MEMS Devices and Methods of Fabrication Thereof
    61.
    发明申请
    MEMS Devices and Methods of Fabrication Thereof 有权
    MEMS器件及其制造方法

    公开(公告)号:US20100225708A1

    公开(公告)日:2010-09-09

    申请号:US12683550

    申请日:2010-01-07

    Abstract: MEMS devices and methods of fabrication thereof are described. In one embodiment, the MEMS device includes a bottom alloy layer disposed over a substrate. An inner material layer is disposed on the bottom alloy layer, and a top alloy layer is disposed on the inner material layer, the top and bottom alloy layers including an alloy of at least two metals, wherein the inner material layer includes the alloy and nitrogen. The top alloy layer, the inner material layer, and the bottom alloy layer form a MEMS feature.

    Abstract translation: 描述了MEMS器件及其制造方法。 在一个实施例中,MEMS器件包括设置在衬底上的底部合金层。 内层材料层设置在底层合金层上,顶层合金层设置在内层材料层上,顶层合金层和底层合金层均含有至少两种金属的合金,其中内层含有合金和氮 。 顶部合金层,内部材料层和底部合金层形成MEMS特征。

    Multi-Step Process for Forming High-Aspect-Ratio Holes for MEMS Devices
    64.
    发明申请
    Multi-Step Process for Forming High-Aspect-Ratio Holes for MEMS Devices 有权
    用于形成用于MEMS器件的高纵横比孔的多步法

    公开(公告)号:US20100120260A1

    公开(公告)日:2010-05-13

    申请号:US12347250

    申请日:2008-12-31

    Abstract: A method of forming an integrated circuit structure includes forming an opening in a substrate, with the opening extending from a top surface of the substrate into the substrate. The opening is filled with a filling material until a top surface of the filling material is substantially level with the top surface of the substrate. A device is formed over the top surface of the substrate, wherein the device includes a storage opening adjoining the filling material. A backside of the substrate is grinded until the filling material is exposed. The filling material is removed from the channel until the storage opening of the device is exposed.

    Abstract translation: 形成集成电路结构的方法包括在衬底中形成开口,其中开口从衬底的顶表面延伸到衬底中。 开口填充有填充材料,直到填充材料的顶表面基本上与基板的顶表面平齐。 在衬底的顶表面上形成器件,其中该器件包括与填充材料相邻的存储开口。 研磨衬底的背面,直到填充材料暴露。 将填充材料从通道中取出直到设备的存储开口露出。

    Website Generator Capable of Creating Dynamic Website in Off-Line Status and Related Method
    66.
    发明申请
    Website Generator Capable of Creating Dynamic Website in Off-Line Status and Related Method 审中-公开
    网站生成器能够在离线状态和相关方法中创建动态网站

    公开(公告)号:US20080189320A1

    公开(公告)日:2008-08-07

    申请号:US12016200

    申请日:2008-01-17

    Applicant: Ching-Kang Lee

    Inventor: Ching-Kang Lee

    CPC classification number: G06F16/958

    Abstract: To eliminate inconvenience of creating dynamic web pages on line, the present invention provides a website generator capable of creating a dynamic website at an off-line status. The website generator disconnects with a web server, which is used for publishing the dynamic website on Internet, during the off-line status. The website generator includes a database and a webpage generator. The database is used for classifying a data source according to predetermined serial numbers and categories. The webpage generator includes a plurality of templates, and is used for importing the database and generating web pages of the dynamic website according to the database and the plurality of templates.

    Abstract translation: 为了消除在线创建动态网页的不便,本发明提供一种能够在离线状态下创建动态网站的网站生成器。 在离线状态下,网站生成器与用于在互联网上发布动态网站的Web服务器断开连接。 网站生成器包括数据库和网页生成器。 该数据库用于根据预定的序列号和类别对数据源进行分类。 网页生成器包括多个模板,用于根据数据库和多个模板导入数据库和生成动态网站的网页。

    METHOD FOR CONTROLLING PRECHARGE TIMING OF MEMORY DEVICE AND APPARATUS THEREOF
    68.
    发明申请
    METHOD FOR CONTROLLING PRECHARGE TIMING OF MEMORY DEVICE AND APPARATUS THEREOF 有权
    用于控制存储器件的预调节时序的方法及其装置

