Charged particle filter
    71.
    发明授权
    Charged particle filter 有权
    带电粒子滤波器

    公开(公告)号:US08049182B2

    公开(公告)日:2011-11-01

    申请号:US12685953

    申请日:2010-01-12

    Applicant: Angus Bewick

    Inventor: Angus Bewick

    Abstract: A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed from one or more magnets positioned around the bore in a Halbach configuration thereby generating a relatively high magnetic field strength within the bore and a relatively low magnetic field strength outside of the deflector. The deflector has a geometry defining an outer surface and an inner surface, wherein each of the outer and inner surfaces of the deflector taper towards the axis as a respective function of distance in the specimen direction along the axis. The outer shield is formed from a soft magnetic material surrounding the magnet deflector on an outer surface side of the deflector and having a projecting portion which extends in the specimen direction with respect to the magnetic deflector from the specimen end of the deflector.

    Abstract translation: 带电粒子滤波器包括磁偏转器和外屏蔽件。 磁偏转器具有沿其轴线的孔,其穿过偏转器从试样端到偏转器的检测器端,并且当使用时带电粒子通过该孔。 偏转器由一个或多个以Halbach构型围绕孔定位的磁体形成,从而在孔内产生相当高的磁场强度,并在偏转器外部产生相对低的磁场强度。 偏转器具有限定外表面和内表面的几何形状,其中偏转器的外表面和内表面中的每一个作为沿着轴线的样本方向上的距离的相应函数朝向轴逐渐变细。 外护罩由围绕偏转器外侧表面侧的磁性偏转器的软磁性材料形成,并且具有突出部,该突出部从导流板的试样端部相对于导磁板在试样方向上延伸。

    CHARGED PARTICLE FILTER
    72.
    发明申请
    CHARGED PARTICLE FILTER 有权
    充电颗粒过滤器

    公开(公告)号:US20110168887A1

    公开(公告)日:2011-07-14

    申请号:US12685953

    申请日:2010-01-12

    Applicant: Angus BEWICK

    Inventor: Angus BEWICK

    Abstract: A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed from one or more magnets positioned around the bore in a Halbach configuration thereby generating a relatively high magnetic field strength within the bore and a relatively low magnetic field strength outside of the deflector. The deflector has a geometry defining an outer surface and an inner surface, wherein each of the outer and inner surfaces of the deflector taper towards the axis as a respective function of distance in the specimen direction along the axis. The outer shield is formed from a soft magnetic material surrounding the magnet deflector on an outer surface side of the deflector and having a projecting portion which extends in the specimen direction with respect to the magnetic deflector from the specimen end of the deflector.

    Abstract translation: 带电粒子滤波器包括磁偏转器和外屏蔽件。 磁偏转器具有沿其轴线的孔,其穿过偏转器从试样端到偏转器的检测器端,并且当使用时带电粒子通过该孔。 偏转器由一个或多个以Halbach构型围绕孔定位的磁体形成,从而在孔内产生相当高的磁场强度,并在偏转器外部产生相对低的磁场强度。 偏转器具有限定外表面和内表面的几何形状,其中偏转器的外表面和内表面中的每一个作为沿着轴线的样本方向上的距离的相应函数朝向轴逐渐变细。 外护罩由围绕偏转器外侧表面侧的磁性偏转器的软磁性材料形成,并且具有突出部,该突出部从导流板的试样端部相对于导磁板在试样方向上延伸。

    Electron beam apparatus and method for manufacturing semiconductor device
    73.
    发明申请
    Electron beam apparatus and method for manufacturing semiconductor device 失效
    电子束装置及半导体装置的制造方法

    公开(公告)号:US20060097165A1

    公开(公告)日:2006-05-11

    申请号:US11247263

    申请日:2005-10-12

    Abstract: A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller controls a stage, above which a sample is placed, in the sample chamber. An electron beam source power supply supplies power to an electron beam source, which emits an electron beam to the sample. A power supply supplies voltage to electron optic system, which controls the electron beam. The sample chamber, exhaust section, stage controller, electron beam source power supply and power supply are grounded by a first, second, third, fourth and fifth grounding point, respectively. The electron beam source and the electron optic system are electrically insulated from the sample chamber, column, exhaust section and stage. One of the first, second and third grounding point is different from the fourth or fifth grounding point.

