公开(公告)号：US09352959B1

公开(公告)日：2016-05-31

申请号：US14541065

申请日：2014-11-13

Applicant: MASSACHUSETTS INSTITUTE OF TECHNOLOGY

Inventor： Vladimir Bulovic ,  Jeffrey Hastings Lang ,  Annie I-Jen Wang ,  Apoorva Murarka ,  Wendi Chang

IPC: H01L29/84 ,  H01L21/30 ,  B81C1/00 ,  B81C3/00 ,  H01S5/187 ,  H01S5/10 ,  H01S5/06 ,  G01L11/02 ,  G01L9/00

CPC classification number: B81C1/00158 ,  B81B2201/042 ,  B81C1/00182 ,  B81C1/00634 ,  B81C2201/0194 ,  G01L9/0005 ,  G01L9/0072 ,  G01L11/02 ,  G02B26/001 ,  G02B26/0825 ,  G02B26/0841 ,  H01L29/84 ,  H01S5/0607 ,  H01S5/1039 ,  H01S5/187

Abstract: The disclosure relates to method and apparatus for micro-contact printing of micro-electromechanical systems (“MEMS”) in a solvent-free environment. The disclosed embodiments enable forming a composite membrane over a parylene layer and transferring the composite structure to a receiving structure to form one or more microcavities covered by the composite membrane. The parylene film may have a thickness in the range of about 100 nm-2 microns; 100 nm-1 micron, 200-300 nm, 300-500 nm, 500 nm to 1 micron and 1-30 microns. Next, one or more secondary layers are formed over the parylene to create a composite membrane. The composite membrane may have a thickness of about 100 nm to 700 nm to several microns. The composite membrane's deflection in response to external forces can be measured to provide a contact-less detector. Conversely, the composite membrane may be actuated using an external bias to cause deflection commensurate with the applied bias. Applications of the disclosed embodiments include tunable lasers, microphones, microspeakers, remotely-activated contact-less pressure sensors and the like.

公开(公告)号：US20160124215A1

公开(公告)日：2016-05-05

申请号：US14971070

申请日：2015-12-16

Applicant: Intel Corporation

Inventor： Barak Freedman ,  Nikolai Berkovitch ,  Arnon Hirshberg

IPC: G02B26/08 ,  H02K15/06 ,  G02B26/10 ,  H02K7/14 ,  H02K1/22 ,  H02K1/17 ,  H02K15/02 ,  B81B7/02

CPC classification number: G02B26/085 ,  B81B3/0091 ,  B81B2201/042 ,  B81B2203/0154 ,  B81B2203/058 ,  B81B2207/012 ,  B81B2207/07 ,  G02B26/101 ,  H02K33/18 ,  H02K2201/18

Abstract: Embodiments of the present disclosure are directed toward an apparatus comprising a frameless MEMS device with a two-dimensional (2D) mirror, in accordance with some embodiments. The apparatus may include a base and a MEMS device disposed on the base. The MEMS device may comprise a rotor having a driving coil disposed around the rotor that is partially rotatable around a first axis, in response to interaction of a first magnetic field provided parallel to the first axis, with electric current to pass through the driving coil. The MEMS device may include a mirror disposed about a middle of the rotor. The mirror may be partially rotatable around a second axis coupled with the rotor and orthogonal to the first axis, in response to interaction of a second magnetic field provided parallel to the second axis, with electric current to pass through the coil. Other embodiments may be described and/or claimed.

Abstract translation: 根据一些实施例，本公开的实施例涉及一种包括具有二维（2D）镜的无框MEMS装置的装置。 该装置可以包括设置在基座上的底座和MEMS装置。 MEMS器件可包括转子，该转子具有围绕转子设置的驱动线圈，该驱动线圈响应于平行于第一轴线的第一磁场的相互作用而与第一轴线部分旋转，并与电流通过驱动线圈。 MEMS器件可以包括围绕转子的中间设置的反射镜。 响应于平行于第二轴设置的第二磁场与电流通过线圈的相互作用，反射镜可以围绕与转子耦合并与第一轴垂直的第二轴部分地旋转。 可以描述和/或要求保护其他实施例。

