引入光学系统定位到参考构件的定位机构。
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公开(公告)号：US09099836B2
公开(公告)日：2015-08-04
申请号：US13895242
申请日：2013-05-15
Applicant: GIGAPHOTON INC.
Inventor： Krzysztof Nowak , Masato Moriya , Osamu Wakabayashi
IPC: H01S3/00 , H01S3/23 , H01S3/067 , G03F7/20 , H01S3/032 , H01S3/036 , H01S3/038 , H01S3/041 , H01S3/0971 , H01S3/223
CPC classification number: H01S3/06758 , G03F7/70025 , G03F7/70033 , H01S3/005 , H01S3/0064 , H01S3/032 , H01S3/036 , H01S3/0387 , H01S3/041 , H01S3/0971 , H01S3/2232 , H01S3/2308 , H01S3/2325 , H01S3/2341
Abstract: A laser beam amplifier with high optical axis stability is provided. The laser beam amplifier includes: a container for accommodating a laser medium; a pair of electrodes for performing discharge in the laser medium to form an amplification region for a laser beam in the laser medium; and an optical system for forming an optical path between a first point, upon which the laser beam is incident, and a second point, from which the laser beam is outputted, such that the amplification region is located in the optical path between the first point and the second point, wherein the first point and the second point are conjugate to each other, and the laser beam incident upon the first point is amplified while passing through the amplification region at least twice and then transferred to the second point.
Abstract translation: 提供了具有高光轴稳定性的激光束放大器。 激光束放大器包括：用于容纳激光介质的容器; 一对电极，用于在激光介质中进行放电，以在激光介质中形成用于激光束的放大区域; 以及光学系统，用于在激光束入射的第一点和从其输出激光束的第二点之间形成光路，使得放大区域位于第一点之间的光路中 以及第二点，其中第一点和第二点彼此共轭，并且入射在第一点上的激光束在通过放大区域至少两次时被放大，然后被传送到第二点。
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公开(公告)号：US09039957B2
公开(公告)日：2015-05-26
申请号：US13770939
申请日：2013-02-19
Applicant: Gigaphoton Inc.
Inventor： Yutaka Shiraishi , Osamu Wakabayashi
Abstract: A target material refinement device may include a refinement tank to accommodate a target material, a heating section to heat the interior of the refinement tank, and an oxygen-atom removing section to remove oxygen atoms present in the target material.
Abstract translation: 目标材料细化装置可以包括用于容纳目标材料的精制罐，用于加热精制罐内部的加热部分和氧原子去除部分以除去存在于目标材料中的氧原子。
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公开(公告)号：US08921815B2
公开(公告)日：2014-12-30
申请号：US14083020
申请日：2013-11-18
Applicant: Gigaphoton Inc.
Inventor： Hiroshi Umeda , Osamu Wakabayashi
IPC: H05G2/00
Abstract: A target supply device may include a tank including a nozzle, a first electrode provided with a first through-hole and disposed so that a center axis of the nozzle is positioned within the first through-hole, a second electrode that includes a main body portion provided with a second through-hole and a collection portion formed in a cylindrical shape extending in a direction from a circumferential edge of the second through-hole toward the nozzle and that is disposed so that the center axis of the nozzle is positioned within the second through-hole, a third electrode disposed within the tank, and a heating unit configured to heat the second electrode.
Abstract translation: 目标供给装置可以包括：包括喷嘴的第一电极，设置有第一通孔的第一电极，并且设置成使得喷嘴的中心轴线位于第一通孔内;第二电极，包括主体部分 设置有第二通孔和收集部，所述第二通孔和收集部形成为从所述第二通孔的周缘方向朝向所述喷嘴的方向延伸的圆筒形状，并且所述收集部被配置为使得所述喷嘴的中心轴线位于所述第二通孔 通孔，设置在所述槽内的第三电极，以及构造成加热所述第二电极的加热单元。
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Patent Agency Ranking
公开(公告)号：US20140341239A1
公开(公告)日：2014-11-20
申请号：US14298563
申请日：2014-06-06
Applicant: Gigaphoton Inc.
Inventor： Masaya Yoshino , Takashi Onose , Osamu Wakabayashi
CPC classification number: H01S3/2308 , H01S3/0057 , H01S3/0092 , H01S3/10023 , H01S3/11 , H01S3/1305 , H01S3/134 , H01S3/1636 , H01S3/2251 , H01S3/2316 , H01S3/2325 , H01S3/2333 , H01S3/2366
Abstract: A laser system may include: a master oscillator configured to output pulsed laser light; an amplification device for amplifying the pulsed laser light from the master oscillator; a first timing detector configured to detect a first timing at which the master oscillator outputs the pulsed laser light; a second timing detector configured to detect a second timing at which the amplification device discharges; and a controller configured to, based on results of detection by the first timing detector and the second timing detector, control at least one of the first timing and the second timing so that the amplification device discharges when the pulsed laser light passes through a discharge space of the amplification device.
Abstract translation: 激光系统可以包括：主振荡器，被配置为输出脉冲激光; 用于放大来自主振荡器的脉冲激光的放大装置; 第一定时检测器，被配置为检测主振荡器输出脉冲激光的第一定时; 第二定时检测器，被配置为检测放大装置放电的第二定时; 以及控制器，被配置为基于所述第一定时检测器和所述第二定时检测器的检测结果，控制所述第一定时和所述第二定时中的至少一个，使得当所述脉冲激光通过放电空间时所述放大装置放电 的放大装置。
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公开(公告)号：US08698116B2
公开(公告)日：2014-04-15
申请号：US13873001
申请日：2013-04-29
Applicant: Gigaphoton Inc.
