公开(公告)号：US06916370B2

公开(公告)日：2005-07-12

申请号：US10345056

申请日：2003-01-15

Applicant: Hiroyuki Watanabe

Inventor： Hiroyuki Watanabe

IPC: C03B20/00 ,  C03B19/09 ,  C30B15/10 ,  C30B29/06 ,  C30B13/02

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C03B2201/50 ,  C30B15/10 ,  Y02P40/57 ,  Y10S117/90 ,  Y10T117/1032 ,  Y10T117/1052

Abstract: An object of the invention is to provide a quartz glass crucible for pulling up silicon single crystal and a method for producing the same, suitable for improving the productivity of the crucible and the quality of the silicon single crystal, which, by forming a crystalline layer on the inner surface of the quartz glass crucible during pulling up silicon single crystal, prevents degradation from occurring on the inner surface of the crucible and increases the ratio of single crystal while preventing the dislocation from forming on the single crystals. The objects above have been accomplished by a quartz glass crucible for pulling up silicon single crystal, having a double layered structure comprising a naturally occurring quartz glass outer layer and a synthetic quartz glass inner layer, said synthetic quartz glass inner layer contains at least one type of an alkali metal ion selected from the group consisting of Na ion, K ion, and Li ion, which is diffused or moved from said naturally occurring quartz glass outer layer into said synthetic quartz glass inner layer.

Abstract translation: 本发明的目的是提供一种用于提升硅单晶的石英玻璃坩埚及其制造方法，其适用于提高坩埚的生产率和硅单晶的质量，通过形成晶体层 在提升硅单晶时在石英玻璃坩埚的内表面上，防止在坩埚的内表面上发生劣化，并增加单晶的比例，同时防止在单晶上形成位错。 上述目的已经通过用于提拉硅单晶的石英玻璃坩埚来实现，其具有包括天然存在的石英玻璃外层和合成石英玻璃内层的双层结构，所述合成石英玻璃内层包含至少一种类型 选自Na离子，K离子和Li离子的碱金属离子，其从所述天然存在的石英玻璃外层扩散或移动到所述合成石英玻璃内层中。

公开(公告)号：US20050031867A1

公开(公告)日：2005-02-10

申请号：US10893123

申请日：2004-07-16

Applicant: Imtiaz Majid ,  Abdel Soufiane ,  Kanxian Wei ,  Gary Drenzek ,  Chih-Hao Wang

Inventor： Imtiaz Majid ,  Abdel Soufiane ,  Kanxian Wei ,  Gary Drenzek ,  Chih-Hao Wang

IPC: C03B37/012 ,  C03B37/027 ,  C03C25/10 ,  G02B6/02 ,  G02B6/032 ,  G02B6/44 ,  D02G3/00

CPC classification number: G02B6/032 ,  C03B37/01211 ,  C03B37/0122 ,  C03B37/01231 ,  C03B37/02781 ,  C03B2201/03 ,  C03B2203/14 ,  C03B2205/10 ,  C03C25/104 ,  G02B6/02 ,  G02B6/02333 ,  G02B6/02361 ,  G02B6/02366 ,  G02B6/4492 ,  Y10T428/292 ,  Y10T428/2933 ,  Y10T428/2964 ,  Y10T428/2975

Abstract: An optical fiber includes a glass fiber having a glass core and a cladding which contains voids spaced apart from the core. The voids act as trapping sites for ingressing molecules from the surrounding environment, thereby reducing the effect of such molecules on the fiber's light-transmission properties.

Abstract translation: 一种光纤包括具有玻璃纤芯和包层的玻璃纤维，该玻璃纤维包含与芯部间隔开的空隙。 空隙作为从周围环境进入分子的捕集位点，从而降低这种分子对纤维光透射性能的影响。

公开(公告)号：US20040216486A1

公开(公告)日：2004-11-04

申请号：US10825890

申请日：2004-04-15

Applicant: Wacker-Chemie GmbH

Inventor： Fritz Schwertfeger ,  Holger Szillat ,  Jan Tabellion ,  Rolf Clasen

IPC: C03B008/02

CPC classification number: C25D1/14 ,  C03B19/06 ,  C03B19/066 ,  C03B20/00 ,  C03B2201/03 ,  C03B2201/04 ,  C30B35/002

Abstract: A method for the production of a homogenous, shaped SiO2 body of near net shape wherein amorphous SiO2 particles comprising relatively large amorphous SiO2 particles and relatively small amorphous SiO2 particles are electrophoretically deposited from an aqueous dispersion on an electrically nonconductive membrane, the shape and geometry of which correspond to the shaped SiO2 body to be produced, wherein the membrane has an average pore size which is larger than the average particle size of the smaller amorphous SiO2 particles.

