公开(公告)号：US20030232142A1

公开(公告)日：2003-12-18

申请号：US10346874

申请日：2003-01-17

Inventor： Alexander Zak Bradley ,  Jeffrey Scott Thompson ,  David Lincoln Thorn

IPC: B05D003/10 ,  C07F001/08

CPC classification number: C07D213/74 ,  C07C251/12 ,  C07C251/16 ,  C23C16/18 ,  C23C16/45525 ,  C23C16/45553 ,  H01L21/288 ,  H01L21/3141 ,  Y10T428/31504

Abstract: The present invention relates to novel 1,3-diimine copper complexes and the use of 1,3-diimine copper complexes for the deposition of copper on substrates or in or on porous solids in an Atomic Layer Deposition process. This invention also provides a process for making amino-imines and novel amino-imines.

Abstract translation: 本发明涉及新颖的1,3-二亚胺铜络合物和1,3-二亚胺铜络合物在原子层沉积方法中沉积在基底上或在多孔固体中或其上的铜沉积的用途。 本发明还提供了制备氨基亚胺和新型氨基亚胺的方法。

公开(公告)号：US20030157250A1

公开(公告)日：2003-08-21

申请号：US10280270

申请日：2002-10-23

Inventor： Shyama P. Mukherjee ,  Harold O. Madsen ,  Paul J. Roman JR. ,  Leo G. Svendsen

IPC: B05D003/10

CPC classification number: C23C18/1233 ,  C01G11/02 ,  C23C2/04 ,  C23C2/26 ,  C23C8/02 ,  C23C18/06 ,  C23C18/08 ,  C23C18/1216 ,  C23C18/14 ,  C23C24/08 ,  C23C26/00 ,  C23C26/02 ,  C23C30/00 ,  G03F7/0047 ,  H01L21/02186 ,  H01L21/02197 ,  H01L21/02282 ,  H01L21/02337 ,  H01L21/02348 ,  H01L21/02356 ,  H01L21/31695 ,  H05K1/162 ,  H05K3/105

Abstract: The present invention involves the hydrothermal treatment of nanostructured films to form high k PMODnull films for use in applications that are temperature sensitive, such as applications using a polymer based substrate. After a PMODnull precursor is deposited and converted on a substrate, and possibly after other process steps, the amorphous, nanoporous directly patterned film is subjected to low temperature hydrothermal treatment to densify and possibly crystallize the resulting high dielectric PMODnull film. A post hydrothermal treatment bake is then performed to remove adsorped water.

Abstract translation: 本发明涉及纳米结构膜的水热处理以形成用于温度敏感的应用的高k PMOD TM膜，例如使用基于聚合物的基底的应用。 在PMOD TM前体沉积并转化在基底上，并且可能在其它工艺步骤之后，将无定形纳米多孔直接图案化的膜进行低温水热处理以致密化并且可能结晶所得的高介电PMOD TM膜 。 然后进行后水热处理烘烤以除去吸附的水。

公开(公告)号：US20030148193A1

公开(公告)日：2003-08-07

申请号：US10216925

申请日：2002-08-13

Inventor： In-Kyun Shin ,  Jung-Min Sohn ,  Hee-Sun Yoon ,  Seong-Woon Choi

IPC: G03F009/00 ,  G03C005/00 ,  B05D003/04 ,  B05D003/10

CPC classification number: G03F7/70125 ,  G03F1/34 ,  G03F1/50

Abstract: A photomask that is capable of implementing off-axis illumination (OAI), and a method of fabricating the same, are provided. The photomask includes a transparent substrate, a plurality of opaque patterns formed on the front surface of the transparent substrate, for defining a floodlighting portion for forming patterns, and a plurality of phase gratings formed on the back surface of the transparent substrate, allowing off-axis illumination (OAI) of an incident light source beyond the OAI limit of exposure equipment, allowing use in the outmost region of an aperture, and allowing modified illumination having a shape suitable for the layout of the opaque patterns.

