公开(公告)号：US07317073B2

公开(公告)日：2008-01-08

申请号：US10554436

申请日：2004-03-31

Applicant: Rudolf Kämpf

Inventor： Rudolf Kämpf

IPC: C08F6/00

CPC classification number: F04F5/54 ,  B01J3/006 ,  B01J2219/00006 ,  B01J2219/00162 ,  C08G63/785 ,  C08G64/205 ,  C08G65/4093 ,  C08G75/23 ,  C08G79/04

Abstract: A method is disclosed for producing a vacuum and for separating condensable components present in vapor which accumulates during the production of a polymer by melt-phase polycondensation under vacuum. Vapor produced during the production of polymers by melt-phase polycondensation in at least one reaction step under vacuum is drawn of by at least one steam jet vacuum pump with a down stream injection condenser. The steam jet vacuum pump is driven with alkylene carbonate in vapor form and liquid alkylene carbonate is then supplied to the injection condenser as coolant.

Abstract translation: 公开了一种用于产生真空并分离存在于蒸汽中的可冷凝成分的方法，该冷凝成分在聚合物生产期间通过在真空下进行熔融相缩聚而积聚。 通过在至少一个反应步骤中在真空下通过熔融相缩聚制备聚合物中产生的蒸气由至少一个具有下游注射冷凝器的蒸汽喷射真空泵抽出。 蒸汽喷射真空泵由蒸气形式的碳酸亚烃驱动，然后将液体碳酸亚烃酯作为冷却剂供入注射冷凝器。

公开(公告)号：US20060135373A1

公开(公告)日：2006-06-22

申请号：US10545703

申请日：2004-04-17

Applicant: Sang Jeong ,  Seong Park ,  Won Hong ,  Yong Kim ,  Kyung Koo

Inventor： Sang Jeong ,  Seong Park ,  Won Hong ,  Yong Kim ,  Kyung Koo

IPC: C10M175/00 ,  B01J10/00

CPC classification number: B01J19/18 ,  B01D17/044 ,  B01J3/006 ,  B01J4/002 ,  B01J19/0006 ,  B01J19/1862 ,  B01J19/26 ,  B01J2219/00006 ,  B01J2219/00162 ,  B01J2219/00182 ,  B01J2219/002 ,  B01J2219/00231 ,  B01J2219/00236 ,  B03C5/02 ,  C10M175/0066 ,  Y02A50/2357

Abstract: There are provided an apparatus and a method for eliminating water and particulate pollutant contained in a waste lubricant. The waste lubricant heated up to a proper temperature is injected into a vacuum chamber through a nozzle, the vacuum chamber maintaining a predetermined degree of vacuum. The water contained in the waste lubricant is vaporized according to a relationship between a vaporizing temperature of the waste lubricant and a vaporizing temperature of the water contained in the waste lubricant. The vaporized water is transformed into condensate water while passing through a condenser, and is stored in a water storage container. In addition, the waste lubricant, from which water is eliminated, is introduced into a waste lubricant discharging chamber by discharging means, and is passed through an electrostatic separator by an oil pump, to collect particulate pollutant. Two electrodes, each having a polarity opposite to each other, are provided inside the electrostatic separator, and are applied with a high voltage by a high-voltage generating unit, so as to form a strong electric field in a space between the two electrodes, in which the waste lubricant is located, and collect particulate pollutant contained in the waste lubricant by the electrostatic force in the electric field.

