公开(公告)号：US2280618A

公开(公告)日：1942-04-21

申请号：US26376339

申请日：1939-03-23

Applicant: GEN ELECTRIC

Inventor： RAOUL BESSON

IPC: H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US1930148A

公开(公告)日：1933-10-10

申请号：US48222230

申请日：1930-09-16

Applicant: GEN ELECTRIC

Inventor： MARCELLO PIRANI ,  HANS EWEST ,  MARTIN REGER

IPC: H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US1930097A

公开(公告)日：1933-10-10

申请号：US51537131

申请日：1931-02-12

Applicant: GEN ELECTRIC

Inventor： GILLES HOLST

IPC: H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US1905831A

公开(公告)日：1933-04-25

申请号：US37700929

申请日：1929-07-09

Applicant: GEN ELECTRIC

Inventor： HANS EWEST ,  MARCELLO PIRANI

IPC: H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US1826385A

公开(公告)日：1931-10-06

申请号：US11314726

申请日：1926-06-02

Applicant: CLAUDE NEON LIGHTS INC

Inventor： BECK LEO L

IPC: H01J61/28

CPC classification number: H01J61/28

公开(公告)号：US12119216B2

公开(公告)日：2024-10-15

申请号：US18336552

申请日：2023-06-16

Applicant: Beijing E-Town Semiconductor Technology Co., Ltd. ,  Mattson Technology, Inc.

Inventor： Michael X. Yang ,  Rolf Bremensdorfer ,  Dave Camm ,  Joseph Cibere ,  Dieter Hezler ,  Shawming Ma ,  Yun Yang

IPC: H01J61/073 ,  H01J61/28 ,  H01J61/52 ,  H01J61/86 ,  H05H1/48

CPC classification number: H01J61/86 ,  H01J61/0732 ,  H01J61/28 ,  H01J61/526 ,  H05H1/48

Abstract: Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

公开(公告)号：US20230352294A1

公开(公告)日：2023-11-02

申请号：US18336552

申请日：2023-06-16

Applicant: Beijing E-Town Semiconductor Technology Co., Ltd. ,  Mattson Technology, Inc.

Inventor： Michael X. Yang ,  Rolf Bremensdorfer ,  Dave Camm ,  Joseph Cibere ,  Dieter Hezler ,  Shawming Ma ,  Yun Yang

IPC: H01J61/86 ,  H01J61/073 ,  H05H1/48 ,  H01J61/52 ,  H01J61/28

CPC classification number: H01J61/86 ,  H01J61/0732 ,  H05H1/48 ,  H01J61/526 ,  H01J61/28

Abstract: Apparatus, systems, and methods for processing workpieces are provided. An arc lamp can include a tube. The arc lamp can include one or more inlets configured to receive water to be circulated through the arc lamp during operation as a water wall, the water wall configured to cool the arc lamp. The arc lamp can include a plurality of electrodes configured to generate a plasma in a forming gas introduced into the arc lamp via the one or more inlets. The forming gas can be or can include a mixture of a hydrogen gas and an inert gas, the hydrogen gas in the mixture having a concentration less than 4% by volume. The hydrogen gas can be introduced into the arc lamp prior to generating the plasma. The arc lamp may be used for processing workpieces.

公开(公告)号：US11631579B2

公开(公告)日：2023-04-18

申请号：US17225595

申请日：2021-04-08

Applicant: Ushio Denki Kabushiki Kaisha

Inventor： Noritaka Ashizawa

IPC: G03F7/20 ,  H01J61/06 ,  H01J61/02 ,  H01J61/28

Abstract: An extreme ultraviolet light source apparatus includes a disc-shaped cathode rotating about an axis, a disc-shaped anode rotating about an axis, an energy beam irradiation device irradiating a plasma raw material on the cathode with an energy beam to vaporize the plasma raw material, a power supply for causing a discharge between the cathode and the anode for generating a plasma in the gap between the cathode and the anode to emit extreme ultraviolet light, and an irradiation position adjusting mechanism for adjusting a position at which the cathode is irradiated with the energy beam. The cathode, the anode, and the irradiation position adjusting mechanism are accommodated in a housing. A photography device is disposed outside the housing and is configured to photograph a visible-light image of a vicinity of the cathode and the anode, the vicinity including visible light emitted from the plasma.

公开(公告)号：US11521845B2

公开(公告)日：2022-12-06

申请号：US17018092

申请日：2020-09-11

Applicant: CANON KABUSHIKI KAISHA

Inventor： Hideki Matsumoto ,  Yasushi Sugiyama ,  Kohei Suzuki ,  Yukihiro Yokota ,  Shunsuke Ota

IPC: H01J61/28 ,  H01J61/32 ,  G03F7/20 ,  H01J61/36 ,  H01J61/30 ,  H01J61/20

Abstract: The present invention provides a lamp device comprising: a glass tube configured to cover a discharge space in which a pair of electrodes are arranged so as to face each other; and a bayonet cap portion provided in an end portion of the glass tube and electrically connected to one electrode of the pair of electrodes, wherein the bayonet cap portion is formed to have a shape including a bottom surface and a peripheral surface, and includes, in the bottom surface, a first opening configured to supply a gas to an inside of the bayonet cap portion and a second opening configured to exhaust the gas from the inside of the bayonet cap portion.

公开(公告)号：US11437228B2

公开(公告)日：2022-09-06

申请号：US17415163

申请日：2020-01-21

Applicant: PHOTOSCIENCE JAPAN CORPORATION

Inventor： Akihiro Inoue

IPC: H01J61/60 ,  H01J61/28 ,  H01J61/52

Abstract: A mercury discharge lamp includes: a discharge tube having encapsulated therein mercury in the form of an amalgam; and a temperature control member that controls an ambient temperature of the amalgam in such a manner as to compensate for a change in the ambient temperature of the amalgam. The temperature control member may include a bimetal supporting the amalgam at a predetermined position, and the support member is formed or constituted by a bimetal. By the bimetal deforming in response to a change in the ambient temperature of the amalgam, the temperature control member changes a spaced-apart distance of the amalgam to a filament within the discharge tube and thereby changes an influence of heat generation by the filament on the amalgam. The temperature control member may include, near the amalgam, a resistance element whose resistance value changes in response to a temperature to control heat generation thereby.