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    COMPOSITE BEAM APPARATUS
    1.
    发明申请
    COMPOSITE BEAM APPARATUS 审中-公开

    公开(公告)号：US20180076001A1

    公开(公告)日：2018-03-15

    申请号：US15696445

    申请日：2017-09-06

    Applicant: HITACHI HIGH-TECH SCIENCE CORPORATION

    Inventor： Tatsuya ASAHATA

    IPC: H01J37/02 ,  H05H3/00 ,  H01J37/29 ,  H01J37/141 ,  H01J37/305

    CPC classification number: H01J37/026 ,  H01J37/141 ,  H01J37/292 ,  H01J37/3056 ,  H01J2237/1405 ,  H05H3/00

    Abstract: Disclosed is a composite beam apparatus capable of suppressing the influence of charge build-up, or electric field or magnetic field leakage from an electron beam column when subjecting a sample to cross-section processing with a focused ion beam and then performing finishing processing with another beam. The Composite beam apparatus includes: an electron beam column irradiating an electron beam onto a sample; a focused ion beam column irradiating a focused ion beam onto the sample to form a cross section; a neutral particle beam column having an acceleration voltage set lower than that of the focused ion beam column, and irradiating a neutral particle beam onto the sample to perform finish processing of the cross section, wherein the electron beam column, the focused ion beam column, and the neutral particle beam column are arranged such that the beams of the columns cross each other at an irradiation point.

    DEVICE AND METHOD FOR OPTIMIZING DIFFUSION SECTION OF ELECTRON BEAM
    2.
    发明申请
    DEVICE AND METHOD FOR OPTIMIZING DIFFUSION SECTION OF ELECTRON BEAM 有权
    用于优化电子束扩散部分的装置和方法

    公开(公告)号：US20160189914A1

    公开(公告)日：2016-06-30

    申请号：US14895708

    申请日：2014-10-17

    Applicant: HUAZHONG UNIVERSITY OF SCIENCE AND TECHNOLOGY

    Inventor： Jiang HUANG ,  Mingwu FAN ,  Tiaoqin YU ,  Lige ZHANG ,  Chen ZUO ,  Jun YANG ,  Yongqian XIONG ,  Kaifeng LIU ,  Gerald F. WU ,  Lei CAO

    IPC: H01J37/143

    CPC classification number: H01J37/143 ,  G21K1/093 ,  G21K5/04 ,  H01J3/12 ,  H01J33/00 ,  H01J37/3178 ,  H01J2237/0835 ,  H01J2237/1405 ,  H01J2237/152

    Abstract: Provided is a device for optimizing a diffusion section of an electron beam, comprising two groups of permanent magnets, a magnetic field formed by the four magnetic poles extending the electron beam in a longitudinal direction, and compressing the electron beam in a transverse direction, so that the electron beam becomes an approximate ellipse; another magnetic field formed by the eight magnetic poles optimizing an edge of a dispersed electron-beam bunch into an approximate rectangle; by controlling the four longitudinal connection mechanisms so that the upper magnetic yoke and the lower magnetic yoke of the first group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate ellipse, and the upper magnetic yoke and the lower magnetic yoke of the second group of permanent magnets move synchronously towards the center thereof thereby longitudinally compressing the electron beam in the shape of an approximate rectangle, and the process of longitudinal compression is repeated until a longitudinal size of the electron-beam bunch is reduced to 80 mm. The invention is capable of reasonably compressing a longitudinal size of an electron-beam bunch after diffusion to approximately 80 mm, which ensures optimum irradiation uniformity and efficiency, and enables the longitudinal size to be within the range of a conventional titanium window,

    Abstract translation: 本发明提供一种用于优化电子束的扩散部分的装置，包括两组永久磁体，由四个磁极形成的磁场，该四个磁极沿纵向方向延伸电子束，并且沿横向压缩电子束，因此 电子束变成近似椭圆; 由八个磁极形成的另一个磁场将分散的电子束束的边缘优化成近似矩形; 通过控制四个纵向连接机构，使得第一组永磁体的上磁轭和下磁轭同步向其中心移动，从而纵向压缩近似椭圆形的电子束，并且上磁轭 并且第二组永磁体的下磁轭朝向其中心同步移动，从而纵向压缩大致矩形的电子束，并且重复纵向压缩的过程，直到电子束束的纵向尺寸 减至80毫米。 本发明能够将扩散后的电子束束的纵向尺寸合理地压缩至大约80mm，这确保了最佳的照射均匀性和效率，并且使纵向尺寸在常规的钛合金窗口的范围内，

    Multi-axis magnetic lens for focusing a plurality of charged particle beams
    4.
    发明授权
    Multi-axis magnetic lens for focusing a plurality of charged particle beams 有权
    用于聚焦多个带电粒子束的多轴磁性透镜

    公开(公告)号：US09202658B2

    公开(公告)日：2015-12-01

    申请号：US14572052

    申请日：2014-12-16

    Applicant: Hermes-Microvision, Inc.

