公开(公告)号：US07078994B2

公开(公告)日：2006-07-18

申请号：US10781208

申请日：2004-02-17

Applicant: Glenn Henry Martin ,  Ronald L Rohde ,  John O. H. Nisownger

Inventor： Glenn Henry Martin ,  Ronald L Rohde ,  John O. H. Nisownger

IPC: H01F27/08

CPC classification number: H01J37/147 ,  G21K5/04 ,  H01F7/20

Abstract: A coil apparatus is described that incorporates two or more conductors, wound in parallel, following the same path, in intimate physical contact throughout the path but electrically isolated. The current applied to each of the coils can be selected independently. The field generated by the coil, or force on the coil in a magnetic field, is proportional to the algebraic sum of the currents. The power applied to the coil is proportional to the sum of square of the currents. By independently selecting the appropriate current's to apply to each of the conductors, a desired field, or force, can be generated by the coil for any desired power applied to the coil. By judiciously selecting appropriate currents to apply to each of the conductors, a range of fields, or forces, may be selected for which a constant power may be applied to the coil. A constant power enables the coil to operate at a constant temperature.

公开(公告)号：US06906453B2

公开(公告)日：2005-06-14

申请号：US10842899

申请日：2004-05-10

Applicant: Michael Mauck

Inventor： Michael Mauck

IPC: G21K1/00 ,  C23C14/54 ,  G21K1/093 ,  G21K5/04 ,  H01J3/07 ,  H01J37/04 ,  H01J37/147 ,  H01J37/153 ,  H01J37/21 ,  H01J37/30 ,  H01J37/317 ,  H01L21/027 ,  H05H7/06

CPC classification number: G01N23/04 ,  G21K1/093 ,  H01J37/147 ,  H01J37/3005 ,  H01J37/3007 ,  Y10S977/869 ,  Y10S977/881 ,  Y10S977/887 ,  Y10S977/89

Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.

Abstract translation: 一种用于连接至少两束带电粒子的系统，包括将第一光束沿着第一轴线引导到场中。 沿着第二轴将第二光束引导到场中。 第一和第二光束通过场和第一和第二光束之间的相互作用转动成沿着第三轴指向的第三光束。

公开(公告)号：US06825476B2

公开(公告)日：2004-11-30

申请号：US10182226

申请日：2002-09-26

Applicant: Pavel Adamec

Inventor： Pavel Adamec

IPC: H01J37317

CPC classification number: H01J37/153 ,  H01J37/147 ,  H01J2237/04737 ,  H01J2237/04924

Abstract: An improved column for a charged particle beam device is constituted by, among other things, deflectors for scanning the beam over the specimen, for aligning the beam with regard to the objective and for compensating aberrations caused by the objective. Thereby, the total number of electrode arrangements and/or coil arrangements that are used for the deflectors and that are independently controllable, is 8 or less.

Abstract translation: 用于带电粒子束装置的改进的列尤其包括用于扫描样品上的束的偏转器，用于使光束相对于物镜对准并且用于补偿由物镜引起的像差。 因此，用于偏转器并且可独立控制的电极布置和/或线圈布置的总数为8个或更小。

公开(公告)号：US06815880B2

公开(公告)日：2004-11-09

申请号：US10429067

申请日：2003-05-02

Applicant: Michael Mauck

Inventor： Michael Mauck

IPC: H05H706

CPC classification number: G01N23/04 ,  G21K1/093 ,  H01J37/147 ,  H01J37/3005 ,  H01J37/3007 ,  Y10S977/869 ,  Y10S977/881 ,  Y10S977/887 ,  Y10S977/89

Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.