Abstract translation: 用于生产近净形状的均匀的成型SiO 2体的方法，其中包含相对大的无定形SiO 2颗粒和相对小的无定形SiO 2颗粒的无定形SiO 2颗粒从电绝缘膜上的水性分散体电泳沉积，其形状和几何形状 其对应于待生产的成型SiO 2体，其中所述膜的平均孔径大于所述较小的非晶SiO 2颗粒的平均粒径。

公开(公告)号：US20040161375A1

公开(公告)日：2004-08-19

申请号：US10758395

申请日：2004-01-16

Applicant: MITSUBISHI CHEMICAL CORPORATION

Inventor： Yoshio Katsuro ,  Keiji Yamahara ,  Takashi Yamaguchi ,  Yutaka Mori

IPC: C03C003/06 ,  C01B033/12

CPC classification number: C03C1/006 ,  C03B19/01 ,  C03B19/09 ,  C03B19/1065 ,  C03B19/1095 ,  C03B2201/03 ,  C03C3/06 ,  C03C12/00 ,  C03C2201/02 ,  C03C2203/26

Abstract: Subjects for the invention are to obtain a quartz powder having a high purity and high quality and a process for producing the same and to obtain a glass molding formed by melting and molding the powder and extremely reduced in bubble inclusion. The invention provides a quartz powder, preferably a synthetic quartz powder obtained by the sol-gel method, which, upon heating from room temperature to 1,700null C., generates gases in which the amount of CO is 300 nl/g or smaller and the amount of CO2 is 30 nl/g or smaller.

Abstract translation: 本发明的目的是获得具有高纯度和高质量的石英粉及其制造方法，并获得通过熔融和成型粉末形成并且气泡夹杂物极度降低的玻璃模制品。 本发明提供一种石英粉末，优选通过溶胶 - 凝胶法获得的合成石英粉末，其在室温至1700℃加热时产生CO的量为300nl / g或更小的气体， CO 2的量为30nl / g以下。

公开(公告)号：US20030159646A1

公开(公告)日：2003-08-28

申请号：US10345056

申请日：2003-01-15

Inventor： Hiroyuki Watanabe

IPC: C30B015/00 ,  C30B021/06 ,  C30B027/02 ,  C30B028/10 ,  C30B030/04

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C03B2201/50 ,  C30B15/10 ,  Y02P40/57 ,  Y10S117/90 ,  Y10T117/1032 ,  Y10T117/1052

Abstract: An object of the invention is to provide a quartz glass crucible for pulling up silicon single crystal and a method for producing the same, suitable for improving the productivity of the crucible and the quality of the silicon single crystal, which, by forming a crystalline layer on the inner surface of the quartz glass crucible during pulling up silicon single crystal, prevents degradation from occurring on the inner surface of the crucible and increases the ratio of single crystal while preventing the dislocation from forming on the single crystals. The objects above have been accomplished by a quartz glass crucible for pulling up silicon single crystal, having a double layered structure comprising a naturally occurring quartz glass outer layer and a synthetic quartz glass inner layer, said synthetic quartz glass inner layer contains at least one type of an alkali metal ion selected from the group consisting of Na ion, K ion, and Li ion, which is diffused or moved from said naturally occurring quartz glass outer layer into said synthetic quartz glass inner layer.

