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    ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM
    61.
    发明申请
    ILLUMINATION SYSTEM OR PROJECTION LENS OF A MICROLITHOGRAPHIC EXPOSURE SYSTEM 有权
    微观曝光系统的照明系统或投影镜头

    公开(公告)号：US20080204877A1

    公开(公告)日：2008-08-28

    申请号：US12042621

    申请日：2008-03-05

    Applicant: Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    Inventor： Michael Totzeck ,  Susanne Beder ,  Wilfried Clauss ,  Heiko Feldmann ,  Daniel Kraehmer ,  Aurelian Dodoc

    IPC: G02B27/28

    CPC classification number: G02B5/3083 ,  G02B27/286 ,  G03F7/70566 ,  G03F7/70966

    Abstract: In some embodiments, the disclosure provides an optical system, in particular an illumination system or a projection lens of a microlithographic exposure system, having an optical system axis and at least one element group including three birefringent elements each of which includes optically uniaxial material and having an aspheric surface, wherein a first birefringent element of the group has a first orientation of its optical crystal axis, a second birefringent element of the group has a second orientation of its optical crystal axis, wherein the second orientation can be described as emerging from a rotation of the first orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof, and a third birefringent element of the group has a third orientation of its optical crystal axis, wherein the third orientation can be described as emerging from a rotation of the second orientation, the rotation not corresponding to a rotation around the optical system axis by an angle of 90° or an integer multiple thereof.

    Abstract translation: 在一些实施例中，本公开提供了一种光学系统，特别是微光刻曝光系统的照明系统或投影透镜，其具有光学系统轴线和包括三个双折射元件的至少一个元件组，每个元件组包括光学单轴材料并具有 非球面表面，其中该组的第一双折射元件具有其光学晶体轴的第一取向，该组的第二双折射元件具有其光学晶轴的第二取向，其中第二取向可被描述为从 第一取向的旋转，旋转不对应于围绕光学系统轴的旋转90°的角度或其整数倍，并且该组的第三双折射元件具有其光学晶轴的第三取向，其中， 可以将第三取向描述为从第二取向旋转而出现，旋转不对准 以围绕光学系统轴旋转90°的角度或其整数倍。

    Hologram and Method of Manufacturing an Optical Element Using a Hologram
    62.
    发明申请
    Hologram and Method of Manufacturing an Optical Element Using a Hologram 有权
    全息图和使用全息图制造光学元件的方法

    公开(公告)号：US20080137090A1

    公开(公告)日：2008-06-12

    申请号：US11795598

    申请日：2006-01-20

    Applicant: Jochen Hetzler ,  Susanne Beder ,  Heiko Feldmann

    Inventor： Jochen Hetzler ,  Susanne Beder ,  Heiko Feldmann

    IPC: G01B9/021 ,  G01B11/24

    CPC classification number: G01B9/021 ,  G01B9/02039 ,  G01B11/2441

    Abstract: A method of manufacturing an optical element (5) comprises testing an optical surface (3) of the optical element, using an interferometer 1a directing measuring light (23a) onto the optical surface wherein the measuring light traverses two successive holograms (44, 48) disposed in the beam path of the measuring light upstream of the optical surface.

    Abstract translation: 一种制造光学元件（5）的方法包括：使用将测量光（23a）引导到光学表面上的干涉仪（1）测试光学元件的光学表面（3），其中测量光穿过两个连续的全息图（44， 48）设置在光学表面上游的测量光的光路中。

    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection
    66.
    发明申请
    Microscope imaging system and method for emulating a high aperture imaging system, particularly for mask inspection 有权
    用于模拟高光圈成像系统的显微镜成像系统和方法，特别是用于掩模检查

    公开(公告)号：US20060012873A1

    公开(公告)日：2006-01-19

    申请号：US10917626

    申请日：2004-08-13

    Applicant: Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    Inventor： Michael Totzeck ,  Heiko Feldmann ,  Toralf Grunder ,  Karl-Heinz Schuster ,  Joern Greif-Wuestenbecker ,  Thomas Scheruebl ,  Wolfgang Harnisch ,  Norbert Rosenkranz ,  Ulrich Stroessner

