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    Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same
    71.
    发明授权
    Chromatically corrected objective with specifically structured and arranged dioptric optical elements and projection exposure apparatus including the same 有权
    具有特定结构和布置的度数光学元件的色校正物镜和包括该光学元件的投影曝光设备

    公开(公告)号：US08345350B2

    公开(公告)日：2013-01-01

    申请号：US12621239

    申请日：2009-11-18

    Applicant: Alexander Epple ,  Heiko Feldmann ,  Hans-Juergen Rostalski

    Inventor： Alexander Epple ,  Heiko Feldmann ,  Hans-Juergen Rostalski

    IPC: G02B17/00

    CPC classification number: G03F7/70216 ,  G02B13/143 ,  G02B13/146 ,  G02B17/08 ,  G02B17/0892 ,  G02B27/0012 ,  G02B27/0025 ,  G03B27/54 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70375 ,  G03F7/706

    Abstract: An objective having a plurality of optical elements arranged to image a pattern from an object field to an image field at an image-side numerical aperture NA>0.8 with electromagnetic radiation from a wavelength band around a wavelength λ includes a number N of dioptric optical elements, each dioptric optical element i made from a transparent material having a normalized optical dispersion Δni=ni(λ0)−ni(λ0+1 pm) for a wavelength variation of 1 pm from a wavelength λ0. The objective satisfies the relation  ∑ i = 1 N ⁢ Δ ⁢ ⁢ n i ⁡ ( s i - d i )  λ 0 ⁢ NA 4 ≤ A for any ray of an axial ray bundle originating from a field point on an optical axis in the object field, where si is a geometrical path length of a ray in an ith dioptric optical element having axial thickness di and the sum extends on all dioptric optical elements of the objective. Where A=0.2 or below, spherochromatism is sufficiently corrected.

    Abstract translation: 具有多个光学元件的目标是将来自波长λ的波长带的电磁辐射从图像侧的数值孔径NA> 0.8到目标场的图像成像到多个光学元件，具有数量N的折射光学元件 对于波长为λ0的波长变化为1μm的透明材料制成的每个折射光学元件i由具有归一化光学色散的Dgr ni = ni（λ0）-ni（λ0+1μm）制成。 该目标满足关系式Σi= 1 N＆Dgr; 对于来自物场的光轴上的场点的轴射线束的任何射线，其中si是射线的几何路径长度，其中，si 具有轴向厚度di的第i个屈光光学元件，并且在物镜的所有光度光学元件上延伸。 如果A = 0.2或更低，则反射色素得到充分校正。

    MAGNIFYING IMAGING OPTICAL SYSTEM AND METROLOGY SYSTEM WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE
    72.
    发明申请
    MAGNIFYING IMAGING OPTICAL SYSTEM AND METROLOGY SYSTEM WITH AN IMAGING OPTICAL SYSTEM OF THIS TYPE 有权
    具有这种类型的成像光学系统的成像光学系统和计量系统

    公开(公告)号：US20120127566A1

    公开(公告)日：2012-05-24

    申请号：US13302147

    申请日：2011-11-22

    Applicant: Hans-Juergen Mann ,  Heiko Feldmann

    Inventor： Hans-Juergen Mann ,  Heiko Feldmann

    IPC: G02B17/06

    CPC classification number: G02B17/0663

    Abstract: A magnifying imaging optical system is disclosed that has precisely three mirrors, which image an object field in an object plane into an image field in an image plane. A ratio between a transverse dimension of the image field and a transverse dimension measured in the same direction of a useful face of the last mirror before the image field is greater than 3. In a further aspect, the magnifying imaging optical system is disclosed that has at least three mirrors, which image an object field in an object plane in an image field in an image plane. A first mirror in the beam path after the object field is concave, a second mirror is also concave and a third mirror is convex. An angle of incidence of imaging beams on the last mirror before the image field is less than 15°.

    Abstract translation: 公开了一种放大成像光学系统，其具有精确的三个反射镜，其将物平面中的物场映像成图像平面中的图像场。 图像场的横向尺寸与在图像场大于3之前的最后一个反射镜的有用面的相同方向上测量的横向尺寸之间的比。在另一方面，公开了放大成像光学系统，其具有 至少三个镜子，其在图像平面中的图像场中对物体平面中的物体场进行成像。 在物场之后的光束路径中的第一镜是凹的，第二镜也是凹的，第三镜是凸的。 在图像场之前的最后一个镜子上的成像光束的入射角小于15°。

    Imaging microoptics for measuring the position of an aerial image
    73.
    发明授权
    Imaging microoptics for measuring the position of an aerial image 有权
    用于测量空中图像位置的成像微光学

    公开(公告)号：US08164759B2

    公开(公告)日：2012-04-24

    申请号：US12722706

    申请日：2010-03-12

    Applicant: Hans-Juergen Rostalski ,  Heiko Feldmann

    Inventor： Hans-Juergen Rostalski ,  Heiko Feldmann

    IPC: G02B13/14

    CPC classification number: G03F7/70666 ,  G02B13/143

    Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.