Abstract translation: 本发明的目的是提供一种用于提升硅单晶的石英玻璃坩埚及其制造方法，其适用于提高坩埚的生产率和硅单晶的质量，通过形成晶体层 在提升硅单晶时在石英玻璃坩埚的内表面上，防止在坩埚的内表面上发生劣化，并增加单晶的比例，同时防止在单晶上形成位错。 上述目的已经通过用于提拉硅单晶的石英玻璃坩埚来实现，其具有包括天然存在的石英玻璃外层和合成石英玻璃内层的双层结构，所述合成石英玻璃内层包含至少一种类型 选自Na离子，K离子和Li离子的碱金属离子，其从所述天然存在的石英玻璃外层扩散或移动到所述合成石英玻璃内层中。

公开(公告)号：US06406552B1

公开(公告)日：2002-06-18

申请号：US09453762

申请日：1999-12-02

Applicant: Andreas Schultheis

Inventor： Andreas Schultheis

IPC: B08B700

CPC classification number: C03C1/022 ,  C03B19/095 ,  C03B19/102 ,  C03B19/1095 ,  C03B2201/03 ,  C03C1/026

Abstract: A method for the cleaning of SiO2 grain is known whereby SiO2 grain comprising contaminations is heated to a temperature at which the contaminations soften or form melting agglomerates with the SiO2 grain, thus separating the contaminations and the SiO2 grain. On this basis and to specify a method which achieves high grain purity at comparatively little expenditure of time, material and costs, and to provide a simple device suitable for the implementation of the method, it is proposed according to the invention that the SiO2 grain is fed to and heated in a gas stream which is directed towards an impingement plate, the SiO2 grain being accelerated in the direction of the impingement plate such that softened contaminations or melting agglomerates adhere to the impingement plate and cleaned SiO2 grain is removed from the impingement plate. A simple device suitable for the implementation of the method is provided with a burner into which a burner gas is introduced for a, burner gas flame, and a feeder device by means of which the SiO2 grain containing contaminations is fed to the burner gas or the burner gas flame, as well as an impingement plate toward which the burner gas flame is directed.

Abstract translation: 已知一种用于清洁SiO 2颗粒的方法，其中包含污染物的SiO 2颗粒被加热至污染物与SiO 2晶粒软化或形成熔融附聚物的温度，从而分离污染物和SiO 2颗粒。 在此基础上，指出了在相对较少的时间，材料和成本支出下实现高晶粒纯度的方法，并提供了适用于该方法的简单装置，根据本发明，提出了SiO 2晶粒是 进料到被引导到冲击板的气流中并在其中被加热，SiO 2颗粒沿着冲击板的方向被加速，使得软化的污染物或熔化的附聚物粘附到冲击板，并且清洁的SiO 2颗粒从冲击板 。 适用于实施该方法的简单装置设置有燃烧器，燃烧器气体被引入燃烧器气体火焰中，并且馈送装置通过该燃烧器将含有二氧化硅颗粒的污染物供给到燃烧器气体或 燃烧器气体火焰以及燃烧器气体火焰所引导的冲击板。

公开(公告)号：US5861047A

公开(公告)日：1999-01-19

申请号：US939142

申请日：1997-09-29

Applicant: James William Fleming, Jr. ,  Robert M. Pafchek

Inventor： James William Fleming, Jr. ,  Robert M. Pafchek

IPC: C03B29/02 ,  C03B37/012 ,  C03B37/014 ,  C03C23/00 ,  C03C25/62 ,  C03B37/018

CPC classification number: C03C25/6293 ,  C03B29/02 ,  C03B37/01237 ,  C03B37/0148 ,  C03B37/01493 ,  C03C23/006 ,  C03B2201/03 ,  C03B2201/04

Abstract: A refractory dielectric body is heated with a plasma torch at conditions which do not result in substantial removal of a surface portion of the body, yet which are sufficient to reduce both surface and bulk impurities. Typically, the body is solid, e.g., a rod as opposed to a tube, and is treated with the plasma in the absence of simultaneous deposition of material onto the body. Advantageously, an isothermal plasma torch is utilized, and the torch advantageously produces an oxygen or oxygen-containing plasma. The invention is useful for reducing chlorine impurities by at least about 30% to a depth of at least about 10 .mu.m, with accompanying reduction of hydroxyl impurities. The invention thus provides a useful method for reducing the concentration of impurities that contribute to imperfections during the process of drawing fiber from an optical fiber preform, without requiring substantial removal of the surface of the preform.

