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公开(公告)号：US10666008B2
公开(公告)日：2020-05-26
申请号：US16178382
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
IPC: H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
Abstract: A gas supply system may include a first gas supply line, a second gas supply line, a circulation gas pipe, a gas purification unit, a first valve, and a second valve. The first gas supply line may include a first branching point at which the first gas supply line branches into a first branch connected to a first chamber and a second branch connected to a second chamber and the second gas supply line may include a second branching point at which the second gas supply line branches into a third branch connected to the first chamber and a fourth branch connected to the second chamber. A first portion of the first gas supply line upstream from the first branching point and a second portion of the second gas supply line upstream from the second branching point may be constituted by separate pipes from each other.
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公开(公告)号：US10164396B2
公开(公告)日：2018-12-25
申请号：US15720122
申请日：2017-09-29
Applicant: GIGAPHOTON INC.
Inventor： Akihiko Kurosu , Takashi Matsunaga , Hiroyuki Masuda , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro , Takeshi Ohta
IPC: H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/104 , H01S3/04 , H01S3/03 , H01S3/08 , H01S3/134 , H01S3/13 , H01S3/225 , H01S3/041
Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.
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公开(公告)号：US09825417B2
公开(公告)日：2017-11-21
申请号：US15144081
申请日：2016-05-02
Applicant: GIGAPHOTON INC.
Inventor： Akihiko Kurosu , Takashi Matsunaga , Hiroyuki Masuda , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro , Takeshi Ohta
IPC: H01S3/036 , H01S3/097 , H01S3/0971 , H01S3/104 , H01S3/04 , H01S3/03 , H01S3/08 , H01S3/134 , H01S3/13 , H01S3/225 , H01S3/041
CPC classification number: H01S3/036 , H01S3/03 , H01S3/0404 , H01S3/0407 , H01S3/041 , H01S3/08009 , H01S3/08031 , H01S3/09702 , H01S3/0971 , H01S3/104 , H01S3/1306 , H01S3/134 , H01S3/2258
Abstract: There may be provided a laser unit including a display configured to display one or both of electric power consumed by the laser unit and electric energy consumed by the laser unit.
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公开(公告)号：US12155168B2
公开(公告)日：2024-11-26
申请号：US18163689
申请日：2023-02-02
Applicant: Gigaphoton Inc.
Inventor： Yusuke Saito , Masanori Yashiro , Hiroshi Furusato , Yosuke Watanabe , Tokinori Terao
Abstract: A line narrowing gas laser device includes a line narrowing device, an output coupling mirror, a laser chamber arranged on an optical path of an optical resonator, a first holder which supports the output coupling mirror, a second holder which supports the first holder to be rotatable about a rotation axis of the first holder, and an adjustment device supported by the second holder and being in contact with the first holder to rotate the first holder about the rotation axis. The line narrowing device has a characteristic of changing, into a first direction, beam pointing of laser light output toward the output coupling mirror when temperature inside the line narrowing device rises. The second holder and the adjustment device rotate the first holder in a direction in which a change in the first direction in the beam pointing of the laser light is suppressed by thermal expansion.
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公开(公告)号：US10971883B2
公开(公告)日：2021-04-06
申请号：US16178351
申请日：2018-11-01
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
IPC: H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
Abstract: A gas purification system may include: a circulation gas pipe in which a second end is connected at a first position to a second pipe through which gas is supplied from a gas supply source; a booster pump; a gas purification unit; a first tank in the circulation gas pipe; a first valve positioned between the gas supply source and the first position, the first valve having an open position and a closed position; and a second valve positioned between the first tank and the second end, the second valve having an open position and a closed position, the second valve configured to be in the closed position when the first valve is in the open position.
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Patent Agency Ranking
6.发明授权公开(公告)号：US09093814B2
公开(公告)日：2015-07-28
申请号：US14220956
申请日：2014-03-20
Applicant: Gigaphoton Inc.
Inventor： Takahito Kumazaki , Kouji Kakizaki , Masanori Yashiro
CPC classification number: H01S3/038 , G02B5/208 , G03F7/20 , G03F7/70025 , H01S3/034 , H01S3/08004 , H01S3/08009 , H01S3/225
Abstract: An optical device includes a plate-like optical element made of a calcium fluoride crystal, a holding member to sandwich and hold the optical element, a seal member provided between the holding member and one surface of the optical element in close contact therewith, and a cushioning member provided between the holding member and the other surface of the optical element in contact therewith. The cushioning member is made of one of a 304 stainless steel, a 303 stainless steel, a 316 stainless steel, a Hastelloy™ alloy, a carbon steel for machine construction S45C, and Inconel™.
Abstract translation: 光学装置包括由氟化钙晶体制成的板状光学元件，夹持并保持光学元件的保持构件，设置在保持构件与光学元件的与其紧密接触的一个表面之间的密封构件， 缓冲构件设置在保持构件与光学元件的与其接触的另一表面之间。 缓冲构件由304不锈钢，303不锈钢，316不锈钢，Hastelloy™合金，用于机械结构S45C的碳素钢和Inconel™中的一种制成。
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公开(公告)号：US11081850B2
公开(公告)日：2021-08-03
申请号：US16853489
申请日：2020-04-20
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
IPC: H01S3/036 , H01S3/104 , H01S3/225 , B01D53/34 , B01D53/82 , H01S3/23 , B01D53/04 , B01D53/68 , B01D53/86
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US10892592B2
公开(公告)日：2021-01-12
申请号：US15953835
申请日：2018-04-16
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Masanori Yashiro , Osamu Wakabayashi
Abstract: A laser gas purifying system to purify laser gas emitted from a laser apparatus and return purified gas to the laser apparatus may include a first pipe configured to pass the laser gas emitted from the laser apparatus, a purifying apparatus connected to the first pipe and configured to purify the laser gas emitted from the laser apparatus, a second pipe connected to the purifying apparatus and configured to return the purified gas purified by the purifying apparatus to the laser apparatus, and an exhausting device provided in at least one of the first pipe, the purifying apparatus, and the second pipe.
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公开(公告)号：US10038295B2
公开(公告)日：2018-07-31
申请号：US15631676
申请日：2017-06-23
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
CPC classification number: H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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公开(公告)号：US09722384B2
公开(公告)日：2017-08-01
申请号：US15145016
申请日：2016-05-03
Applicant: Gigaphoton Inc.
Inventor： Natsushi Suzuki , Osamu Wakabayashi , Hiroaki Tsushima , Masanori Yashiro
CPC classification number: H01S3/036 , B01D53/0446 , B01D53/346 , B01D53/685 , B01D53/82 , B01D53/86 , B01D2251/404 , B01D2251/602 , B01D2253/108 , B01D2255/20753 , B01D2255/20761 , B01D2257/2027 , B01D2258/0216 , B01D2259/40003 , H01S3/104 , H01S3/225
Abstract: A gas laser apparatus may include: a laser chamber connected through a first control valve to a first laser gas supply source that supplies a first laser gas containing a halogen gas and connected through a second control valve to a second laser gas supply source that supplies a second laser gas having a lower halogen gas concentration than the first laser gas; a purification column that removes at least a part of the halogen gas and a halogen compound from at least a part of a gas exhausted from the laser chamber; a booster pump, connected through a third control valve to the laser chamber, which raises a pressure of a gas having passed through the purification column to a gas pressure that is higher than an operating gas pressure of the laser chamber; and a controller that calculates, on a basis of a first amount of a gas supplied from the booster pump through the third control valve to the laser chamber, a second amount of the first laser gas that is to be supplied to the laser chamber and controls the first control valve on a basis of a result of the calculation of the second amount.
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