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    Ion plasma electron gun
    51.
    发明授权
    Ion plasma electron gun 失效

    公开(公告)号：US4694222A

    公开(公告)日：1987-09-15

    申请号：US596093

    申请日：1984-04-02

    Applicant: George Wakalopulos

    Inventor： George Wakalopulos

    IPC: H05H1/46 ,  H01J3/02 ,  H01J33/00 ,  H01J37/073 ,  H01J37/077 ,  H01S3/038 ,  H01S3/0959 ,  H05H1/48 ,  H02K39/00

    CPC classification number: H01S3/038 ,  H01J3/021 ,  H01J3/025 ,  H01J33/00 ,  H01S3/0959

    Abstract: An ion plasma electron gun for the generation of large area electron beams with uniform electron distribution. Positive ions generated by a wire in a plasma discharge chamber are accelerated through an extraction grid into a second chamber containing a high voltage cold cathode. These positive ions bombard a surface of the cathode causing the cathode to emit secondary electrons which form an electron beam. After passing through the extraction grid and the plasma discharge chamber, the electron beam exits from the gun by way of a second grid and a foil window supported on the second grid. The gun is constructed so that the electron beam passing through the foil window has a relatively large area and a uniform electron distribution which is substantially the same as the ion distribution of the ion beam impinging upon the cathode. Control of the generated electron beam is achieved by applying a control voltage between the wire and the grounded housing of the plasma chamber to control the density of positive ions bombarding the cathode.

    High energy electron treatment of water
    52.
    发明授权
    High energy electron treatment of water 失效
    高能量电子水处理

    公开(公告)号：US3901807A

    公开(公告)日：1975-08-26

    申请号：US37400073

    申请日：1973-06-27

    Applicant: HIGH VOLTAGE ENGINEERING CORP

    Inventor： TRUMP JOHN G

    IPC: C02F1/30 ,  H01J33/00 ,  A61L3/00 ,  C02B1/34 ,  C02B3/08

    CPC classification number: H01J33/00 ,  C02F1/30 ,  C02F2303/24 ,  Y02W10/33

    Abstract: The microbiological and chemical activity of water containing microorganisms and other impurities is reduced by irradiating such water with high energy electrons. A device mixes the water with a gas to supply the water with oxygen and the water passes through a constricted region wherein the electron beam irradiates the water. The structure of the several embodiments of the constricted region results in an economical system that uniformly and sufficiently irradiates the water passing therethrough.

    Nozzle for energy beam system
    53.
    发明授权
    Nozzle for energy beam system 失效
    能量束系统喷嘴

    公开(公告)号：US3894209A

    公开(公告)日：1975-07-08

    申请号：US41872173

    申请日：1973-11-23

    Applicant: SIRIUS CORP

    Inventor： FAIRBAIRN THOMAS E

    IPC: B05B7/22 ,  H01J33/00 ,  H01J37/06 ,  H05H1/30

    CPC classification number: H05H1/30 ,  H01J33/00 ,  H01J37/06

    Abstract: An improved nozzle for an energy beam system including an outer hollow cylindrical sleeve having an internal radial plate across the interior of the sleeve with the plate having axial passages therethrough, an inner hollow tubular sleeve telescopically mounted in one end of the outer sleeve, and an elongated hollow electrode telescopically mounted interiorly of both sleeves and radially spaced apart from the inner sleeve.

    Abstract translation: 一种用于能量束系统的改进的喷嘴，其包括外部中空圆柱形套筒，所述外部中空圆柱形套筒具有穿过所述套筒内部的内部径向板，所述板具有穿过其的轴向通道，可伸缩地安装在所述外部套筒的一端中的内部中空管状套筒， 伸缩式中空电极可伸缩地安装在两个套筒的内部并且与内套筒径向间隔开。

    Stimulated emission light source pumped by electron beam of field emission initiated vacuum arc
    54.
    发明授权
    Stimulated emission light source pumped by electron beam of field emission initiated vacuum arc 失效
    通过电子束激发的激发真空电弧激发的受激发射光源

    公开(公告)号：US3890503A

    公开(公告)日：1975-06-17

    申请号：US14816371

    申请日：1971-05-28

    Applicant: HEWLETT PACKARD CO

    Inventor： BREWSTER JOHN L

    IPC: H01J3/02 ,  H01J33/00 ,  H01S3/0959 ,  H01S3/09

    CPC classification number: H01J3/021 ,  H01J33/00 ,  H01S3/0959

    Abstract: An apparatus for generating stimulated emission light pulses of extremely high power up to 5 megawatts by electron beam pumping of laser type light emitting material, is described which employs an electron beam of extremely high current up to 6000 amperes at 450 kiloelectron-volts produced by field emission initiated vacuum arc operation of an electron tube having a field emission cathode. The field emission cathode structure has a plurality of separate needle shaped emitting elements. The laser material is mounted either on an anode inside the evacuated tube envelope or outside of the envelope adjacent an electron transparent anode window. Coherent light may be produced by causing oscillation of the light in an optical resonant cavity provided by a pair of parallel mirrors on opposite sides of the laser material.

