公开(公告)号：US12007590B2

公开(公告)日：2024-06-11

申请号：US16965172

申请日：2019-01-04

Applicant: ASML Netherlands B.V.

Inventor： Pieter Cristiaan De Groot ,  Johannes Jacobus Matheus Baselmans ,  Derick Yun Chek Chong ,  Yassin Chowdhury

IPC: G02B5/18 ,  G01M11/02 ,  G02B27/00 ,  G02B27/42 ,  G03F7/00

CPC classification number: G02B5/1819 ,  G01M11/0271 ,  G02B27/0012 ,  G02B27/4233 ,  G03F7/706

Abstract: A two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises a substrate provided with a square array of through-apertures, wherein the diffraction grating is self-supporting. It will be appreciated that for a substrate provided with a square array of through-apertures to be self-supporting at least some substrate material is provided between each through-aperture and the adjacent through apertures. A method of designing a two-dimensional diffraction grating for a phase-stepping measurement system for determining an aberration map for a projection system comprises: selecting a general geometry for the two-dimensional diffraction grating, the general geometry having at least one parameter; and selecting values for the least one parameter that result in a grating efficiency map for the two-dimensional diffraction grating so as to control the contributions to a first harmonic of a phase stepping signal.

公开(公告)号：US20240186106A1

公开(公告)日：2024-06-06

申请号：US18284839

申请日：2022-03-03

Applicant: ASML Netherlands B.V.

Inventor： Yongxin WANG ,  Bruno LA FONTAINE

IPC: H01J37/24 ,  H01J37/244

CPC classification number: H01J37/24 ,  H01J37/244

Abstract: An improved method of performing a self-diagnosis of a charged particle inspection system is disclosed. An improved method comprises triggering a self-diagnosis based on output data of the charged particle inspection system; in response to the triggering of the self-diagnosis, receiving diagnostic data of a sub-system of the charged particle inspection system; identifying an issue associated with the output data based on the diagnostic data of the sub-system; and generating a control signal to adjust an operation parameter of the sub-system according to the identified issue.

公开(公告)号：US20240184218A1

公开(公告)日：2024-06-06

申请号：US18441772

申请日：2024-02-14

Applicant: ASML Netherlands B.V.

Inventor： Nitesh PANDEY ,  Arie Jeffrey DEN BOEF ,  Duygu AKBULUT ,  Marinus Johannes Maria VAN DAM ,  Hans BUTLER ,  Hugo Augustinus Joseph CRAMER ,  Engelbertus Antonius Fransiscus VAN DER PASCH ,  Ferry ZIJP ,  Jeroen Arnoldus Leonardus Johannes RAAYMAKERS ,  Marinus Petrus REIJNDERS

IPC: G03F7/00 ,  G01N21/956

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F7/7015 ,  G03F7/70633

Abstract: A metrology tool for determining a parameter of interest of a structure fabricated on a substrate, the metrology tool comprising: an illumination optical system for illuminating the structure with illumination radiation under a non-zero angle of incidence; a detection optical system comprising a detection optical sensor and at least one lens for capturing a portion of illumination radiation scattered by the structure and transmitting the captured radiation towards the detection optical sensor, wherein the illumination optical system and the detection optical system do not share an optical element.

公开(公告)号：US20240184215A1

公开(公告)日：2024-06-06

申请号：US18286327

申请日：2022-03-23

Applicant: ASML Netherlands B.V.

Inventor： Jin LIAN ,  Armand Eugene Albert KOOLEN ,  Sebastianus Adrianus GOORDEN ,  Hui Quan LIM

IPC: G03F7/00

CPC classification number: G03F7/70516 ,  G03F7/70025 ,  G03F7/70633

Abstract: Disclosed is a method of determining a correction for a measurement of a target and an associated apparatus. The measurement is subject to a target-dependent correction parameter which has a dependence the target and/or a stack on which the target is comprised. The method comprises obtaining first measurement data relating to a measurement of a fiducial target, said first measurement data comprising at least a first and second set of intensity parameter values: and second measurement data relating to a measurement of the fiducial target, the second measurement data comprising a third set of intensity parameter values. A target-invariant correction parameter is determined from said first measurement data and second measurement data. the target-invariant correction parameter being a component of the target-dependent correction parameter which is not dependent on the target and/or a stack: and the correction is determined from said target-in-variant correction parameter.

公开(公告)号：US12001135B2

公开(公告)日：2024-06-04

申请号：US17413845

申请日：2019-12-16

Applicant: ASML NETHERLANDS B.V.

Inventor： Paul Janssen ,  Jan Hendrik Willem Kuntzel

IPC: G03F1/64 ,  G03F1/62

CPC classification number: G03F1/64 ,  G03F1/62

Abstract: A method of manufacturing a membrane assembly for EUV lithography, wherein a layer which forms at least part of a pellicle membrane is provided after one or more etching steps which define a pellicle border holding the pellicle membrane. Also provided is a pellicle substrate, the substrate including: a stack having a front face and back face, wherein one or more layers on the back face of the stack have been selectively removed to define a pellicle border region for holding the pellicle membrane before the layer which forms at least part of a pellicle membrane has been provided.