公开(公告)号：US09268129B2

公开(公告)日：2016-02-23

申请号：US14215088

申请日：2014-03-17

Applicant: LITE-ON IT CORPORATION

Inventor： Chia-Hao Hsu ,  Yu-Nan Tsai

IPC: G02B26/08 ,  G02B26/10

CPC classification number: G02B26/0841 ,  B81B2201/042 ,  B81C99/003 ,  G02B26/105

Abstract: The invention provides a driving calibration apparatus of an electrostatic MEMS scanning mirror and a driving calibration method thereof The driving calibration method includes the following steps. Different reference voltages are sequentially set to drive a plane mirror of the electrostatic MEMS scanning mirror to swing. Projection positions on a projected surface corresponding to the reference voltages that the laser beam projects to are determined. A driving lookup table is established according to the reference voltages and the corresponding projection positions. Calibrated driving voltages corresponding to ideal projection positions are determined according to the driving lookup table. The pane mirror is driven to swing according to the calibrated driving voltages.

Abstract translation: 本发明提供静电MEMS扫描镜的驱动校准装置及其驱动校准方法。驱动校准方法包括以下步骤。 依次设置不同的参考电压以驱动静电MEMS扫描镜的平面镜摆动。 确定与激光束投射到的参考电压相对应的投影表面上的投影位置。 根据参考电压和相应的投影位置建立驱动查找表。 根据驱动查找表确定对应于理想投影位置的校准驱动电压。 根据校准的驱动电压驱动窗格反射镜进行摆动。

公开(公告)号：US09268128B2

公开(公告)日：2016-02-23

申请号：US14430078

申请日：2013-09-19

Applicant: SUMITOMO PRECISION PRODUCTS CO., LTD.

Inventor： Tokiko Misaki

IPC: G02B26/10 ,  B29D11/00 ,  G02B26/08 ,  B81C1/00

CPC classification number: G02B26/0816 ,  B81B2201/042 ,  B81C1/00 ,  B81C1/00142 ,  G02B26/0858

Abstract: A portion of an SiO2 layer 240 on a peripheral portion 255 of an actuator body portion 251 is left on the surface of the actuator body portion 251 when it is etched so as to extend over the outside of the piezoelectric element 4. When the third resist mask 330 covering the actuator body portion 251 and the mirror portion 252 is formed and etching is performed, the third resist mask 330 has a first slit 331 and a second slit 332, the second slit 332 exposing a peripheral portion 256 of a mirror portion 252, and the first slits 331 exposing a peripheral portion 256 of the actuator body portion 251 and a portion of the SiO2 layer 240 on the actuator body portion 251, and having a width wider than the second slit 332.

Abstract translation: 致动器主体部分251的周边部分255上的SiO 2层240的一部分在蚀刻时留在致动器主体部分251的表面上，以便在压电元件4的外侧延伸。当第三抗蚀剂 形成覆盖致动器主体部分251和镜部分252的掩模330，并且进行蚀刻，第三抗蚀剂掩模330具有第一狭缝331和第二狭缝332，第二狭缝332暴露镜部分252的周边部分256 以及第一狭缝331，其暴露致动器主体部分251的周边部分256和致动器主体部分251上的SiO 2层240的一部分，并且具有比第二狭缝332宽的宽度。

公开(公告)号：US20150355458A1

公开(公告)日：2015-12-10

申请号：US14300392

申请日：2014-06-10

Applicant: Shuyun (Steve) Wu ,  Jing Zhao

Inventor： Shuyun (Steve) Wu ,  Jing Zhao

IPC: G02B26/08 ,  B81C1/00

CPC classification number: G02B26/0833 ,  B81B3/0051 ,  B81B3/0086 ,  B81B2201/042 ,  B81B2203/0118 ,  B81B2203/0307 ,  B81B2203/0384 ,  B81B2203/058 ,  B81C1/00523 ,  G02B26/0841

Abstract: The present disclosure provides a micro-machined switchable optical mirror device with a fast response speed. The mirror device includes a substrate defining a gap space, and a mirror assembly disposed on the substrate and deflectable in the gap space, the mirror assembly including a free end cantilever and a reflector on the cantilever, wherein the cantilever is anchored on the substrate adjacent a side of the gap space through an elastic member. In one aspect, the mirror device further includes a stop spring at an end of the cantilever opposing the elastic member.

