公开(公告)号：US20210118507A1

公开(公告)日：2021-04-22

申请号：US17114373

申请日：2020-12-07

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chun-Hsien Huang ,  Ching-Cheng Lung ,  Yu-Tse Kuo ,  Shu-Ru Wang ,  Chun-Yen Tseng

IPC: G11C15/04 ,  H01L27/02 ,  H01L27/11

Abstract: A layout pattern of a two-port ternary content addressable memory (TCAM) includes a first storage unit, a second storage unit, a first comparison circuit and a second comparison circuit. The first comparison circuit and the second comparison circuit are positioned in a first side area of a side and a second side area of another side of the layout pattern, respectively. The first storage unit and the second storage unit are positioned in a first middle area and a second middle area between the first side area and the second side area, respectively. The first storage unit is connected to the first comparison circuit through a first gate structure and connected to the second comparison circuit through a second gate structure. The second storage unit is connected to the first comparison circuit through a third gate structure and connected to the second comparison circuit through a fourth gate structure.

公开(公告)号：US10762951B1

公开(公告)日：2020-09-01

申请号：US16455783

申请日：2019-06-28

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chih-Wei Tsai ,  Tsan-Tang Chen ,  Chung-Cheng Tsai ,  Yen-Hsueh Huang ,  Chang-Ting Lo ,  Chun-Yen Tseng ,  Yu-Tse Kuo

IPC: G11C11/412 ,  G11C11/419 ,  G11C11/418

Abstract: An SRAM device includes a memory cell and a keeper circuit. The memory cell is formed in an active area and coupled to a first bit line and a second bit line. The keeper circuit is formed in the active area and configured to charge the second bit line when the first bit line is at a first voltage level and the second bit line is at a second voltage level or charge the first bit line when the second bit line is at the first voltage level and the first bit line is at the second voltage level, wherein the second voltage level is higher than the first voltage level.

公开(公告)号：US10706914B2

公开(公告)日：2020-07-07

申请号：US16019521

申请日：2018-06-26

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chun-Yen Tseng ,  Ching-Cheng Lung ,  Yu-Tse Kuo ,  Chun-Hsien Huang ,  Hsin-Chih Yu ,  Shu-Ru Wang

IPC: G11C11/00 ,  G11C11/412 ,  G11C11/419 ,  H01L43/08 ,  G11C7/12 ,  H01L27/11 ,  H01L43/02 ,  H01L43/10 ,  G01R33/09 ,  G11C8/08

Abstract: A static random access memory (SRAM) structure includes a first inverter comprising a first pull-up transistor and a first pull-down transistor, a second inverter comprising a second pull-up transistor and a second pull-down transistor, a first pass transistor coupled to the first inverter, and a second pass transistor coupled to the second inverter. Preferably, the first inverter is coupled to a first tunnel magnetoresistance (TMR) structure and the second inverter is coupled to a second TMR structure.

公开(公告)号：US20200083232A1

公开(公告)日：2020-03-12

申请号：US16152423

申请日：2018-10-05

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chun-Hsien Huang ,  Ching-Cheng Lung ,  Yu-Tse Kuo ,  Shu-Ru Wang ,  Chun-Yen Tseng

IPC: H01L27/11 ,  H01L27/02 ,  H01L29/08 ,  H01L29/78

Abstract: A layout pattern of a static random access memory (SRAM) preferably includes a first inverter and a second inverter. Preferably, the first inverter includes a first gate structure extending along a first direction on a substrate, in which the first gate structure includes a gate of a first pull-up device (PL1) and a gate of a first pull-down device (PD1). The second inverter includes a second gate structure extending along the first direction on the substrate, in which the second gate structure includes a gate of a second pull-up device (PL2) and a gate of a second pull-down device (PD2) and the gate of the PD1 is directly under the gate of the PD2.

公开(公告)号：US10529723B2

公开(公告)日：2020-01-07

申请号：US15186548

申请日：2016-06-20

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Shu-Wei Yeh ,  Tsung-Hsun Wu ,  Chih-Ming Su ,  Yu-Tse Kuo

IPC: H01L27/11 ,  H01L27/02

Abstract: A layout pattern of a static random access memory includes a pull-up device, a first pull-down device, a second pull-up device, a second pull-down device, a first pass gate device and a second pass gate device disposed on a substrate. A plurality of fin structures are disposed on the substrate, and the fin structures include at least one first fin structure and at least one second fin structure. A J-shaped gate structure is disposed on the substrate, including a long part, a short part and a bridge part. At least one first extending contact structure crosses over the at least one first fin structure and the at least one second fin structure, wherein the at least one first extending contact structure does not overlap with the bridge part of the J-shaped gate structure.

