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81.发明申请公开(公告)号：US20200266603A1
公开(公告)日：2020-08-20
申请号：US16865803
申请日：2020-05-04
Applicant: Gigaphoton Inc.
Inventor： Seiji NOGIWA
IPC: H01S3/131 , H05G2/00 , H01S3/0941 , H01S3/13
Abstract: A laser apparatus according to the present disclosure includes an excitation light source configured to output excitation light, a laser crystal disposed on an optical path of the excitation light, a first monitor device disposed on an optical path of transmitted excitation light after having transmitted through the laser crystal to monitor the transmitted excitation light, a temperature adjustment device configured to adjust a temperature of the excitation light source to a constant temperature based on a temperature command value, and a controller configured to change the temperature command value based on a result of monitoring by the first monitor device.
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公开(公告)号：US20200244032A1
公开(公告)日：2020-07-30
申请号：US16849618
申请日：2020-04-15
Applicant: Gigaphoton Inc.
Inventor： Keisuke ISHIDA , Satoshi KOMURO , Hiroshi FURUSATO
Abstract: An excimer laser apparatus according to the present disclosure includes a chamber configured to accommodate a laser gas and a pair of electrodes and generate pulse-oscillating laser light when the gas pressure of the laser gas is controlled in accordance with voltage applied between the pair of electrodes, a power supply configured to apply the voltage between the pair of electrodes, and a controller to which a target value of the spectral linewidth of the laser light is inputted, the controller configured to correct the voltage used to control the gas pressure, when the target value changes from a first target value to a second target value, based on a first function having the second target value as a parameter and control the gas pressure in accordance with the corrected voltage.
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83.发明申请公开(公告)号：US20200236769A1
公开(公告)日：2020-07-23
申请号：US16842421
申请日：2020-04-07
Applicant: Gigaphoton Inc.
Inventor： Yuta TAKASHIMA , Yoshifumi UENO
Abstract: An extreme ultraviolet light generation apparatus that generates plasma by irradiating a target substance with a pulse laser beam and generates extreme ultraviolet light from the plasma includes: a droplet detection unit configured to detect a droplet passing through a predetermined position between a target supply unit and a plasma generation region; and a control unit configured to control a laser apparatus configured to output the pulse laser beam. The control unit performs control to determine whether there is a defective droplet based on a droplet detection signal obtained from the droplet detection unit and to stop, when it is determined that there is a defective droplet, irradiation of the defective droplet determined to be defective, a preceding droplet output one droplet before the defective droplet, and a following droplet output one droplet after the defective droplet with the pulse laser beam.
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公开(公告)号：US10698316B2
公开(公告)日：2020-06-30
申请号：US16379363
申请日：2019-04-09
Applicant: Gigaphoton Inc.
Inventor： Toshihiro Nishisaka
Abstract: A target generation device replacement trolley includes: A. a linear movement mechanism configured to hold a target generation device configured to output a target material and linearly move the target generation device in a direction in which the target material is output; and B. a positioning portion configured to position the linear movement mechanism relative to a mounting part of a chamber on which the target generation device is mounted. The target generation device replacement trolley further includes C. a drive unit configured to drive the linear movement mechanism. The target generation device replacement trolley further includes D. a mount configured to hold the linear movement mechanism. The positioning portion is provided to the mount.
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公开(公告)号：US10666008B2
公开(公告)日：2020-05-26
申请号：US16178382
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
IPC: H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
Abstract: A gas supply system may include a first gas supply line, a second gas supply line, a circulation gas pipe, a gas purification unit, a first valve, and a second valve. The first gas supply line may include a first branching point at which the first gas supply line branches into a first branch connected to a first chamber and a second branch connected to a second chamber and the second gas supply line may include a second branching point at which the second gas supply line branches into a third branch connected to the first chamber and a fourth branch connected to the second chamber. A first portion of the first gas supply line upstream from the first branching point and a second portion of the second gas supply line upstream from the second branching point may be constituted by separate pipes from each other.
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Patent Agency Ranking
公开(公告)号：US20200077501A1
公开(公告)日：2020-03-05
申请号：US16677882
申请日：2019-11-08
Applicant: Gigaphoton Inc.