Abstract translation: 提供了用于消除废润滑剂中所含的水和颗粒污染物的装置和方法。 加热到适当温度的废润滑剂通过喷嘴注入真空室，真空室保持预定的真空度。 根据废润滑剂的汽化温度和废润滑剂中所含的水的汽化温度之间的关系，将废润滑剂中所含的水蒸发。 蒸发的水在通过冷凝器时转化成冷凝水，并储存在储水容器中。 此外，通过排出装置将排除了水的废润滑剂引入废润滑剂排出室，并通过油泵通过静电分离器以收集颗粒污染物。 在静电分离器的内部设置两个彼此相对极性的电极，并通过高电压产生单元施加高电压，以便在两个电极之间的空间中形成强电场， 其中废润滑剂位于其中，并通过电场中的静电力收集废润滑剂中包含的颗粒污染物。

公开(公告)号：US06902655B2

公开(公告)日：2005-06-07

申请号：US10080701

申请日：2002-02-25

Applicant: Kazunori Anazawa ,  Hiroyuki Watanabe ,  Masaaki Shimizu

Inventor： Kazunori Anazawa ,  Hiroyuki Watanabe ,  Masaaki Shimizu

IPC: B01J3/00 ,  B01J19/08 ,  C01B31/02

CPC classification number: B01J19/087 ,  B01J3/006 ,  B01J19/088 ,  B01J2219/0809 ,  B01J2219/0822 ,  B01J2219/0828 ,  B01J2219/083 ,  B01J2219/0852 ,  B01J2219/0854 ,  B01J2219/0866 ,  B01J2219/0879 ,  B01J2219/0894 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/16 ,  C01B2202/30

Abstract: Apparatus for producing a carbon structure at least including two electrodes 11 and 12 having forefront portions opposed to each other, and a power supply 18 for applying a voltage between the electrodes 11 and 12 so that discharge plasma is produced in a discharge area between the electrodes 11 and 12. The apparatus for producing a carbon structure further including a magnetic field generating unit 20 to 23 for forming at least a magnetic field including multidirectional lines of magnetic force or a magnetic field including a component parallel with the traveling direction of a discharge current, in an area where the discharge plasma is generated. In addition, a method for producing a carbon structure, using such an operation.

Abstract translation: 用于制造至少包括彼此相对的前沿部分的两个电极11和12的碳结构的设备，以及用于在电极11和12之间施加电压使得在电极之间的放电区域中产生放电等离子体的电源18 11和12。 一种碳结构的制造装置，其特征在于，还包括：磁场产生部20〜23，至少形成包含多个磁力线的磁场或包含与放电电流的行进方向平行的分量的磁场， 其中产生放电等离子体。 此外，使用这种操作的碳结构的制造方法。

公开(公告)号：US06877446B2

公开(公告)日：2005-04-12

申请号：US10203419

申请日：2001-02-15

Applicant: Clementino Cabrini

Inventor： Clementino Cabrini

IPC: F23L7/00 ,  B01J3/00 ,  B01J3/02 ,  C10B49/06 ,  C10B49/10 ,  C10B53/00 ,  C10J1/213 ,  C10J3/00 ,  C10J3/66 ,  C10L3/06 ,  C10L3/10 ,  F23G5/027 ,  F23G5/14 ,  F23J1/00 ,  F23J15/02 ,  F23B7/00 ,  F23G5/02 ,  F23G7/00

CPC classification number: F23G5/0276 ,  B01J3/006 ,  B01J3/02 ,  C10B49/06 ,  C10B53/00 ,  C10J3/66 ,  C10J2200/154 ,  C10J2300/1223 ,  C10K1/024 ,  C10K1/08 ,  F23G2202/101 ,  F23J2217/10 ,  F23J2217/50

Abstract: Process for incinerating refuse derived fuels to obtain fuel gas therefrom by thermal cracking, comprising the following steps: subjecting the material to deaeration; advancing a bed of material within a vacuum environment insulated from the outside (thermal cracking chamber) and in which a temperature of between 400 DEG C. and 600 DEG C. is maintained by the countercurrent flow of hot gases which lap the material; feeding the material which has passed through the thermal cracking chamber to a reactor in order to be subjected to a temperature of between 1200 DEG C. and 1800 DEG C.; in proximity ot the entry end of said thermal cracking chamber, drawing off the gases generated by the thermal cracking together with the gases which have lapped the bed of material, in order to maintain the thermal cracking chamber under vacuum; feeding the drawn-off gases to the discharge conduit for the gases generated in the reactor; purifying and filtering the gases obtained in this manner for their use as fuel gases.