    Inventor： Zhongwei Chen ,  Weiming Ren ,  Xuerang Hu ,  Xuedong Liu

    IPC: H01J1/50 ,  H01J3/20

    CPC classification number: H01J3/20 ,  H01J37/141 ,  H01J37/143 ,  H01J2237/1405 ,  Y10T29/49075

    Abstract: A multi-axis magnetic lens with stable performance in focusing a plurality of charged particle beams is provided. The multi-axis magnetic lens comprises a plurality of magnetic dub-lens modules. On the one hand, the multi-axis magnetic lens employs an annular permanent-magnet unit to provide a basic and stable magnetic flux to the plurality of magnetic sub-lens modules. One the other hand, the multi-axis magnetic lens uses a plurality of subsidiary coils to provide additional and adjustable magnetic flux to the plurality of magnetic sub-lens modules respectively. The invention also proposes a method to turn off or adjust the basic and stable magnetic flux for some applications. Hence, this invention will benefit the applications which need to execute in a long time period while keeping a high stabilization in performance.

    Abstract translation: 提供了一种在聚焦多个带电粒子束时具有稳定性能的多轴磁性透镜。 多轴磁性透镜包括多个磁性复数透镜模块。 一方面，多轴磁性透镜采用环形永磁体单元，以向多个磁性子透镜模块提供基本稳定的磁通量。 另一方面，多轴磁性透镜使用多个辅助线圈来分别向多个磁性子透镜模块提供附加和可调节的磁通量。 本发明还提出了在一些应用中关闭或调节基本和稳定磁通的方法。 因此，本发明将有益于需要在长时间内执行的应用，同时保持高性能稳定性。

    ELECTRON LENS AND THE ELECTRON BEAM DEVICE
    7.
    发明申请
    ELECTRON LENS AND THE ELECTRON BEAM DEVICE 审中-公开
    电子镜头和电子束装置

    公开(公告)号：US20140252245A1

    公开(公告)日：2014-09-11

    申请号：US14271940

    申请日：2014-05-07

    Applicant: PARAM CORPORATION

    Inventor： Hiroshi Yasuda

    IPC: H01J37/143 ,  H01J37/30 ,  H01J37/317 ,  H01J3/24

    CPC classification number: H01J3/24 ,  B82Y10/00 ,  B82Y40/00 ,  H01J3/20 ,  H01J37/143 ,  H01J37/3007 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/1405

    Abstract: There provided a device for effectively drawing a fine pattern using a permanent magnet. The device has an outer cylinder 201 composed of a cylindrical ferromagnet with a Z axis as a central axis, a cylindrical permanent magnet 202 located inside the outer cylinder and polarized along the Z axis direction, a correction coil 204 located inside the cylindrical permanent magnet with a gap from the cylindrical permanent magnet, for adjusting a magnetic field strength generated by the cylindrical permanent magnet along the Z axis direction, and a coolant passage 203 located in the gap between the cylindrical permanent magnet and the correction coil, for allowing a coolant to flow therethrough and controlling temperature changes in the cylindrical permanent magnet.

    Abstract translation: 提供了一种用于使用永磁体有效地绘制精细图案的装置。 该装置具有由Z轴作为中心轴的圆柱形铁磁体构成的外筒201，位于外筒内部并沿着Z轴方向极化的圆柱形永磁体202，位于筒状永久磁铁内部的校正线圈204， 用于调整由圆柱形永磁体沿Z轴方向产生的磁场强度的圆柱形永磁体的间隙和位于圆柱形永磁体和校正线圈之间的间隙中的冷却剂通道203，用于允许冷却剂 流过其中并控制圆筒形永磁体的温度变化。

    Chromatic aberration corrector and electron microscope
    8.
    发明授权
    Chromatic aberration corrector and electron microscope 有权
    色差校正器和电子显微镜

    公开(公告)号：US08785880B2

    公开(公告)日：2014-07-22

    申请号：US14102838

    申请日：2013-12-11

    Applicant: JEOL Ltd.