    Abstract translation: 紧凑且坚固的成像微光学件包括至少一个非球面构件并且具有折叠的光束路径。 成像微光学提供放大| | bgr;'| > 800。 此外，用于相对于投影光学元件定位晶片的系统包括成像微光学，可定位在成像微光学图像平面中的图像传感器，用于测量投影光学器件的空间图像的位置，以及具有 致动器和用于根据图像传感器的输出信号定位晶片的控制器。

    IMAGING MICROOPTICS FOR MEASURING THE POSITION OF AN AERIAL IMAGE
    76.
    发明申请
    IMAGING MICROOPTICS FOR MEASURING THE POSITION OF AN AERIAL IMAGE 有权
    用于测量空气影像位置的成像微观测量

    公开(公告)号：US20100214565A1

    公开(公告)日：2010-08-26

    申请号：US12722706

    申请日：2010-03-12

    Applicant: Hans-Juergen Rostalski ,  Heiko Feldmann

    Inventor： Hans-Juergen Rostalski ,  Heiko Feldmann

    IPC: G01B11/14 ,  G02B11/04 ,  G03B27/52 ,  G02B11/18 ,  G01B11/00

    CPC classification number: G03F7/70666 ,  G02B13/143

    Abstract: An imaging microoptics, which is compact and robust, includes at least one aspherical member and has a folded beam path. The imaging microoptics provides a magnification |β′| of >800 by magnitude. Furthermore, a system for positioning a wafer with respect to a projection optics includes the imaging microoptics, an image sensor positionable in the image plane of the imaging microoptics, for measuring a position of an aerial image of the projection optics, and a wafer stage with an actuator and a controller for positioning the wafer in dependence of an output signal of the image sensor.

    Abstract translation: 紧凑且坚固的成像微光学件包括至少一个非球面构件并且具有折叠的光束路径。 成像微光学提供放大| | bgr;'| > 800。 此外，用于相对于投影光学元件定位晶片的系统包括成像微光学，可定位在成像微光学图像平面中的图像传感器，用于测量投影光学器件的空间图像的位置，以及具有 致动器和用于根据图像传感器的输出信号定位晶片的控制器。

    OPTICAL ARRANGEMENT FOR THREE-DIMENSIONALLY PATTERNING A MATERIAL LAYER
    78.
    发明申请
    OPTICAL ARRANGEMENT FOR THREE-DIMENSIONALLY PATTERNING A MATERIAL LAYER 审中-公开
    用于三维图形材料层的光学布置

    公开(公告)号：US20100112465A1

    公开(公告)日：2010-05-06

    申请号：US12607612

    申请日：2009-10-28

    Applicant: Heiko Feldmann

    Inventor： Heiko Feldmann

    IPC: G03F7/20 ,  G03B27/42 ,  G03F1/00

    CPC classification number: G03F7/70258 ,  G02B5/0236 ,  G02B5/0284 ,  G02B5/32 ,  G03F7/0037 ,  G03F7/201 ,  G03F7/70341 ,  G03F7/70416

    Abstract: The disclosure relates to an optical arrangement for three-dimensionally patterning a radiation-sensitive material layer, such as a projection exposure apparatus for microlithography. The optical arrangement includes a mask for forming a three-dimensional radiation pattern, a substrate with the radiation-sensitive material layer, and a projection optical unit for imaging the three-dimensional radiation pattern from the mask into the radiation-sensitive material layer. The optical arrangement is designed to compensate for spherical aberrations along the thickness direction of the radiation-sensitive material layer in order to generate a stigmatic image of the three-dimensional radiation pattern.

    Abstract translation: 本公开涉及用于三维图案化辐射敏感材料层的光学装置，例如用于微光刻的投影曝光装置。 光学装置包括用于形成三维辐射图案的掩模，具有辐射敏感材料层的基板和用于将三维辐射图案从掩模成像到辐射敏感材料层中的投影光学单元。 光学布置被设计为补偿沿着辐射敏感材料层的厚度方向的球面像差，以便产生三维辐射图案的连续图像。

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