Abstract translation: 用于焚烧垃圾衍生燃料以通过热裂解从其中获得燃料气的方法，包括以下步骤：对材料进行脱气; 在与外部绝热的真空环境（热裂解室）内推进材料床，其中温度在400摄氏度到600度之间的温度通过材料的热气流的逆流保持; 将已经通过热裂解室的材料进料到反应器中以进行1200℃至1800℃的温度; 在所述热裂解室的入口附近，将热裂解产生的气体与已经研磨材料床的气体一起排出，以便将热裂解室保持在真空状态; 将排出的气体输送到在反应器中产生的气体的排出管道; 净化和过滤以这种方式获得的气体用作燃料气体。

公开(公告)号：US20040187337A1

公开(公告)日：2004-09-30

申请号：US10796195

申请日：2004-03-10

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: F26B013/30

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus. When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple. Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

Abstract translation: 本发明涉及一种具有真空处理室的真空处理装置，其内部必须是干式清洁的，以及一种操作这种装置的方法。 当真空处理室被干洗时，虚设基板通过基板传送装置从设置在空气气氛中的虚设基板存储装置与用于存储待处理基板的存储装置一起转移到真空处理室中， 通过产生等离子体对真空处理室进行干洗。 在完成干洗之后，虚拟衬底返回到虚拟衬底存储装置。 因此，仅用于清洁目的的特定机构是不必要的，并且可以使装置的结构简单。 此外，用于干洗的虚拟基板和待加工的基板不共存，可以防止由于灰尘和剩余气体而被处理的基板的污染，并且生产率可以高。

公开(公告)号：US20040074104A1

公开(公告)日：2004-04-22

申请号：US10683067

申请日：2003-10-14

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: F26B013/30 ,  B65G001/00

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: This invention relates to a vacuum processing apparatus having vacuum processing chambers the insides of which must be dry cleaned, and to a method of operating such an apparatus When the vacuum processing chambers are dry-cleaned, dummy substrates are transferred into the vacuum processing chamber by substrates conveyor means from dummy substrate storage means which is disposed in the air atmosphere together with storage means for storing substrates to be processed, and the inside of the vacuum processing chamber is dry-cleaned by generating a plasma. The dummy substrate is returned to the dummy substrate storage means after dry cleaning is completed. Accordingly, any specific mechanism for only the cleaning purpose is not necessary and the construction of the apparatus can be made simple Furthermore, the dummy substrates used for dry cleaning and the substrates to be processed do not coexist, contamination of the substrates to be processed due to dust and remaining gas can be prevented and the production yield can be high.

Abstract translation: 本发明涉及具有真空处理室的真空处理装置，其内部必须被干燥清洁，以及操作这种装置的方法当真空处理室被干洗时，虚设基板通过 基板输送装置由设置在空气气氛中的虚拟基板存储装置和用于存储待处理基板的存储装置一起，并且通过产生等离子体对真空处理室的内部进行干洗。 在完成干洗之后，虚拟衬底返回到虚设衬底存储装置。 因此，仅用于清洁目的的任何特定机构不是必需的，并且可以简化设备的构造此外，用于干洗的虚拟基板和待处理的基板不共存，因此将被处理的基板的污染 可以防止灰尘和剩余的气体，并且生产率可以高。

公开(公告)号：US06505415B2

公开(公告)日：2003-01-14

申请号：US09781296

申请日：2001-02-13

Applicant: Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

Inventor： Shigekazu Kato ,  Kouji Nishihata ,  Tsunehiko Tsubone ,  Atsushi Itou

IPC: F26B1330

CPC classification number: H01L21/67748 ,  B01J3/006 ,  B41J2/36 ,  B41J2/365 ,  C23C14/564 ,  H01L21/67028 ,  H01L21/67167 ,  H01L21/67253 ,  H01L21/67736 ,  Y10S134/902 ,  Y10S414/137 ,  Y10S414/139 ,  Y10S414/14

Abstract: A vacuum processing apparatus which includes a cassette mount table for holding at least one cassette, a conveying structure which includes a robot for conveying a wafer held on the cassette mount table, a vacuum loader which includes an additional robot, an additional conveying structure and a plurality of lock chambers.

