公开(公告)号：US12216409B2

公开(公告)日：2025-02-04

申请号：US17817182

申请日：2022-08-03

Applicant: Gigaphoton Inc.

Inventor： Koichi Fujii ,  Osamu Wakabayashi

IPC: G03F7/00 ,  H01S3/08 ,  H01S3/094 ,  H01S3/0941 ,  H01S3/13 ,  H01S3/16 ,  H01S3/225

Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus emitting a pulse laser beam, an illumination optical system guiding the pulse laser beam to a reticle, a reticle stage moving the reticle, and a processor controlling emission of the pulse laser beam and movement of the reticle. The exposure system performs scanning exposure of a semiconductor substrate by irradiating the reticle with the pulse laser beam. The reticle has first and second regions. The processor instructs the laser apparatus about, based on proximity effect characteristics corresponding to the first and second regions, a value of a control parameter of the pulse laser beam corresponding to each region so that the laser apparatus emits the pulse laser beam with which a difference of the proximity effect characteristic of each region from a reference proximity effect characteristic is in an allowable range.

公开(公告)号：US12237640B2

公开(公告)日：2025-02-25

申请号：US17819013

申请日：2022-08-11

Applicant: Gigaphoton Inc.

Inventor： Koichi Fujii ,  Osamu Wakabayashi

IPC: G03F7/20 ,  H01S3/08 ,  H01S3/1055 ,  H01S3/106

Abstract: A line narrowing device includes a first prism; first and second gratings arranged on the optical path of the light beam having passed through the first prism at positions different in a direction of grooves of either the first grating or the second grating; a beam adjustment optical system arranged on the optical path of the light beam between the first prism and at least one grating of the first and second gratings, and causing a first portion of the light beam to be incident on the first grating and causing a second portion of the light beam to be incident on the second grating; a first actuator adjusting an incident angle of the first portion on the first grating; a second actuator adjusting an incident angle of the second portion on the second grating; and a third actuator adjusting an energy ratio of the first and second portions.

公开(公告)号：US12197132B2

公开(公告)日：2025-01-14

申请号：US17817190

申请日：2022-08-03

Applicant: Gigaphoton Inc.

Inventor： Koichi Fujii ,  Osamu Wakabayashi

IPC: G03F7/00 ,  H01S3/225 ,  H01S5/12

Abstract: An exposure system according to an aspect of the present disclosure includes a laser apparatus that outputs pulsed laser light, an illuminating optical system that guides the pulsed laser light to a reticle, a reticle stage, and a processor that controls the output of the pulsed laser light from the laser apparatus and the movement of the reticle performed by the reticle stage. The reticle has a first region where a first pattern is disposed and a second region where a second pattern is disposed, and the first and second regions are each a region continuous in a scan width direction perpendicular to a scan direction of the pulsed laser light, with the first and second regions arranged side by side in the scan direction. The processor controls the laser apparatus to output the pulsed laser light according to each of the first and second regions by changing the values of control parameters of the pulsed laser light in accordance with each of the first and second regions.

公开(公告)号：US12105425B2

公开(公告)日：2024-10-01

申请号：US17818174

申请日：2022-08-08

Applicant: Gigaphoton Inc.

Inventor： Koichi Fujii ,  Osamu Wakabayashi ,  Toshihiro Oga

IPC: G03F7/20 ,  G03F7/00

CPC classification number: G03F7/70025 ,  G03F7/70041 ,  G03F7/70866

Abstract: An exposure method includes reading data representing a relationship between a first parameter relating to an energy ratio between energy of first pulsed laser light having a first wavelength and energy of second pulsed laser light having a second wavelength longer than the first wavelength and a second parameter relating to a sidewall angle of a resist film that is the angle of a sidewall produced when the resist film is exposed to the first pulsed laser light and the second pulsed laser light, and determining a target value of the first parameter based on the data and a target value of the second parameter; and exposing the resist film to the first pulsed laser light and the second pulsed laser light by controlling a narrowed-line gas laser apparatus to output the first pulsed laser light and the second pulsed laser light based on the target value of the first parameter.