Abstract translation: 一种用于连接至少两束带电粒子的系统，包括将第一光束沿着第一轴线引导到场中。 沿着第二轴将第二光束引导到场中。 第一和第二光束通过场和第一和第二光束之间的相互作用转动成沿着第三轴指向的第三光束。

公开(公告)号：US06802986B2

公开(公告)日：2004-10-12

申请号：US10197309

申请日：2002-07-16

Applicant: Katsushi Nakano

Inventor： Katsushi Nakano

IPC: H01B1300

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01F5/003 ,  H01F7/20 ,  H01F7/202 ,  H01F2041/0711 ,  H01J37/147 ,  H01J37/1475 ,  H01J37/3174 ,  H01J2237/103 ,  H01J2237/1405 ,  H01J2237/1526 ,  H01J2237/1534 ,  Y10T29/4902

Abstract: Deflectors are disclosed that are suitable for use in various charged-particle-beam (CPB) optical systems as used, for example, in CPB microlithography systems. The deflectors produce a strong magnetic beam-deflecting field when energized with a relatively small electrical current. The beam-deflecting field thus produced is stable with respect to temperature changes, is little affected by eddy currents, and exhibits low aberration caused by manufacturing tolerances of the coil and core. In an exemplary method for manufacturing such a deflector, a magnetic-tape laminate is used as the core. Also, high-precision positioning of the coil and the magnetic-tape laminate is performed using photolithography and electrocasting. Positioning of the magnetic-tape laminate can be performed using a resist pattern formed by photolithography.

Abstract translation: 公开了适用于例如在CPB微光刻系统中使用的各种带电粒子束（CPB）光学系统的偏转器。 当相对较小的电流通电时，偏转器产生强磁场偏转场。 由此产生的光束偏转场相对于温度变化是稳定的，几乎不受涡流的影响，并且表现出由线圈和芯的制造公差引起的低像差。 在制造这种偏转器的示例性方法中，使用磁带层压体作为核心。 此外，使用光刻和电铸来进行线圈和磁带层压体的高精度定位。 可以使用通过光刻形成的抗蚀剂图案来进行磁带层压体的定位。

公开(公告)号：US20040188612A1

公开(公告)日：2004-09-30

申请号：US10817834

申请日：2004-04-06

Applicant: HITACHI, LTD

Inventor： Yoichi Ose ,  Hideo Todokoro ,  Makoto Ezumi ,  Mitsugu Sato

IPC: H01J037/28

CPC classification number: H01J37/147 ,  H01J37/1471 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/12 ,  H01J2237/14 ,  H01J2237/1516 ,  H01J2237/244 ,  H01J2237/2817

Abstract: The present invention is intended to prevent the deterioration of resolution due to increase in off-axis aberration resulting from the deviation of a primary electron bean from the optical axis of a scanning electron microscope. A scanning electron microscope is provided with an image shifting deflector system including two deflectors disposed respectively at upper and lower stages. The deflector disposed at the lower stage is a multipole electrostatic deflecting electrode and is disposed in an objective. Even if the distance of image shifting is great, an image of a high resolution can be formed and dimensions can be measured in a high accuracy. The SEM is able to achieving precision inspection at a high throughput when applied to inspection in semiconductor device fabricating processes that process a wafer having a large area and provided with very minute circuit elements.

Abstract translation: 本发明旨在防止由于一次电子束与扫描型电子显微镜的光轴的偏离引起的离轴像差的增加而导致的分辨率的劣化。 扫描电子显微镜设置有分别设置在上部和下部的两个偏转器的图像偏转偏转器系统。 设置在下级的偏转器是多极静电偏转电极，并且设置在物镜中。 即使图像偏移的距离大，也可以形成高分辨率的图像，并且可以高精度地测量尺寸。 当在用于处理具有大面积的晶片并且具有非常微小的电路元件的半导体器件制造工艺中进行检查时，SEM能够以高产量实现精密检查。

公开(公告)号：US20040075053A1

公开(公告)日：2004-04-22

申请号：US10634810

申请日：2003-08-06

Applicant: LEO Elektronenmikroskopie GmbH

Inventor： Dirk Preikszas ,  Michael Steigerwald

IPC: H01J037/26 ,  H01J037/147

CPC classification number: H01J37/153 ,  H01J37/147 ,  H01J2237/1523 ,  H01J2237/28 ,  H01J2237/3175

Abstract: There are disclosed particle-optical beam splitters providing at least three beam-manipulating regions having magnetic fields of different field strengths provided therein for at least one particle beam passing the beam splitter. The beam splitter is, in first order, free of dispersion, astigmatism and distortion.