    IPC: G02B21/06

    CPC classification number: G03F7/70566 ,  G02B5/3025 ,  G02B21/0016 ,  G03F7/70666 ,  Y10S359/90

    Abstract: The present invention is directed to an optical imaging system for inspection microscopes with which lithography masks can be checked for defects particularly through emulation of high-aperture scanner systems. The microscope imaging system for emulating high-aperture imaging systems comprises imaging optics, a detector and an evaluating unit, wherein polarizing optical elements are selectively arranged in the illumination beam path for generating different polarization states of the illumination beam and/or in the imaging beam path for selecting different polarization components of the imaging beam, an optical element with a polarization-dependent intensity attenuation function can be introduced into the imaging beam path, images of the mask and/or sample are received by the detector for differently polarized beam components and are conveyed to the evaluating unit for further processing. With the proposed solution, it is possible in particular to examine lithography masks for defects by means of inspection microscopes in spite of increasingly smaller structures and increasingly higher image-side numerical apertures of the imaging systems. Realistic images of the scanner systems can be generated by emulating the occurring vector effects.

    Abstract translation: 本发明涉及一种用于检查显微镜的光学成像系统，通过该光学成像系统可以通过光学掩模来检查缺陷，特别是通过高光阑扫描器系统的仿真。 用于模拟高光圈成像系统的显微镜成像系统包括成像光学器件，检测器和评估单元，其中偏振光学元件选择性地布置在照明光束路径中，用于产生照明光束和/或成像光束的不同偏振状态 用于选择成像光束的不同偏振分量的路径，具有偏振相关强度衰减功能的光学元件可以被引入到成像光束路径中，掩模和/或采样的图像被检测器接收用于不同偏振光束分量， 被传送到评估单元进行进一步处理。 利用所提出的解决方案，尽管越来越小的结构和成像系统的图像侧数值孔径越来越高，但是可以通过检查显微镜检查用于缺陷的光刻掩模。 可以通过模拟出现的矢量效应来生成扫描仪系统的现实图像。

    Optical imaging device and imaging method for microscopy
    67.
    发明授权
    Optical imaging device and imaging method for microscopy 有权
    光学成像装置及显微镜成像方法

    公开(公告)号：US09104026B2

    公开(公告)日：2015-08-11

    申请号：US12568483

    申请日：2009-09-28

    Applicant: Alexander Epple ,  Ella Mizkewicz ,  Heiko Feldmann

    Inventor： Alexander Epple ,  Ella Mizkewicz ,  Heiko Feldmann

    IPC: G02B17/00 ,  G02B21/00 ,  G02B23/00 ,  G02B21/04 ,  G02B17/06

    CPC classification number: G02B21/04 ,  G02B17/0631

    Abstract: The present invention relates to an optical imaging device, in particular for microscopy, with a first optical element group and a second optical element group, wherein the first optical element group and the second optical element group, on an image plane, form an image of an object point of an object plane. The first optical element group includes a first optical element with a reflective first optical surface and a second optical element with a reflective second optical surface. The second optical element group includes a third optical element with a reflective third optical surface. The first optical element and the second optical element are formed and arranged such that on formation of the image of the object point, in each case a multiple reflection of at least one imaging beam takes place on the first optical surface and the second optical surface.

    Abstract translation: 本发明涉及具有第一光学元件组和第二光学元件组的特别是显微镜的光学成像装置，其中第一光学元件组和第二光学元件组在图像平面上形成图像 物体平面的物体点。 第一光学元件组包括具有反射的第一光学表面的第一光学元件和具有反射的第二光学表面的第二光学元件。 第二光学元件组包括具有反射第三光学表面的第三光学元件。 第一光学元件和第二光学元件被形成和布置成使得在形成物点的图像时，在每种情况下，在第一光学表面和第二光学表面上都会发生至少一个成像光束的多次反射。

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