Abstract translation: 提供能够实现离轴照明（OAI）的光掩模及其制造方法。 光掩模包括透明基板，形成在透明基板的前表面上的多个不透明图案，用于限定用于形成图案的泛光部分，以及形成在透明基板的背面上的多个相位光栅， 入射光源的轴向照明（OAI）超过曝光设备的OAI限制，允许在孔的最外部区域使用，并允许具有适于布局不透明图案的形状的改进的照明。

公开(公告)号：US20030134041A1

公开(公告)日：2003-07-17

申请号：US10239389

申请日：2002-11-18

Inventor： Joon-Won Park ,  Hong-Jin Kim

IPC: B05D003/04 ,  B05D003/10

CPC classification number: C08G83/005

Abstract: Provided is a method for forming solid substrates having high density of primary amine group on its surface, in which the primary amine groups on the surface of an aminosilylated substrate are treated with aziridine or an aziridine derivative. The surface density of the primary amine functional groups (nullNH2) on the very top surface of a substrate can be drastically increased.

公开(公告)号：US20030129311A1

公开(公告)日：2003-07-10

申请号：US10042087

申请日：2002-01-10

Inventor： Wen-Chiang Huang

IPC: B05D003/10

CPC classification number: B82Y30/00 ,  B22F1/0018 ,  B22F9/24 ,  B22F2998/00 ,  B82Y10/00 ,  C01B17/20 ,  C01B19/007 ,  C01G11/02 ,  C01P2004/64 ,  C01P2006/16 ,  H01L29/127 ,  B22F1/0022

Abstract: A quantum-sized material and a method for producing such a material according to a predetermined nano-porous polymer template. The method includes the steps of: (a) preparing a nano-porous polymer template, wherein the preparation step includes the sub-steps of (i) dissolving a polymer in a volatile solvent to form an evaporative solution, (ii) depositing a thin film of this solution onto a substrate, and (iii) directing a moisture-containing gas to flow over the spread-up solution film while allowing the solvent in the solution to evaporate for forming a template, which is constituted of an ordered array of nanometer-scaled air bubbles with polymeric walls dispersed in a polymer film; (b) filling the air bubbles with a precursor fluid; and (c) converting the precursor fluid in such bubbles to obtain a quantum-sized material in the form of an array of dots supported in the template. At least one of the dot dimensions is on the 100 nm scale or smaller, preferably smaller than 20 nm.

Abstract translation: 量子大小的材料和根据预定的纳米多孔聚合物模板生产这种材料的方法。 该方法包括以下步骤：（a）制备纳米多孔聚合物模板，其中制备步骤包括以下子步骤：（i）将聚合物溶解在挥发性溶剂中以形成蒸发溶液，（ii）沉积薄的 将该溶液的薄膜涂布在基材上，（iii）使含湿气体在涂布溶液膜上流动，同时使溶液中的溶剂蒸发以形成模板，该模板由纳米级的有序阵列 标有气泡的聚合物壁分散在聚合物膜中; （b）用前体液填充气泡; 和（c）在这种气泡中转化前体流体以获得在模板中支撑的点阵列形式的量子大小的材料。 点尺寸中的至少一个在100nm刻度或更小，优选小于20nm。

公开(公告)号：US20030124257A1

公开(公告)日：2003-07-03

申请号：US10038750

申请日：2001-12-31

Inventor： William G. Reeves ,  Li-fu Chen

IPC: B05D003/10

CPC classification number: C08L5/08 ,  A61F13/51305 ,  A61F2013/51066 ,  A61L15/28 ,  C08B15/00 ,  C08B31/00 ,  C08B37/00 ,  C08B37/003 ,  C08B37/0045 ,  C08B37/0084 ,  C08L1/02 ,  C08L3/02 ,  C08L5/00 ,  C08L5/04 ,  C08L5/06 ,  C09D101/02 ,  C09D103/02 ,  C09D105/00 ,  C09D105/04 ,  C09D105/06 ,  C09D105/08

Abstract: The present invention is directed to a method for the production of a durably hydrophilic, non-leaching coating. A carbohydrate-salt mixture is formed by at least partially dissolving a water insoluble carbohydrate in an aqueous salt solution to form a carbohydrate-salt complex. The carbohydrate-salt mixture is applied to a substrate, and the substrate is rinsed with a solvent to form a coating.