    Inventor： Hidetaka Sawada ,  Fumio Hosokawa

    IPC: G21K1/08 ,  H01J3/14 ,  H01J3/26 ,  H01J49/42

    CPC classification number: H01J37/153 ,  H01J37/26 ,  H01J2237/12 ,  H01J2237/1405 ,  H01J2237/1534

    Abstract: The chromatic aberration corrector (100) has a first multipole element (110) for producing a first electromagnetic field and a second multipole element (120) for producing a second electromagnetic field. The first multipole element (110) first, second, and third portions (110a, 110b, 110c) arranged along an optical axis (OA) having a thickness and producing a quadrupole field in which an electric quadrupole field and a magnetic quadrupole field are superimposed. In the first and third portions (110a, 110c), the electric quadrupole field is set stronger than the magnetic quadrupole field. In the second portion (110b), the magnetic quadrupole field is set stronger than the electric quadrupole field. The second portion (110b) produces a two-fold astigmatism component that is opposite in sign to two-fold astigmatism components produced by the first portion (110a) and third portion (110c).

    Abstract translation: 色差校正器（100）具有用于产生第一电磁场的第一多极元件（110）和用于产生第二电磁场的第二多极元件（120）。 第一多极元件（110）沿着具有厚度并且产生四极场的光轴（OA）布置的第一，第二和第三部分（110a，110b，110c），其中电四极场和四极磁场被叠加 。 在第一和第三部分（110a，110c）中，电四极场被设置为比四极四极场强。 在第二部分（110b）中，将四极四极场设置得比电四极场强。 第二部分（110b）产生与由第一部分（110a）和第三部分（110c）产生的两折像散分量相反的双折射散光成分。

    Electron gun with magnetic immersion double condenser lenses
    9.
    发明授权
    Electron gun with magnetic immersion double condenser lenses 有权
    电子枪与磁浸双重聚光镜

    公开(公告)号：US08314401B2

    公开(公告)日：2012-11-20

    申请号：US12896110

    申请日：2010-10-01

    Applicant: Xu Zhang ,  Zhong-Wei Chen

    Inventor： Xu Zhang ,  Zhong-Wei Chen

    IPC: H01J1/50

    CPC classification number: H01J37/141 ,  H01J37/063 ,  H01J2237/065 ,  H01J2237/083 ,  H01J2237/1035 ,  H01J2237/1405

    Abstract: An electron gun comprises an electron emitter, an electrode surrounding the electron emitter, an extraction electrode, and a double condenser lens assembly, the double condenser lens assembly comprising a magnetic immersion pre-condenser lens and a condenser lens. In combination with a probe forming objective lens, the electron gun apparatus can provide an electron beam of independently adjustable probe size and probe current, as is desirable in electron beam applications. The electron emitter is immersed in the magnetic field generated by a magnetic type pre-condenser lens. When activated, the pre-condenser lens collimates the beam effectively to increase its angular intensity while at the same time enlarging the virtual source as compared with non-immersion case, due to geometric magnification and aberrations of its lens action. The pre-condenser lens is followed by a condenser lens. If the condenser lens is of the magnetic type, its peak magnetic field is far enough away and thus its action does not significantly affect the size of the virtual source. Independent adjustment of the lenses, combined with suitable selection of final probe forming objective aperture size, allows various combination of the final probe size and probe current to be obtained in a range sufficient for most electron beam applications.

    Abstract translation: 电子枪包括电子发射器，围绕电子发射体的电极，引出电极和双重聚光透镜组件，双重聚光透镜组件包括磁性浸入式预聚光透镜和聚光透镜。 与形成物镜的探针组合，如在电子束应用中所希望的那样，电子枪装置可以提供独立可调的探针尺寸和探针电流的电子束。 将电子发射器浸入由磁式预聚光透镜产生的磁场中。 当激活时，由于几何放大和其透镜作用的像差，预聚焦透镜有效地准直光束以增加其角度强度，同时与非浸没情况相比放大虚拟光源。 预聚光透镜之后是聚光透镜。 如果聚光透镜是磁性的，则其峰值磁场足够远，因此其作用不会显着影响虚拟源的尺寸。 透镜的独立调整结合适当选择最终探针形成物镜孔径的尺寸允许在足以满足大多数电子束应用的范围内获得最终探针尺寸和探针电流的各种组合。

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