公开(公告)号：US20190121247A1

公开(公告)日：2019-04-25

申请号：US16226731

申请日：2018-12-20

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Martinus Hendrikus Antonius LEENDERS ,  Sjoerd Nicolaas Lambertus DONDERS ,  Harry SEWELL ,  Louis John MARKOYA ,  Marcus Martinus Petrus Adrianus VERMEULEN ,  Diane Elaine MARIKOYA

IPC: G03F7/20

Abstract: A new way of drying and/or wetting a surface, such as a top surface of a substrate, is disclosed which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.

公开(公告)号：US20180299793A1

公开(公告)日：2018-10-18

申请号：US15766728

申请日：2016-09-30

Applicant: ASML Holding N.V.

Inventor： Hong YE ,  Gerrit Johannes NIJMEIJER

IPC: G03F7/20 ,  G03F9/00

Abstract: A method and apparatus to measure a target (e.g., an alignment mark (e.g., on a substrate)) is disclosed. Relative movement between the target and a measurement spot of a measurement system in a “fly-in” direction (e.g., movement of the target towards the measurement spot) is performed so that a first measurement for the target can be made. Thereafter, relative movement between the target and the measurement spot is made in an opposite “fly-in” direction so that a second measurement for the target can be made. By combining (e.g., averaging) these two measurements, an error is cancelled out, and higher accuracy in the measurement may be achieved.

公开(公告)号：US10031428B2

公开(公告)日：2018-07-24

申请号：US14762450

申请日：2014-02-20

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Koen Cuypers ,  Marcelo Henrique De Andrade Oliveira ,  Marinus Jan Remie ,  Chattarbir Singh ,  Laurentius Johannes Adrianus Van Bokhoven ,  Henricus Anita Jozef Wilhemus Van De Ven ,  José Nilton Fonseca Junior ,  Frank Johannes Jacobus Van Boxtel ,  Daniel Nathan Burbank ,  Erik Roelof Loopstra ,  Johannes Onvlee ,  Mark Josef Schuster ,  Robertus Nicodemus Jacobus Van Ballegoij ,  Christopher Charles Ward ,  Jan Steven Christiaan Westerlaken

IPC: G03B27/52 ,  G03F7/20

Abstract: A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate (410) positioned between the movable stage (401) and the projection system (208). The plate includes an opening (411) that comprises a first sidewall (411a) and a second sidewall (411b). The plate may be configured to provide a gas flow pattern (424) in a region between the movable stage and the projection system that is substantially perpendicular to an optical axis of the illumination system.

公开(公告)号：US20180196360A1

公开(公告)日：2018-07-12

申请号：US15742179

申请日：2016-06-17

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Laurentius Johannes Adrianus VAN BOKHOVEN ,  Christopher Charles WARD ,  Marc Léon VAN DER GAAG ,  Johan Gertrudis Cornelis KUNNEN

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70733 ,  G03F7/70783 ,  G03F7/70858 ,  G03F7/70891

Abstract: A lithographic apparatus (100) includes a patterning device support structure (104) configured to support a patterning device (110), a gas inlet (116) configured to provide a gas flow (114) across a surface of the patterning device, and a temperature conditioning device (134) configured to condition the temperature of the gas flow based on a set point. The apparatus also includes a sensor (132) configured to measure a parameter indicative of an amount of heat added to at least one of the patterning device and a volume (126) between the patterning device and a lens (124) of a projection system (106) during operational use of the lithographic system. Further, the apparatus includes a controller (130) operatively coupled to the sensor and configured to adjust the set point based on the parameter measured by the sensor to control a temperature of the patterning device.

公开(公告)号：US09983487B2

公开(公告)日：2018-05-29

申请号：US14947628

申请日：2015-11-20

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Robert Gabriël Maria Lansbergen ,  George Hilary Harrold ,  Richard John Johnson ,  Hugo Jacobus Gerardus Van Der Weijden

IPC: G03F7/20 ,  H01L21/68

CPC classification number: G03F7/70741 ,  G03F7/70983 ,  H01L21/682

Abstract: Provided is a method and apparatus for moving and exchanging reticles within a vacuum lithographic system with minimum particle generation and outgassing. In an example of the method, a first arm of a rotational exchange device (RED) receives a first baseplate holding a first reticle. A second arm of the RED supports and buffers a second baseplate. The first and second baseplates are located substantially equidistant from an axis of rotation of the RED.

公开(公告)号：US09910368B2

公开(公告)日：2018-03-06

申请号：US14437294

申请日：2013-09-20

Applicant: ASML Netherlands B.V. ,  ASML Holding N.V.