Abstract translation: 本发明涉及一种用于生产耐久亲水的非浸出涂层的方法。 通过至少部分地将水不溶性碳水化合物溶解在盐水溶液中以形成碳水化合物 - 盐络合物形成碳水化合物盐混合物。 将碳水化合物 - 盐混合物施加到基底上，并用溶剂冲洗基底以形成涂层。

公开(公告)号：US20030118720A1

公开(公告)日：2003-06-26

申请号：US10292051

申请日：2002-11-12

Inventor： David L. Newton ,  William H. Plassmann

IPC: B05D003/10 ,  B05D003/02

CPC classification number: C08G18/4684 ,  B05D3/12 ,  B05D7/16 ,  C08G18/3885 ,  C09D175/04 ,  C08L75/04

Abstract: The present invention provides a method for coating bare, untreated metal substrates wherein a coating composition comprising one or more particularly defined additives is applied directly to a bare metal substrate which has not been chemically and/or mechanically altered. The invention provides a method of coating a bare untreated metal substrate. The method requires the steps of (i) providing a bare, untreated metal substrate, the substrate being substantially free of mechanical and/or chemical alterations, (ii) applying a two-component urethane coating composition directly to the bare, untreated metal substrate so as to make a coated metal substrate, and (iii) sanding at least a portion of the coated metal substrate within one hour from the time the two-component urethane coating composition was applied to the bare, untreated metal substrate. The resulting coated metal substrate has an initial adhesion loss of less than 20% as measured by a cross hatch adhesion test per ASTM D-3359 93. The invention further provides a method of refinishing a previously coated substrate. This method requires (i) providing a substrate having thereon a previously applied and cured coating film, (ii) removing substantially all of the previously applied and cured coating film from at least a portion of the substrate so as to make a bare metal subtrate substantially free of mechanical and/or chemical alterations, (iii) applying a two-component urethane coating composition directly to the bare, untreated metal substrate so as to make a coated metal substrate, and (iv) sanding at least a portion of the coated metal substrate within one hour from the time the two-component urethane coating composition was applied to the bare, untreated metal substrate, wherein the coated metal substrate has an initial adhesion loss of less than 20% as measured by a cross hatch adhesion test per ASTM D-3359 93.

Abstract translation: 本发明提供了一种用于涂覆裸露未经处理的金属基材的方法，其中包含一种或多种特别限定的添加剂的涂料组合物直接施加到未经化学和/或机械改变的裸露金属基材上。 本发明提供一种涂覆裸露未经处理的金属基材的方法。 该方法需要以下步骤：（i）提供裸露的未经处理的金属基底，所述基底基本上不受机械和/或化学变化，（ii）将双组分氨基甲酸酯涂料组合物直接施加到裸露未处理的金属基底上， 以及（iii）从双组分氨基甲酸酯涂料组合物施加到裸露未处理的金属基材上起1小时内，将至少一部分涂覆的金属基材进行打磨。 所得到的涂覆金属基材通过根据ASTM D-335993的交叉填缝粘合试验测得的初始粘合损失小于20％。本发明还提供了对先前涂覆的基材进行修补的方法。 该方法需要（i）提供其上具有预先涂覆和固化的涂膜的基材，（ii）从基材的至少一部分基本上除去基本上所有先前施加和固化的涂膜，从而基本上形成裸露的金属副产物 没有机械和/或化学变化，（iii）将双组分氨基甲酸酯涂料组合物直接施加到裸露未处理的金属基材上，以制成涂覆的金属基材，和（iv）将至少一部分涂覆金属 从双组分氨基甲酸酯涂料组合物施加到裸露未处理的金属基材1小时内的基材，其中涂覆的金属基材的初始粘合损失小于20％，通过根据ASTM D的交叉影线密封试验测量 -3359 93。

公开(公告)号：US20030079652A1

公开(公告)日：2003-05-01

申请号：US10003626

申请日：2001-10-31

Inventor： Mark L. Choy

IPC: C09D011/00 ,  B05D001/26 ,  B05D003/04 ,  B05D003/10 ,  B05D003/02 ,  B05D001/32

CPC classification number: C09D11/54 ,  B41J2/2107 ,  B41J11/002 ,  B41M5/0017 ,  B41M5/508 ,  B41M5/5254 ,  B41M7/0018 ,  C09D11/30 ,  G03G11/00