公开(公告)号：US11994806B2

公开(公告)日：2024-05-28

申请号：US17436947

申请日：2020-02-26

Applicant: ASML NETHERLANDS B.V.

Inventor： Alexandru Onose ,  Remco Dirks ,  Roger Hubertus Elisabeth Clementine Bosch ,  Sander Silvester Adelgondus Marie Jacobs ,  Frank Jaco Buijnsters ,  Siebe Tjerk De Zwart ,  Artur Palha Da Silva Clerigo ,  Nick Verheul

IPC: G03F7/00

CPC classification number: G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/706841 ,  G03F7/70616

Abstract: A method, computer program and associated apparatuses for metrology. The method includes determining a reconstruction recipe describing at least nominal values for use in a reconstruction of a parameterization describing a target. The method includes obtaining first measurement data relating to measurements of a plurality of targets on at least one substrate, the measurement data relating to one or more acquisition settings and performing an optimization by minimizing a cost function which minimizes differences between the first measurement data and simulated measurement data based on a reconstructed parameterization for each of the plurality of targets. A constraint on the cost function is imposed based on a hierarchical prior. Also disclosed is a hybrid model method comprising obtaining a coarse model operable to provide simulated coarse data; and training a data driven model to correct the simulated coarse data so as to determine simulated data for use in reconstruction.

公开(公告)号：US20240168394A1

公开(公告)日：2024-05-23

申请号：US18398860

申请日：2023-12-28

Applicant: ASML NETHERLANDS B.V.

Inventor： Stef Marten Johan JANSSENS ,  Bert Dirk SCHOLTEN ,  Sjoerd Nicolaas Lambertus DONDERS ,  Teunis VAN DAM ,  Peter Mark OVERSCHIE ,  Theresa Mary SPAAN-BURKE ,  Siegfried Alexander TROMP

IPC: G03F7/00 ,  H01L21/683

CPC classification number: G03F7/70725 ,  G03F7/707 ,  G03F7/70783 ,  G03F7/70816 ,  H01L21/6838 ,  H01L21/67288

Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.

公开(公告)号：US20240160110A1

公开(公告)日：2024-05-16

申请号：US18420091

申请日：2024-01-23

Applicant: ASML Netherlands B.V.

Inventor： Jasper WINTERS ,  Erwin John VAN ZWET ,  Marcus Johannes VAN DER LANS ,  Pieter Willem Herman DE JAGER ,  Geerten Frans Ijsbrand KRAMER

IPC: G03F7/00

CPC classification number: G03F7/70291 ,  G03F7/70508 ,  G03F7/70558

Abstract: A method for improved sequencing of light delivery in a lithographic process includes determining a sequence of intensities of light to be delivered that includes an interval within the sequence of intensities where substantially no light is delivered to the substrate and delivering light to a substrate by a light source utilizing a digital mirror device (DMD) according to the sequence of intensities.

公开(公告)号：US11984236B2

公开(公告)日：2024-05-14

申请号：US16743025

申请日：2020-01-15

Applicant: ASML NETHERLANDS B.V.

Inventor： Han-Kwang Nienhuys ,  Rilpho Ludovicus Donker ,  Gosse Charles De Vries

IPC: G03F7/00 ,  G02B5/02 ,  G21K1/06 ,  H01S3/23 ,  H05G2/00

CPC classification number: G21K1/067 ,  G02B5/0221 ,  G02B5/0268 ,  G02B5/0284 ,  G03F7/7005 ,  G03F7/70075 ,  G03F7/70991 ,  G03F7/70191 ,  G21K2201/064 ,  H01S3/2308 ,  H05G2/008

Abstract: A radiation system includes a beam splitting apparatus configured to split a main radiation beam into a plurality of branch radiation beams and a radiation alteration device arranged to receive an input radiation beam and output a modified radiation beam, wherein the radiation alteration device is configured to provide an output modified radiation beam which has an increased etendue, when compared to the received input radiation beam, wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a main radiation beam and the radiation alteration device is configured to provide a modified main radiation beam to the beam splitting apparatus, or wherein the radiation alteration device is arranged such that the input radiation beam which is received by the radiation alteration device is a branch radiation beam output from the beam splitting apparatus.

公开(公告)号：US11982946B2

公开(公告)日：2024-05-14

申请号：US17628668

申请日：2020-07-06

Applicant: ASML NETHERLANDS B.V. ,  ASML HOLDING N.V.

Inventor： Nikhil Mehta ,  Maurits Van Der Schaar ,  Markus Gerardus Martinus Maria Van Kraaij ,  Hugo Augustinus Joseph Cramer ,  Olger Victor Zwier ,  Jeroen Cottaar ,  Patrick Warnaar

IPC: G03F7/20 ,  G01N21/956 ,  G03F1/84 ,  G03F7/00

CPC classification number: G03F7/70625 ,  G01N21/956 ,  G03F1/84 ,  G03F7/70633

Abstract: A patterning device for patterning product structures onto a substrate and an associated substrate patterned using such a patterning device. The patterning device includes target patterning elements for patterning at least one target from which a parameter of interest can be inferred. The patterning device includes product patterning elements for patterning the product structures. The target patterning elements and product patterning elements are configured such that the at least one target has at least one boundary which is neither parallel nor perpendicular with respect to the product structures on the substrate.