    公开(公告)号:US20070268763A1

    公开(公告)日:2007-11-22

    申请号:US11834136

    申请日:2007-08-06

    Applicant: Jae IM Kang LEE

    Inventor: Jae IM Kang LEE

    CPC classification number: G11C11/406 G11C11/4094 G11C2211/4065

    Abstract: A method for controlling a precharge timing of a memory device is disclosed. The method includes making timing of generation of a signal for determining a precharge timing in a normal operation and a signal for determining a precharge timing in a refresh operation different from each other by making timing of generation of a signal for controlling the normal operation and a signal for controlling the refresh operation different from each other.

    Abstract translation: 公开了一种用于控制存储器件的预充电定时的方法。 该方法包括:通过产生用于控制正常操作的信号的定时,产生用于确定正常操作中的预充电定时的信号的定时和用于确定彼此不同的刷新操作中的预充电定时的信号,以及 用于控制刷新操作的信号彼此不同。

    Lobster eye X-ray imaging system and method of fabrication thereof

    公开(公告)号:US07231017B2

    公开(公告)日:2007-06-12

    申请号:US11191095

    申请日:2005-07-27

    CPC classification number: G01N23/203 G21K1/06

    Abstract: A Lobster Eye X-ray Imaging System based on a unique Lobster Eye (LE) structure, X-ray generator, scintillator-based detector and cooled CCD (or Intensified CCD) for real-time, safe, staring Compton backscatter X-ray detection of objects hidden under ground, in containers, behind walls, bulkheads etc. In contrast to existing scanning pencil beam systems, Lobster Eye X-Ray Imaging System's true focusing X-ray optics simultaneously acquire ballistic Compton backscattering photons (CBPs) from an entire scene irradiated by a wide-open cone beam from one or more X-ray generators. The Lobster Eye X-ray Imaging System collects (focuses) thousands of times more backscattered hard X-rays in the range from 40 to 120 keV (or wavelength λ=0.31 to 0.1 Å) than current backscatter imaging sensors (BISs), giving high sensitivity and signal-to-noise ratio (SNR) and penetration through ground, metal walls etc. The collection efficiency of Lobster Eye X-ray Imaging System is optimized to reduce emitted X-ray power and miniaturize the device. This device is especially advantageous for and satisfies requirements of X-ray-based inspection systems, namely, penetration of the X-rays through ground, metal and other material concealments; safety; and man-portability. The advanced technology disclosed herein is also applicable to medical diagnostics and military applications such as mine detection, security screening and a like.

    Method for fabricating a semiconductor device
    70.
    发明申请
    Method for fabricating a semiconductor device 有权
    半导体器件的制造方法

    公开(公告)号:US20070049039A1

    公开(公告)日:2007-03-01

    申请号:US11320977

    申请日:2005-12-30

    Inventor: Jeong Jang Kang Lee

    CPC classification number: H01L21/32139 H01L21/31116 H01L21/31138

    Abstract: Method for fabricating a semiconductor device in which a by-product of etching is deposited on a photoresist film for using as a mask. The method for fabricating a semiconductor device includes the steps of depositing a polysilicon, and a bottom anti-refection coating on an entire surface of a substrate in succession, forming a photoresist film pattern on a predetermined portion of the bottom anti-refection coating, etching the bottom anti-refection coating by using the photoresist film pattern to deposit by-product of the etching on sidewalls of the photoresist pattern to form spacers, and etching the polysilicon by using the photoresist film pattern and the spacers, to form a line.

    Abstract translation: 制造半导体器件的方法,其中蚀刻副产物沉积在用作掩模的光致抗蚀剂膜上。 制造半导体器件的方法包括以下步骤:在基片的整个表面上依次沉积多晶硅和底部抗反射涂层,在底部抗反射涂层的预定部分上形成光致抗蚀剂膜图案,蚀刻 通过使用光致抗蚀剂膜图案沉积蚀刻的副产物的底部抗反射涂层以形成间隔物,并且通过使用光致抗蚀剂膜图案和间隔物蚀刻多晶硅以形成线。

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