Abstract:
A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed from one or more magnets positioned around the bore in a Halbach configuration thereby generating a relatively high magnetic field strength within the bore and a relatively low magnetic field strength outside of the deflector. The deflector has a geometry defining an outer surface and an inner surface, wherein each of the outer and inner surfaces of the deflector taper towards the axis as a respective function of distance in the specimen direction along the axis. The outer shield is formed from a soft magnetic material surrounding the magnet deflector on an outer surface side of the deflector and having a projecting portion which extends in the specimen direction with respect to the magnetic deflector from the specimen end of the deflector.
Abstract:
A charged particle filter comprises a magnetic deflector and an outer shield. The magnetic deflector has a bore along an axis thereof passing through the deflector from a specimen end to a detector end of the deflector and through which charged particles pass when in use. The deflector is formed from one or more magnets positioned around the bore in a Halbach configuration thereby generating a relatively high magnetic field strength within the bore and a relatively low magnetic field strength outside of the deflector. The deflector has a geometry defining an outer surface and an inner surface, wherein each of the outer and inner surfaces of the deflector taper towards the axis as a respective function of distance in the specimen direction along the axis. The outer shield is formed from a soft magnetic material surrounding the magnet deflector on an outer surface side of the deflector and having a projecting portion which extends in the specimen direction with respect to the magnetic deflector from the specimen end of the deflector.
Abstract:
A sample chamber and a column are connected to each other and comprise a magnetic substance. An exhaust section controls a pressure in the sample chamber and the column. A stage controller controls a stage, above which a sample is placed, in the sample chamber. An electron beam source power supply supplies power to an electron beam source, which emits an electron beam to the sample. A power supply supplies voltage to electron optic system, which controls the electron beam. The sample chamber, exhaust section, stage controller, electron beam source power supply and power supply are grounded by a first, second, third, fourth and fifth grounding point, respectively. The electron beam source and the electron optic system are electrically insulated from the sample chamber, column, exhaust section and stage. One of the first, second and third grounding point is different from the fourth or fifth grounding point.
Abstract:
An ion implanting apparatus includes an analyzer unit for analyzing ions to be implanted into a wafer from among those ions in a beam produced by an ionization unit, a vacuum unit for producing a vacuum in the analyzer unit, a vacuum gauge for measuring the pressure inside the analyzer unit, and a shield for preventing a magnetic field employed by the analyzer unit from affecting the vacuum gauge. The shield has a plurality of magnetic field shielding plates encircling the vacuum gauge and dielectric material inserted between the magnetic shielding plates. The shield prevents the vacuum gauge from being influenced by the magnetic field generated by the analyzer unit. Therefore, the vacuum level inside the analyzer unit can be precisely measured.
Abstract:
A condenser means for focusing an electron beam onto a specimen and a scanning means for scanning the beam in two dimensions on the specimen placed inside a specimen chamber are disposed inside an electron beam column. The top portion of the specimem chamber is connected with the column by an annular member of a high magnetic permeability which surrounds the column. Magnetic flux passed through the top wall of the chamber is made to penetrate the annular member of a high magnetic permeability. The flux is then caused to enter the portion of the upper wall remote from the column, after which the flux leaks out. Thus, leakage of the magnetic flux into the specimem chamber is prevented.