Abstract translation: 一种真空处理装置，包括用于保持至少一个盒的盒安装台，包括用于传送保持在盒安装台上的晶片的机器人的输送结构，包括附加机器人的附加输送结构和 多个锁室。

公开(公告)号：US06495110B1

公开(公告)日：2002-12-17

申请号：US09403501

申请日：1999-10-22

Applicant: Tsutomu Higo ,  Massahiro Roberto Serikawa

Inventor： Tsutomu Higo ,  Massahiro Roberto Serikawa

IPC: F28D700

CPC classification number: B01J3/008 ,  B01J3/006 ,  B01J3/042 ,  B01J19/20 ,  B01J19/243 ,  B01J2219/00006 ,  B01J2219/00049 ,  B01J2219/00058 ,  B01J2219/00094 ,  B01J2219/00159 ,  B01J2219/00162 ,  B01J2219/00164 ,  B01J2219/187 ,  Y02P20/544

Abstract: A method and apparatus for processing substances by coexisting an object matter with water held at temperature above 200° C. to carry out chemical reactions such as severing of molecular chains, recombination and decoupling occluded molecules, oxidation and reduction reactions. A mixture phase containing an object matter and a liquid medium is subjected to a super-critical state of a medium in a super-critical reaction apparatus, where feed inlets are provided on the upper end, and a product outlet is provided on the lower end. In the interior of the apparatus, the super-critical zone is provided above and the sub-critical zone is provided below, and the object matter and the reaction products are progressed towards a lower end of a reaction chamber in one direction.

Abstract translation: 通过将物体与保持在高于200℃的温度保持在一起的物质来进行物质的处理的方法和装置，以进行化学反应，例如切断分子链，重组和解耦闭塞的分子，氧化和还原反应。 含有物体和液体介质的混合相在超临界反应装置中经受介质的超临界状态，其中在上端设置有进料口，在下端设置有产物出口 。 在设备的内部，设置超临界区，并且在下方提供亚临界区，物体和反应产物沿着一个方向前进到反应室的下端。

公开(公告)号：US20020179586A1

公开(公告)日：2002-12-05

申请号：US10211776

申请日：2002-08-01

Inventor： John F. Wengert ,  Loren R. Jacobs ,  Michael W. Halpin ,  Derrick W. Foster ,  Cornelius A. van der Jeugd ,  Robert M. Vyne ,  Mark R. Hawkins

IPC: F27D011/00 ,  F27B005/14

CPC classification number: B01J3/006 ,  C23C16/44 ,  C23C16/455 ,  C23C16/45502 ,  C23C16/46 ,  C23C16/481 ,  H01L21/67115 ,  H01L21/68735 ,  H01L21/68785

Abstract: An improved chemical vapor deposition reaction chamber having an internal support plate to enable reduced pressure processing. The chamber has a vertical-lateral lenticular cross-section with a wide horizontal dimension and a shorter vertical dimension between bi-convex upper and lower walls. A central horizontal support plate is provided between two lateral side rails of the chamber. A large rounded rectangular aperture is formed in the support plate for positioning a rotatable susceptor on which a wafer is placed. The shaft of the susceptor extends downward through the aperture and through a lower tube depending from the chamber. The support plate segregates the reaction chamber into an upper region and a lower region, with purge gas being introduced through the lower tube into the lower region to prevent unwanted deposition therein. A temperature compensation ring is provided surrounding the susceptor and supported by fingers connected to the support plate. The temperature compensation ring may be circular or may be built out to conform to the rounded rectangular shape of the support plate aperture. The ring may extend farther downstream from the susceptor than upstream. A separate sacrificial quartz plate may be provided between the circular temperature compensation ring and the rounded rectangular aperture. The quartz plate may have a horizontal portion and a vertical lip in close abutment with the aperture to prevent devitrification of the support plate. A gas injector abuts an inlet flange of the chamber and injects process gas into the upper region and purge gas into the lower region. The gas injector includes a plurality of independently controlled channels disposed laterally across the chamber, the channels merging at an outlet of the injector to allow mixing of the adjacent longitudinal edges of the separate flows well before reaching the wafer.