Abstract translation: 本公开提供了一种具有快速响应速度的微加工的可切换光学镜装置。 反射镜装置包括限定间隙空间的基板和设置在基板上并可在间隙空间中偏转的反射镜组件，反射镜组件包括自由端悬臂和悬臂上的反射器，其中悬臂锚定在相邻的基板上 通过弹性构件的间隙空间的一侧。 在一个方面，镜装置还包括在悬臂的与弹性构件对置的端部处的止动弹簧。

公开(公告)号：US20150338643A1

公开(公告)日：2015-11-26

申请号：US14350580

申请日：2013-10-22

Applicant: Primesense Ltd

Inventor： Raviv Erlich ,  Yuval Gerson ,  Alexander Shpunt

IPC: G02B26/08 ,  G02B26/10 ,  B81C1/00

CPC classification number: G02B26/0833 ,  B81B2201/042 ,  B81B2203/0109 ,  B81C1/00484 ,  B81C1/00904 ,  G02B26/085 ,  G02B26/101 ,  H01L2924/0002 ,  H01L2924/0001

Abstract: A method for fabrication of a device (206) from a wafer (170) of semiconductor material includes locally thinning the wafer in an area of the device to a predefined thickness by removing the semiconductor material from at least a first side of the wafer using a wet etching process, and etching through the thinned wafer in the area of the device so as to release a moving part (202) of the device. Other methods and systems for fabrication are also described.

Abstract translation: 用于从半导体材料的晶片（170）制造器件（206）的方法包括通过使用以下步骤从晶片的至少第一侧移除半导体材料，将器件的区域中的晶片局部变薄到预定厚度 湿蚀刻工艺，以及通过设备区域中的薄化晶片进行蚀刻，以释放器件的移动部件（202）。 还描述了用于制造的其它方法和系统。

公开(公告)号：US09181086B1

公开(公告)日：2015-11-10

申请号：US14039149

申请日：2013-09-27

Applicant: Ronald N. Miles ,  Weili Cui

Inventor： Ronald N. Miles ,  Weili Cui

IPC: H04R19/04 ,  B81C1/00 ,  B81B3/00

CPC classification number: H04R19/04 ,  B81B3/0027 ,  B81B3/007 ,  B81B2201/0257 ,  B81B2201/042 ,  B81B2203/0127 ,  B81B2207/053 ,  B81C1/00595 ,  H04R2201/003 ,  H04R2307/025

Abstract: A micromechanical structure, comprising a substrate having a through hole; a residual portion of a sacrificial oxide layer peripheral to the hole; and a polysilicon layer overlying the hole, patterned to have a planar portion; a supporting portion connecting the planar portion to polysilicon on the residual portion; polysilicon stiffeners formed extending beneath the planar portion overlying the hole; and polysilicon ribs surrounding the supporting portion, attached near a periphery of the planar portion. The polysilicon ribs extend to a depth beyond the stiffeners, and extend laterally beyond an edge of the planar portion. The polysilicon ribs are released from the substrate during manufacturing after the planar region, and reduce stress on the supporting portion.

Abstract translation: 一种微机械结构，包括具有通孔的基板; 在孔周围的牺牲氧化物层的残留部分; 以及覆盖所述孔的多晶硅层，被图案化成具有平面部分; 将所述平面部分连接到所述残余部分上的多晶硅的支撑部分; 形成在覆盖孔的平面部分下方形成的多晶硅加强件; 以及围绕支撑部分的多晶硅肋，附接在平面部分的周边附近。 多晶硅肋延伸到超出加强件的深度，并且横向延伸超过平面部分的边缘。 在平面区域之后的制造过程中，多晶硅肋从基板上释放，并且减小支撑部分的应力。

公开(公告)号：US09150959B2

公开(公告)日：2015-10-06

申请号：US13089596

申请日：2011-04-19

Applicant: Kenneth A. Abbott

Inventor： Kenneth A. Abbott

IPC: C23C14/56 ,  C23C14/24 ,  C23C16/44 ,  C23C16/455 ,  B81B3/00 ,  B05D1/00 ,  B05D1/18 ,  B03C3/017

CPC classification number: C23C14/564 ,  B03C3/017 ,  B05D1/185 ,  B05D1/60 ,  B81B3/0005 ,  B81B2201/042 ,  B81C2201/112 ,  C23C14/24 ,  C23C16/4402 ,  C23C16/45568 ,  C23C16/45578