Abstract translation: 耐火电介质体在等离子体焰炬的条件下被加热，其条件不会导致本体的表面部分的实质去除，而这足以减少表面和体积杂质。 通常，身体是固体的，例如与管相反的杆，并且在没有材料同时沉积到身体上的情况下用等离子体处理。 有利地，使用等温等离子体焰炬，并且炬有利地产生含氧或含氧的等离子体。 本发明可用于将氯杂质减少至少约30％至至少约10μm的深度，伴随着羟基杂质的减少。 因此，本发明提供了一种有用的方法，用于在从纤维预制棒中拉伸纤维的过程中减少有助于缺陷的杂质的浓度，而不需要基本上去除预型体的表面。

公开(公告)号：US4426216A

公开(公告)日：1984-01-17

申请号：US337451

申请日：1982-01-06

Applicant: Shin Satoh ,  Kenzo Susa ,  Iwao Matsuyama ,  Tsuneo Suganuma

Inventor： Shin Satoh ,  Kenzo Susa ,  Iwao Matsuyama ,  Tsuneo Suganuma

IPC: C03B19/12 ,  C03C1/00 ,  C03B19/06

CPC classification number: C03B19/12 ,  C03C1/006 ,  C03B2201/02 ,  C03B2201/03 ,  C03B2201/04 ,  C03B2201/06 ,  C03B2201/07 ,  C03B2201/075 ,  Y10S65/901

Abstract: Optical glass is produced by heating a porous gel to a high temperature to partly sinter it, heating it in a chlorine-containing atmosphere to subject it to hydroxyl group removal treatment, and then further heating it to sinter it. The optical glass produced by this process does not rise in bubbles even when heated.

Abstract translation: 通过将多孔凝胶加热至高温部分烧结而制成光学玻璃，在含氯气氛中加热，进行羟基去除处理，然后进一步加热烧结。 通过该方法制造的光学玻璃即使在加热时也不会起泡。

公开(公告)号：US10005693B2

公开(公告)日：2018-06-26

申请号：US15118368

申请日：2015-02-16

Applicant: TOSOH CORPORATION

Inventor： Satori Hirai ,  Nobusuke Yamada ,  Kazuyoshi Arai

IPC: C03C11/00 ,  C03B19/06 ,  C03B19/08

CPC classification number: C03C11/00 ,  C03B19/066 ,  C03B19/08 ,  C03B2201/03 ,  C03C3/06 ,  C03C2201/02 ,  C03C2201/80 ,  C03C2204/06

Abstract: To provide opaque quartz glass having no water absorbing properties and being excellent in infrared light shielding properties, and a method for its production. In the production of opaque quartz glass of the present invention, a fine amorphous silica powder and a pore forming agent are mixed, then molded and heated at a predetermined temperature, to obtain opaque quartz glass wherein contained pores are closed pores, the average pore size of pores is from 5 to 20 μm, and the content density of pores is high, whereby the heat shielding properties are high.

公开(公告)号：US20150114284A1

公开(公告)日：2015-04-30

申请号：US14398880

申请日：2014-03-25

Applicant: SHIN-ETSU QUARTZ PRODUCTS CO., LTD.

Inventor： Shigeru Yamagata

IPC: C03B19/09 ,  C30B15/10

CPC classification number: C03B19/095 ,  C03B2201/03 ,  C03B2201/04 ,  C30B15/10 ,  C30B29/06 ,  C30B35/002 ,  Y10T117/1032

Abstract: The present invention provides a silica container for pulling single crystal, the container having a straight body portion, a curved portion, and a bottom portion, wherein an outer side of the container is made of opaque silica glass containing bubbles, and an inner side of the container is made of transparent silica glass, and a mixed silica layer in which a phase in which a crystalline silica powder is fused and a phase in which an amorphous silica powder is fused are mixed in a granular texture is provided on at least an inner surface layer portion of the straight body portion. As a result, there is provided the silica container for pulling single crystal silicon which can suppress melt surface vibration of a silicon melt in the silica container at a high temperature.

Abstract translation: 本发明提供一种用于牵引单晶的二氧化硅容器，容器具有直的主体部分，弯曲部分和底部，其中容器的外侧由含有气泡的不透明的石英玻璃制成，内侧 该容器由透明的二氧化硅玻璃制成，并且在至少一个内部的内部设置混合二氧化硅层的混合二氧化硅层，其中结晶二氧化硅粉末熔融的相和熔融无定形二氧化硅粉末的相混合在一起， 直体部的表层部。 结果，提供了可以抑制二氧化硅容器中的硅熔体在高温下的熔融表面振动的用于拉出单晶硅的二氧化硅容器。