Abstract translation: 改进的化学气相沉积反应室具有内部支撑板以实现减压处理。 该腔室具有垂直横向的透镜状横截面，在双凸上壁和下壁之间具有宽的水平尺寸和较短的垂直尺寸。 中央水平支撑板设置在腔室的两个侧向侧轨之间。 在支撑板中形成大的圆形矩形孔，用于定位其上放置晶片的可旋转基座。 基座的轴向下延伸穿过孔，并通过从腔室垂下的下管。 支撑板将反应室分离成上部区域和下部区域，其中吹扫气体通过下部管道被引入下部区域，以防止其中不希望的沉积。 温度补偿环设置在基座周围并由连接到支撑板的手指支撑。 温度补偿环可以是圆形的，或者可以被构造成符合支撑板孔的圆形矩形形状。 环可以比上游更远离基座延伸下游。 可以在环形温度补偿环和圆形矩形孔之间设置单独的牺牲石英板。 石英板可以具有与孔紧密邻接的水平部分和垂直唇缘，以防止支撑板的失透。 气体喷射器邻接室的入口凸缘并将工艺气体注入上部区域并将气体吹入下部区域。 气体喷射器包括跨过室横向设置的多个独立控制的通道，通道在喷射器的出口处汇合，以允许在到达晶片之前将分离的流的相邻纵向边缘混合。

公开(公告)号：US20020179428A1

公开(公告)日：2002-12-05

申请号：US10080701

申请日：2002-02-25

Applicant: FUJI XEROX CO., LTD.

Inventor： Kazunori Anazawa ,  Hiroyuki Watanabe ,  Masaaki Shimizu

IPC: C01B031/00 ,  B01J019/08

CPC classification number: B01J19/087 ,  B01J3/006 ,  B01J19/088 ,  B01J2219/0809 ,  B01J2219/0822 ,  B01J2219/0828 ,  B01J2219/083 ,  B01J2219/0852 ,  B01J2219/0854 ,  B01J2219/0866 ,  B01J2219/0879 ,  B01J2219/0894 ,  B82Y30/00 ,  B82Y40/00 ,  C01B32/16 ,  C01B2202/30

Abstract: Apparatus for producing a carbon structure at least including two electrodes 11 and 12 having forefront portions opposed to each other, and a power supply 18 for applying a voltage between the electrodes 11 and 12 so that discharge plasma is produced in a discharge area between the electrodes 11 and 12. The apparatus for producing a carbon structure further including a magnetic field generating unit 20 to 23 for forming at least a magnetic field including multidirectional lines of magnetic force or a magnetic field including a component parallel with the traveling direction of a discharge current, in an area where the discharge plasma is generated. In addition, a method for producing a carbon structure, using such an operation.

Abstract translation: 用于制造至少包括彼此相对的前沿部分的两个电极11和12的碳结构的设备，以及用于在电极11和12之间施加电压使得在电极之间的放电区域中产生放电等离子体的电源18 用于制造碳结构的装置还包括磁场产生单元20至23，用于至少形成包括多个磁力线的磁场或包括与放电电流的行进方向平行的分量的磁场 ，在产生放电等离子体的区域中。 此外，使用这种操作的碳结构的制造方法。