Abstract: Ink and fixer compositions for printing on hydrophobic media. The ink compositions include a water soluble dye and a vehicle, the vehicle includes water, a glycol ether, a humectant, and a non-ionic surfactant. The fixer compositions include a fixing agent and a vehicle, the vehicle includes water, a glycol ether, a humectant, and a non-ionic surfactant. Methods of printing on hydrophobic media. The methods include the steps of providing an ink that includes a water soluble dye and a vehicle, the vehicle including water, a glycol ether, a humectant, and a non-ionic surfactant; providing a hydrophobic print medium; and depositing the ink on the hydrophobic print medium. The method of printing may further include steps of applying heat to the hydrophobic print medium during and/or after the ink deposition step. The method of printing may yet further include steps of providing a fixer that includes a fixing agent and a vehicle, the vehicle including water, a glycol ether, a humectant, and a non-ionic surfactant; and depositing the fixer on the hydrophobic print medium before, after, or both before and after the ink is deposited.

Abstract translation: 用于在疏水介质上印刷的油墨和定影剂组合物。 油墨组合物包括水溶性染料和载体，载体包括水，二醇醚，保湿剂和非离子表面活性剂。 定影剂组合物包括固定剂和载体，载体包括水，二醇醚，保湿剂和非离子表面活性剂。 疏水介质印刷方法。 所述方法包括提供包含水溶性染料和载体的油墨的步骤，所述载体包括水，二醇醚，保湿剂和非离子表面活性剂; 提供疏水印刷介质; 以及将油墨沉积在疏水性打印介质上。 印刷方法还可以包括在油墨沉积步骤期间和/或之后向疏水性印刷介质施加热量的步骤。 打印方法还可以包括提供包括固定剂和载体的定影剂的步骤，所述载体包括水，二醇醚，保湿剂和非离子表面活性剂; 以及在沉积墨水之前，之后或之前将定影剂沉积在疏水性印刷介质上。

公开(公告)号：US20030054149A1

公开(公告)日：2003-03-20

申请号：US09956432

申请日：2001-09-20

Inventor： Alfred I-Tsung Pan

IPC: B05D003/02 ,  B05D003/10

CPC classification number: C04B41/89 ,  B22F7/002 ,  C04B41/009 ,  C04B41/4582 ,  C04B41/52 ,  C04B41/81 ,  C04B2111/00853 ,  H01M4/0471 ,  H01M4/9083 ,  H01M4/926 ,  Y10T428/249924 ,  Y10T428/249953 ,  C04B41/4539 ,  C04B41/51 ,  C04B41/4541 ,  C04B41/5105 ,  C04B41/5122 ,  C04B41/4564 ,  C04B41/522 ,  C04B35/00 ,  C04B35/52 ,  C04B38/00

Abstract: A method for sintering a porous coating on an open-structure substrate, i.e., a substrate with pre-made pores or openings. The open-structure substrate is spread with a coating paste that is prepared with such a viscosity so that the paste will not drip through the pores/openings on the open-structure substrate. The coating paste is then sintered to form a porous layer on the surface of the open-structure substrate. Optionally, the porous coating may be further coated with a catalyst for fuel cell applications.

公开(公告)号：US20030049378A1

公开(公告)日：2003-03-13

申请号：US10209951

申请日：2002-07-31

Applicant: Ballard Power Systems Inc.

Inventor： Paul Po Hang Fong ,  Emerson R. Gallagher ,  Svetlana Loif

IPC: B05D003/10 ,  B05D003/02

CPC classification number: H01M8/0234 ,  B27K3/15 ,  C04B41/009 ,  C04B41/483 ,  C04B41/83 ,  C04B2111/00853 ,  C08L33/10 ,  C08L97/02 ,  H01M8/0221 ,  H01M8/0223 ,  C04B41/0072 ,  C04B41/457 ,  C04B35/522

Abstract: A process for impregnating a porous part is provided. In one embodiment, the process comprises impregnating the part with an impregnant that is not water soluble, and curing the impregnated part in a water bath. In another embodiment, the process comprises impregnating a part with an impregnant that is not water soluble, washing the impregnated part in a washing solution, and then curing the impregnated part in a water bath.

Abstract translation: 提供了一种浸渍多孔部件的方法。 在一个实施方案中，该方法包括用不溶于水的浸渍剂浸渍该部分，并将浸渍部分固化在水浴中。 在另一个实施方案中，该方法包括用不溶于水的浸渍剂浸渍部分，将浸渍部分洗涤在洗涤溶液中，然后在水浴中固化浸渍部分。