    Abstract translation: 样品室和色谱柱彼此连接并包含磁性物质。 排气部分控制样品室和柱中的压力。 舞台控制器控制在样品室中放置样品的阶段。 电子束源电源向电子束源供电,该电子束向样品发射电子束。 电源将电压供给控制电子束的电子光学系统。 样品室,排气段,载物台控制器,电子束源电源和电源分别由第一,第二,第三,第四和第五接地点接地。 电子束源和电子光学系统与样品室,色谱柱,排气部分和电极电绝缘。 第一,第二和第三接地点之一与第四或第五接地点不同。

    ION IMPLANTING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES
    74.
    发明申请
    ION IMPLANTING APPARATUS FOR MANUFACTURING SEMICONDUCTOR DEVICES 失效
    用于制造半导体器件的离子植入装置

    公开(公告)号:US20040056214A1

    公开(公告)日:2004-03-25

    申请号:US10608339

    申请日:2003-06-30

    Inventor: Sang-Kee Kim

    Abstract: An ion implanting apparatus includes an analyzer unit for analyzing ions to be implanted into a wafer from among those ions in a beam produced by an ionization unit, a vacuum unit for producing a vacuum in the analyzer unit, a vacuum gauge for measuring the pressure inside the analyzer unit, and a shield for preventing a magnetic field employed by the analyzer unit from affecting the vacuum gauge. The shield has a plurality of magnetic field shielding plates encircling the vacuum gauge and dielectric material inserted between the magnetic shielding plates. The shield prevents the vacuum gauge from being influenced by the magnetic field generated by the analyzer unit. Therefore, the vacuum level inside the analyzer unit can be precisely measured.

    Abstract translation: 离子注入装置包括:分析器单元,用于分析从离子化单元产生的光束中的那些离子中注入到晶片中的离子;分析器单元中产生真空的真空单元;用于测量内部压力的真空计 分析器单元和用于防止分析器单元使用的磁场影响真空计的屏蔽。 屏蔽件具有环绕真空计的多个磁场屏蔽板和插在磁屏蔽板之间的电介质材料。 屏蔽层可防止真空计受到分析仪单元产生的磁场的影响。 因此,可以精确地测量分析器单元内的真空度。

    Electron beam instrument
    75.
    发明授权
    Electron beam instrument 失效
    电子束仪器

    公开(公告)号:US5185530A

    公开(公告)日:1993-02-09

    申请号:US786264

    申请日:1991-11-01

    CPC classification number: H01J37/09 H01J2237/0264

    Abstract: A condenser means for focusing an electron beam onto a specimen and a scanning means for scanning the beam in two dimensions on the specimen placed inside a specimen chamber are disposed inside an electron beam column. The top portion of the specimem chamber is connected with the column by an annular member of a high magnetic permeability which surrounds the column. Magnetic flux passed through the top wall of the chamber is made to penetrate the annular member of a high magnetic permeability. The flux is then caused to enter the portion of the upper wall remote from the column, after which the flux leaks out. Thus, leakage of the magnetic flux into the specimem chamber is prevented.

    Abstract translation: 用于将电子束聚焦到样本上的聚光器装置和用于在放置在样本室内的样本上二维地扫描光束的扫描装置设置在电子束柱内。 标本室的顶部通过围绕柱的高磁导率的环形构件与柱连接。 使通过腔室顶壁的磁通量穿透高磁导率的环形构件。 然后使磁通进入远离柱的上壁的部分,之后焊剂泄漏。 因此,防止磁通量泄漏到原料室中。

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