Inventor： Masato Moriya , Osamu Wakabayashi , Tamotsu Abe , Takashi Suganuma , Akira Endo , Akira Sumitani
IPC: G21K5/04
CPC classification number: G21K5/04 , G03F7/70191 , G03F7/70575 , G03F7/70858 , G03F7/70941 , G21K1/10 , H05G2/005 , H05G2/008
Abstract: An extreme ultraviolet light source apparatus using a spectrum purity filter capable of obtaining EUV light with high spectrum purity. The apparatus includes a chamber; a target supply unit for supplying a target material; a driver laser using a laser gas containing a carbon dioxide gas as a laser medium, for applying a laser beam to the target material to generate plasma; a collector mirror for collecting and outputting the extreme ultraviolet light radiated from the plasma; and a spectrum purity filter provided in an optical path of the extreme ultraviolet light, for transmitting the extreme ultraviolet light and reflecting the laser beam, the spectrum purity filter including a mesh having electrical conductivity and formed with an arrangement of apertures having a pitch not larger than a half of a shortest wavelength of the laser beam applied by the driver laser.
Abstract translation: 一种使用能够获得高光谱纯度的EUV光的光谱纯度滤光片的极紫外光源装置。 该装置包括一个室; 用于提供目标材料的目标供应单元; 使用包含二氧化碳气体的激光气体作为激光介质的激光激光器，用于向目标材料施加激光以产生等离子体; 用于收集和输出从等离子体辐射的极紫外光的收集器反射镜; 以及设置在极紫外光的光路中的光谱纯度滤光片，用于透射极紫外光并反射激光束，光谱纯度滤光器包括具有导电性的网格，并且形成为具有间距不大的孔 超过由驱动器激光器施加的激光束的最短波长的一半。
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58.发明申请公开(公告)号：US20130320232A1
公开(公告)日：2013-12-05
申请号：US13904117
申请日：2013-05-29
Applicant: Gigaphoton Inc.
Inventor： Tsukasa HORI , Junichi Fujimoto , Osamu Wakabayashi
IPC: G21K5/04
Abstract: An extreme ultraviolet light generation apparatus may include a droplet production device configured to produce a droplet of a target substance in a predetermined traveling direction, a first laser device configured to generate a first laser beam and irradiate the droplet with the first laser beam to diffuse the droplet, a second laser device configured to generate a second laser beam and irradiate the target substance diffused by irradiation of the first laser beam with the second laser beam to produce plasma of the diffused target substance and generate extreme ultraviolet light from the plasma of the target substance, and a beam shaping unit configured to elongate a beam spot of the first laser beam in the traveling direction of the droplet produced by the droplet production device.
Abstract translation: 极紫外线发生装置可以包括：液滴制造装置，其被配置为在预定的行进方向上产生目标物质的液滴;第一激光装置，其被配置为产生第一激光束并用第一激光束照射液滴， 液滴，第二激光装置，被配置为产生第二激光束并且通过用第二激光束照射第一激光束来照射被扩散的目标物质，以产生扩散目标物质的等离子体并从目标的等离子体产生极紫外光 以及光束整形单元，其被配置为在由液滴产生装置产生的液滴的行进方向上拉长第一激光束的束斑。
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59.发明授权公开(公告)号：US12216409B2
公开(公告)日：2025-02-04
申请号：US17817182
申请日：2022-08-03
Applicant: Gigaphoton Inc.
Inventor： Koichi Fujii , Osamu Wakabayashi
Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus emitting a pulse laser beam, an illumination optical system guiding the pulse laser beam to a reticle, a reticle stage moving the reticle, and a processor controlling emission of the pulse laser beam and movement of the reticle. The exposure system performs scanning exposure of a semiconductor substrate by irradiating the reticle with the pulse laser beam. The reticle has first and second regions. The processor instructs the laser apparatus about, based on proximity effect characteristics corresponding to the first and second regions, a value of a control parameter of the pulse laser beam corresponding to each region so that the laser apparatus emits the pulse laser beam with which a difference of the proximity effect characteristic of each region from a reference proximity effect characteristic is in an allowable range.
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公开(公告)号：US12038567B2
公开(公告)日：2024-07-16
申请号：US17858765
申请日：2022-07-06
Applicant: Gigaphoton Inc.
Inventor： Hirotaka Miyamoto , Osamu Wakabayashi
IPC: G03F7/20 , G02B5/30 , G02B17/02 , G02B26/08 , G02B27/28 , G03F7/00 , H01S3/00 , H01S3/08 , H01S3/225 , H01S3/23
CPC classification number: G02B17/023 , G02B5/3083 , G02B26/0816 , G02B27/283 , G03F7/70025 , G03F7/70041 , G03F7/70308 , G03F7/70316 , H01S3/0057 , H01S3/08009 , H01S3/225 , H01S3/2366 , G02B2207/117
Abstract: A pulse width expansion apparatus according to an aspect of the present disclosure includes a polarization beam splitter and a transfer optical system. The transfer optical system includes ¼-wavelength and reflection mirror pairs. The ¼-wavelength mirror pair include first and second ¼-wavelength mirrors. The first ¼-wavelength mirror provides ¼-wavelength phase shift and reflects a pulse laser beam. The second ¼-wavelength mirror provides ¼-wavelength phase shift and reflects the pulse laser beam reflected by the first ¼-wavelength mirror. The reflection mirror pair are disposed on an optical path before and after or between the ¼-wavelength mirror pair. The transfer optical system transfers an image of an input pulse laser beam on the polarization beam splitter to the optical path between the ¼-wavelength mirror pair at one-to-one magnification as a first transfer image and transfers the first transfer image to the polarization beam splitter at one-to-one magnification as a second transfer image.
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