公开(公告)号：US20190362776A1

公开(公告)日：2019-11-28

申请号：US16019521

申请日：2018-06-26

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chun-Yen Tseng ,  Ching-Cheng Lung ,  Yu-Tse Kuo ,  Chun-Hsien Huang ,  Hsin-Chih Yu ,  Shu-Ru Wang

IPC: G11C11/412 ,  G11C11/419 ,  H01L43/08 ,  G11C7/12 ,  G11C8/08 ,  H01L43/02 ,  H01L43/10 ,  G01R33/09 ,  H01L27/11

Abstract: A static random access memory (SRAM) structure includes a first inverter comprising a first pull-up transistor and a first pull-down transistor, a second inverter comprising a second pull-up transistor and a second pull-down transistor, a first pass transistor coupled to the first inverter, and a second pass transistor coupled to the second inverter. Preferably, the first inverter is coupled to a first tunnel magnetoresistance (TMR) structure and the second inverter is coupled to a second TMR structure.

公开(公告)号：US20190206879A1

公开(公告)日：2019-07-04

申请号：US15884063

申请日：2018-01-30

Applicant: United Microelectronics Corp.

Inventor： Chun-Hsien Huang ,  Ching-Cheng Lung ,  Yu-Tse Kuo ,  Chang-Hung Chen ,  Shu-Ru Wang ,  Wei-Chi Lee ,  Chun-Yen Tseng

IPC: H01L27/11 ,  H01L27/092 ,  G11C11/41 ,  H01L23/522 ,  H01L27/02

Abstract: A semiconductor device includes a first circuit structure and a second circuit structure. The first circuit structure has a first line terminal. The second circuit structure has a second line terminal. The first line terminal and the second line terminal are formed in a first circuit layer but separated by a gap. A conductive structure is forming in a second circuit layer above or below the first circuit layer, to electrically connect the first line terminal and the second line terminal.

公开(公告)号：US20190206459A1

公开(公告)日：2019-07-04

申请号：US15992130

申请日：2018-05-29

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Tien-Yu Lu ,  Chun-Hsien Huang ,  Ching-Cheng Lung ,  Yu-Tse Kuo ,  Shou-Sian Chen ,  Koji Nii ,  Yuichiro Ishii

IPC: G11C8/16 ,  G11C8/08 ,  G11C7/12 ,  G11C11/412 ,  H01L27/11

CPC classification number: G11C8/16 ,  G11C5/025 ,  G11C7/12 ,  G11C7/18 ,  G11C8/08 ,  G11C8/14 ,  G11C11/412 ,  G11C11/418 ,  G11C11/419 ,  H01L27/11

Abstract: A dual port static random access memory (DPSRAM) cell includes a first power line, a first bit line and a second bit line. The first power line is disposed between a first word line and a second word line. The first bit line is disposed between the first word line and the first power line. The second bit line is disposed between the second word line and the first power line.

公开(公告)号：US09941288B2

公开(公告)日：2018-04-10

申请号：US15635190

申请日：2017-06-27

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Chun-Hsien Huang ,  Yu-Tse Kuo ,  Shu-Ru Wang

IPC: H01L21/336 ,  H01L27/11 ,  H01L29/78 ,  H01L29/66

CPC classification number: H01L29/6681 ,  H01L27/1104 ,  H01L27/1116 ,  H01L29/785

Abstract: A static random-access memory (SRAM) cell array forming method includes the following steps. A plurality of fin structures are formed on a substrate, wherein the fin structures include a plurality of active fins and a plurality of dummy fins, each PG (pass-gate) FinFET shares at least one of the active fins with a PD (pull-down) FinFET, and at least one dummy fin is disposed between the two active fins having two adjacent pull-up FinFETs thereover in a static random-access memory cell. At least a part of the dummy fins are removed. The present invention also provides a static random-access memory (SRAM) cell array formed by said method.

公开(公告)号：US20170323894A1

公开(公告)日：2017-11-09

申请号：US15186548

申请日：2016-06-20

Applicant: UNITED MICROELECTRONICS CORP.

Inventor： Shu-Wei Yeh ,  Tsung-Hsun Wu ,  Chih-Ming Su ,  Yu-Tse Kuo

IPC: H01L27/11 ,  H01L29/10 ,  H01L27/088 ,  H01L27/02 ,  H01L23/532 ,  H01L29/423 ,  H01L23/528

CPC classification number: H01L27/1104 ,  G11C8/14 ,  G11C11/412 ,  G11C11/418 ,  G11C14/0054 ,  H01L27/0207 ,  H01L27/0924

Abstract: A layout pattern of a static random access memory includes a pull-up device, a first pull-down device, a second pull-up device, a second pull-down device, a first pass gate device and a second pass gate device disposed on a substrate. A plurality of fin structures are disposed on the substrate, and the fin structures include at least one first fin structure and at least one second fin structure. A J-shaped gate structure is disposed on the substrate, including a long part, a short part and a bridge part. At least one first extending contact structure crosses over the at least one first fin structure and the at least one second fin structure, wherein the at least one first extending contact structure does not overlap with the bridge part of the J-shaped gate structure.