Inventor： Hiroaki TOMURO , Shinji NAGAI , Yoshiyuki HONDA
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber in which plasma is generated from a target substance at a condensation position of a laser beam; a condenser mirror configured to condense extreme ultraviolet light generated by the plasma; and a magnetic field generation unit configured to generate a magnetic field that converges a charged particle generated by the plasma toward a wall of the chamber, the condenser mirror includes a substrate, a reflective layer, and a protective layer provided on the reflective layer, the protective layer has layer thickness distribution in which a layer thickness of the protective layer from a reflective layer surface changes, and the layer thickness of the protective layer is maximum at a position on a line (CL) on which a plane passing through a magnetic field axis of the magnetic field generation unit and a central axis (CA) of the condenser mirror intersects the reflective layer surface (62F).
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公开(公告)号：US20200067257A1
公开(公告)日：2020-02-27
申请号：US16674994
申请日：2019-11-05
Applicant: Gigaphoton Inc.
Inventor： Daisuke TEI , Osamu WAKABAYASHI
IPC: H01S3/081 , G02B1/02 , G02B27/12 , H01S3/08 , H01S3/225 , H01S3/22 , H01S3/034 , H01S3/13 , C30B29/12 , G03F7/20
Abstract: A laser apparatus including an optical element made of a CaF2 crystal and configured to transmit an ultraviolet laser beam obliquely incident on one surface of the optical element, the electric field axis of the P-polarized component of the laser beam propagating through the optical element coinciding with one axis contained in of the CaF2 crystal, with the P-polarized component defined with respect to the one surface. A method for manufacturing an optical element, the method including causing a seed CaF2 crystal to undergo crystal growth along one axis contained in to form an ingot, setting a cutting axis to be an axis inclining by an angle within 14.18±5° with respect to the crystal growth direction toward the direction of another axis contained in , which differs from the crystal growth direction, and cutting the ingot along a plane perpendicular to the cutting axis.
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公开(公告)号：US20200025247A1
公开(公告)日：2020-01-23
申请号：US16568808
申请日：2019-09-12
Applicant: Gigaphoton Inc.
Inventor： Masaharu MIKI , Osamu WAKABAYASHI
Abstract: A gas laser apparatus includes: a magnetic bearing including an electromagnet capable of controlling a magnetic force, and configured to rotatably support a rotary shaft of a fan in a magnetically levitated state by the magnetic force, the fan being configured to supply a laser gas; an electromagnet control unit configured to control the magnetic force of the electromagnet based on displacement of a levitated position of the rotary shaft and adjust the levitated position; a motor configured to generate torque for rotating the fan; a magnetic coupling configured to couple the rotary shaft and a drive shaft of a motor with a magnetic attractive force and transmit the torque of the motor to the rotary shaft; an attractive force estimating sensor configured to detect a parameter that enables an attractive force of the magnetic coupling to be estimated; an attractive force measuring unit configured to measure the attractive force of the magnetic coupling based on the detected parameter; and a correction unit configured to correct the magnetic force of the electromagnet according to a variation in the attractive force measured by the attractive force measuring unit.
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公开(公告)号：US10531550B2
公开(公告)日：2020-01-07
申请号：US15888109
申请日：2018-02-05
Applicant: Gigaphoton Inc.
Inventor： Takayuki Yabu
Abstract: An extreme ultraviolet light generation device may include: a chamber in which extreme ultraviolet light is generated from plasma generated by irradiating a target with laser light output by a laser device, in a generation region therein; a target supply unit configured to output the target as a droplet toward the generation region; a droplet detector configured to detect the droplet in a detection region; and a controller. The droplet detector may transmit, to the controller, a pass timing signal indicating a timing when the droplet passes through the detection region. The controller may include a noise compensation unit configured to compensate for noise of the pass timing signal caused by an electromagnetic wave from the plasma, and transmit a trigger signal that gives a trigger to output the laser light to the laser device based on the pass timing signal in which the noise is compensated for.
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公开(公告)号：US10524343B2
公开(公告)日：2019-12-31
申请号：US16429331
申请日：2019-06-03
Applicant: Gigaphoton Inc.
Inventor： Takanobu Ishihara , Toshihiro Nishisaka , Yutaka Shiraishi
Abstract: An extreme ultraviolet light generation apparatus includes: a chamber; a target supply unit that supplies a droplet of a target substance to a plasma generation region in the chamber; a first pipe at least partly covering a trajectory of the droplet and having a first opened end part as an upstream end part and a second opened end part as a downstream end part in a trajectory direction; a second pipe at least partly covering the first pipe with a gap between the second pipe and the first pipe, and having a third end part, opened and extending downstream of the second end part of the first pipe in the trajectory direction, as a downstream end part in the trajectory direction; and a gas supply unit that supplies gas flowing through the gap and causes the gas to flow in the trajectory direction out of a gas exit.
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