Abstract: A vapor deposition system includes a filter-diffuser device connected to a vapor inlet within a vacuum chamber for simultaneously filtering inflowing vapor to remove particulate matter while injecting vapor containing perfluordecanoic acid (PFDA) into the chamber through radially arranged porous metal filters to enable the deposition of a uniform monolayer of PFDA molecules onto the surfaces of a micromechanical device, such as a digital micromirror device.

Abstract translation: 气相沉积系统包括连接到真空室内的蒸汽入口的过滤器 - 扩散器装置，用于同时过滤流入的蒸气以除去颗粒物质，同时通过径向布置的多孔金属过滤器将含有丙二酸（PFDA）的蒸汽喷射到室中，以使沉积 的PFDA分子的均匀单层到微机械装置的表面上，例如数字微镜装置。

公开(公告)号：US20150277106A1

公开(公告)日：2015-10-01

申请号：US14636470

申请日：2015-03-03

Applicant: TOYOTA JIDOSHA KABUSHIKI KAISHA

Inventor： Takashi OZAKI ,  Norikazu OOTA ,  Norio FUJITSUKA ,  Kazuya ASAOKA

IPC: G02B26/08 ,  B81B7/00

CPC classification number: G02B26/0841 ,  B81B7/008 ,  B81B2201/042 ,  B81B2203/04 ,  B81B2203/058

Abstract: The MEMS device includes MEMS units and a circuit board. Each MEMS unit includes a substrate, a movable part with a movable electrode, a driving electrode, a diagnosis electrode, a plurality of through electrodes, and a plurality of MEMS side electrical contacts. The circuit board includes a plurality of circuit side electrical contacts, a drive circuit that is connected electrically with the driving electrode and the movable electrode through the circuit side electrical contact, the MEMS side electrical contact, and the through electrode, and a diagnosis circuit that is connected electrically with the diagnosis electrode and the movable electrode through the circuit side electrical contact, the MEMS side electrical contact, and the through electrode. The diagnosis electrodes of at least two MEMS units are connected electrically with each other, and are connected to a same MEMS side electrical contact through a same through electrode.

Abstract translation: MEMS器件包括MEMS单元和电路板。 每个MEMS单元包括基板，具有可移动电极的可移动部分，驱动电极，诊断电极，多个通孔电极和多个MEMS侧电触头。 电路板包括多个电路侧电触点，通过电路侧电触头与MEMS驱动电极和可动电极电连接的驱动电路，MEMS侧电触头和贯通电极，以及诊断电路， 通过电路侧电接触，MEMS侧电接触和通电电极与诊断电极和可动电极电连接。 至少两个MEMS单元的诊断电极彼此电连接，并且通过相同的通过电极连接到相同的MEMS侧电接触。

公开(公告)号：US09090456B2

公开(公告)日：2015-07-28

申请号：US12619521

申请日：2009-11-16

Applicant: Nassim Khonsari

Inventor： Nassim Khonsari

IPC: H05K3/02 ,  B81B7/00

CPC classification number: B81B7/007 ,  B81B2201/042 ,  B81B2207/07 ,  B81B2207/098 ,  B81C2201/0184 ,  B81C2203/0109 ,  Y10T29/49002 ,  Y10T29/51

Abstract: A system and method for manufacturing a display device having an electrically connected front plate and back plate are disclosed. In one embodiment, the method comprises printing conductive raised contours onto a non-conductive back plate, aligning the back plate with a non-conductive front plate such that the raised contours align with conductive routings on the front plate to electrically connect the raised contours and the routings, and sealing the back plate and the front plate.

Abstract translation: 公开了一种用于制造具有电连接的前板和背板的显示装置的系统和方法。 在一个实施例中，该方法包括将导电凸起轮廓印刷到非导电背板上，将该背板与不导电的前板对准，使得凸起轮廓与前板上的导电路线对准以电连接凸起轮廓和 路由，并密封后板和前板。