    Abstract translation: 描述了一种用于通过激光型发光材料的电子束泵浦产生高达5兆瓦的极高功率的受激发射光脉冲的装置，其使用由现场产生的450千伏特电压高达6000安培的极高电流的电子束 具有场发射阴极的电子管的发射启动真空电弧操作。 场发射阴极结构具有多个单独的针状发光元件。 激光材料安装在真空管外侧的阳极或与电子透明阳极窗相邻的外壳的外侧。 可以通过在由激光材料的相对侧上的一对平行镜提供的光学谐振腔中引起光的振荡来产生相干光。

    Method for increasing the output of an electron accelerator
    56.
    发明授权
    Method for increasing the output of an electron accelerator 失效
    增加电子加速器输出的方法

    公开(公告)号：US3679930A

    公开(公告)日：1972-07-25

    申请号：US3679930D

    申请日：1969-08-13

    Applicant: FORD MOTOR CO

    Inventor： COLVIN ALEX D ,  MCNITT DAVID H ,  TURNER ALLEN H

    IPC: H01J33/00 ,  H01J29/76

    CPC classification number: H01J33/00

    Abstract: A method of increasing the energy output of an electron accelerator by scanning the electron beam produced in the accelerator in a manner so that excessive heat build-ups do not occur at the electron permeable window structure through which the beam passes to exit the accelerator. This method is used in conjunction with an accelerator having at least two elongate, electron permeable windows arranged in a side-by-side orientation and scanning coils allowing the beam to be scanned parallel to at least two, perpendicular axes. The method provides that the beam is scanned along the length of a first of the windows in a first direction and then instantaneously is scanned laterally to the second of the windows. The beam then is scanned along the length of the second of the windows in a second direction 180* from the first direction. A return of the beam to its original position is accomplished as the beam then is scanned laterally and instantaneously a second time such that it again is directed at the first of the windows. Unlimited repetition of these scanning steps is possible.

    Abstract translation: 通过扫描加速器中产生的电子束来增加电子加速器的能量输出的方法，使得在通过射出加速器的电子透射窗结构处不会发生过多的积热。 该方法与具有沿并排方向布置的至少两个细长电子可渗透窗口的加速器一起使用，并且扫描线圈允许光束平行于至少两个垂直的轴扫描。 该方法提供沿着第一方向的第一窗口的长度扫描光束，然后瞬时地扫描到第二窗口。 然后沿第二方向从第一方向180°的第二方向扫描光束。 光束到达其原始位置的返回是完成的，因为光束然后被第二次横向和瞬时地扫描，使得它再次被指向第一个窗口。 这些扫描步骤无限次重复是可能的。

    Modular electron source for uniformly irradiating the surface of a product
    57.
    发明授权
    Modular electron source for uniformly irradiating the surface of a product 失效
    用于均匀辐射产品表面的模块化电子源

    公开(公告)号：US3617740A

    公开(公告)日：1971-11-02

    申请号：US3617740D

    申请日：1968-10-08

    Applicant: HIGH VOLTAGE ENGINEERING CORP

    Inventor： SKILLICORN BRIAN

    IPC: G21K5/10 ,  H01J33/00 ,  G01N21/00

    CPC classification number: H01J33/00 ,  G21K5/10

    Abstract: The invention relates to the irradiation of coatings and similar materials wherein a relatively large surface of complex shape is to be irradiated. The invention employs a modular construction wherein each module comprises a relatively small and independently movable electron accelerator which is complete but for the provision of the accelerating voltage. In general, apparatus is used having a common insulating housing and a common voltage source. In the housing are mounted independently movable electron accelerators. A multiplicity of these accelerators is arranged so as to provide a wide array of generally parallel electron beams which are positioned so as to overlap at the surface of the product to be irradiated. Depending upon the nature of the surface, the electron beams may or may not be actually parallel, the purpose being to insure that each electron beam impinges on the surface to be irradiated normal thereto.

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