Abstract translation: 公开了提供至少三个光束操纵区域的粒子光束分离器，其中为其中通过分束器的至少一个粒子束提供了具有不同场强的磁场。 分束器的第一级没有色散，散光和失真。

公开(公告)号：US06710361B2

公开(公告)日：2004-03-23

申请号：US10131709

申请日：2002-04-23

Applicant: Hans C. Pfeiffer ,  Michael S. Gordon ,  Maris A. Sturans

Inventor： Hans C. Pfeiffer ,  Michael S. Gordon ,  Maris A. Sturans

IPC: G21K510

CPC classification number: B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3177

Abstract: A multi-beam e-beam system employs a set of independently controllable (for blanking and deflection) subsystems placed in a solenoid field, each system having a demagnifying lens comprising at least one passive pole piece, so that the final image demagnifies imperfections in the upstream electron beam. Upper and lower sections of the system employ the focusing effect of the solenoid field to form an image at a shaping aperture and a demagnified image of the beam at the shaping aperture on the workpiece. Small focus corrections due to magnetic lens field non-uniformity and/or target height variations, are accomplished with an electrostatic unipotental lens built into the pole pieces and target voltage variations.

Abstract translation: 多光束电子束系统采用放置在螺线管磁场中的一组可独立控制的（用于消隐和偏转）的子系统，每个系统具有包括至少一个无源极片的减光透镜，从而使最终图像缩小在 上游电子束。 该系统的上部和下部采用螺线管磁场的聚焦效应，以在成形孔处形成图像，并在工件上的成形孔处形成光束的缩小图像。 由于磁透镜场不均匀性和/或目标高度变化引起的小焦点校正是通过内置在极片中的静电单极透镜和目标电压变化来实现的。

公开(公告)号：US20030201397A1

公开(公告)日：2003-10-30

申请号：US10429067

申请日：2003-05-02

Inventor： Michael Mauck

IPC: H01J037/147

CPC classification number: G01N23/04 ,  G21K1/093 ,  H01J37/147 ,  H01J37/3005 ,  H01J37/3007 ,  Y10S977/869 ,  Y10S977/881 ,  Y10S977/887 ,  Y10S977/89

Abstract: A system for joining at least two beams of charged particles that includes directing a first beam along a first axis into a field. A second beam is directed along a second axis into the field. The first and second beams are turned, by interaction between the field and the first and second beams, into a third beam directed along a third axis.

公开(公告)号：US06586746B1

公开(公告)日：2003-07-01

申请号：US09670728

申请日：2000-09-27

Applicant: Scott A. Messick ,  Joseph J. Senesi ,  Maris A. Sturans

Inventor： Scott A. Messick ,  Joseph J. Senesi ,  Maris A. Sturans

IPC: H01J37147

CPC classification number: H01J37/147

Abstract: Forming poles from sectors of a tube of carbon or a material with similar conductive properties and supporting the poles by bonding an insulating support ring thereto before removing end rings formed at the ends of the tube which temporarily support the poles provides a multipole deflector element of robust structure of high dimensional accuracy and stability in which eddy current and charging effects are avoided. The manufacturing method is much simplified, reduced in cost and increased in reliability, repeatability and yield over manufacturing techniques for known multipole deflectors.

Abstract translation: 从碳管或具有相似导电性能的材料的部分形成极点，并且通过在绝缘支撑环之前粘合绝缘支撑环来支撑极点，然后除去形成在管末端的端环，其临时支撑极点，提供了一个坚固的多极偏转元件 避免涡流和充电效应的高尺寸精度和稳定性的结构。 制造方法比已知多极偏转器的制造技术简单化，成本降低，可靠性，重复性和产量提高。