Inventor： Christiaan Louis Valentin ,  Erik Roelof Loopstra ,  Christopher Charles Ward ,  Daniel Nathan Burbank ,  Mark Josef Schuster ,  Peter James Graffeo

IPC: G03F7/20

CPC classification number: G03F7/70783 ,  G03F7/70266 ,  G03F7/70433 ,  G03F7/707 ,  G03F7/70725 ,  G03F7/70758 ,  G03F7/70775 ,  G03F7/70825

Abstract: A system (300) for supporting an exchangeable object (302) can include a movable structure (304) and an object holder (306) configured to be movable relative to the movable structure. The object holder can be configured to hold the exchangeable object. The system can also include a first actuator assembly (308) and second actuator assembly (316). The first actuator assembly can be configured to apply a force to the object holder to translate the exchangeable object generally along a plane. The second actuator assembly can be configured to apply a bending moment to the object holder. The exchangeable object can be a patterning device of a lithographic apparatus.

公开(公告)号：US20170307986A1

公开(公告)日：2017-10-26

申请号：US15649161

申请日：2017-07-13

Applicant: ASML Holding N.V. ,  ASML Netherlands B.V.

Inventor： Earl William EBERT ,  Johannes ONVLEE ,  Samir A. NAYFEH ,  Mark Josef SCHUSTER ,  Peter A. DELMASTRO ,  Christopher Charles WARD ,  Frank Johannes Jacobus VAN BOXTEL ,  Abdullah ALIKHAN ,  Daniel Nathan BURBANK ,  Daniel Nicholas GALBURT ,  Justin Matthew VERDIRAME

IPC: G03F7/20

CPC classification number: G03F7/70875 ,  G03F7/70341 ,  G03F7/70716 ,  G03F7/70808 ,  G03F7/70858 ,  G03F7/70866

Abstract: A patterning device support for controlling a temperature of a patterning device can include a movable component. The movable component can include a gas inlet for supplying a gas flow across a surface of the patterning device and a gas outlet for extracting the gas flow. The patterning device support can also include a gas flow generator coupled to a duct, for recirculating the gas flow from the gas outlet to the gas inlet.

公开(公告)号：US09746788B2

公开(公告)日：2017-08-29

申请号：US15293009

申请日：2016-10-13

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nicolaas Rudolf Kemper ,  Henrikus Herman Marie Cox ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Nicolaas Ten Kate ,  Jeroen Johannes Sophia Maria Mertens ,  Frits Van Der Meulen ,  Franciscus Johannes Herman Maria Teunissen ,  Jan-Gerard Cornelis Van Der Toorn ,  Martinus Cornelis Maria Verhagen ,  Stefan Philip Christiaan Belfroid ,  Johannes Petrus Maria Smeulers ,  Herman Vogel

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70883 ,  G03F7/70341 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/7095

Abstract: A lithographic projection apparatus, including a liquid supply system configured to supply a liquid to a space between a projection system and a movable table; a member to at least partly confine liquid in the space, the member including a recovery opening facing toward the movable table, the recovery opening including a first porous structure configured to recover fluid; and a chamber configured to receive recovered fluid and to separate liquid from gas in the recovered fluid, the chamber including a second porous structure.

公开(公告)号：US20170242345A1

公开(公告)日：2017-08-24

申请号：US15504749

申请日：2015-07-09

Applicant: ASML Holding N.V.

Inventor： Matthew LIPSON ,  Vincent DIMILIA ,  Ronald Peter TOTILLO ,  Tammo UITTERDIJK ,  Steven Michael ZIMMERMAN

IPC: G03F7/20 ,  H01L21/67 ,  H01L21/683

CPC classification number: G03F7/70708 ,  C03B23/20 ,  C03B25/02 ,  G03F7/70783 ,  G03F7/70875 ,  G03F7/7095 ,  H01L21/67103 ,  H01L21/67109 ,  H01L21/6831 ,  H01L21/6833

Abstract: An electrostatic clamp (300) and a method for manufacturing the same is disclosed. The electrostatic clamp includes a first layer (302) having a first ultra-low expansion (ULE) material, a second layer (304) coupled to the first layer, having a second ULE material, and a third layer (306), coupled to the second layer, having a third ULE material. The electrostatic clamp further includes a plurality of fluid channels (316) located between the first layer and the second layer and a composite layer (308) interposed between the second layer and the third layer. The method for manufacturing the electrostatic clamp includes forming the plurality of fluid channels, disposing the composite layer on the third layer, and coupling the third layer to the second layer. The plurality of fluid channels is configured to carry a thermally conditioned fluid for temperature regulation of a clamped object.

公开(公告)号：US09709899B2

公开(公告)日：2017-07-18

申请号：US14444887

申请日：2014-07-28

Applicant: ASML HOLDING N.V.

Inventor： Herman Vogel ,  Klaus Simon ,  Antonius Theodorus Anna Maria Derksen

IPC: G03B27/52 ,  G03F7/20

CPC classification number: G03F7/70341 ,  G03F7/20 ,  G03F7/70358 ,  G03F7/709 ,  H01L21/027

Abstract: A liquid immersion photolithography system includes an exposure system that exposes a substrate with electromagnetic radiation and includes a projection optical system that focuses the electromagnetic radiation on the substrate. A liquid supply system provides liquid flow between the projection optical system and the substrate. An optional plurality of micronozzles are arranged around the periphery of one side of the projection optical system so as to provide a substantially uniform velocity distribution of the liquid flow in an area where the substrate is being exposed.