Abstract:
A light integrator produces diffuse illumination from a beam of light wherein image artifacts due to debris within the integrator are suppressed. The light integrator includes an integrator block having an elongated cylindrical light integrating cavity enclosed by end walls and a longitudinal cylindrical chamber wall having a diffusely reflecting interior surface The chamber wall includes a longitudinally extending output slit for emitting light from the cavity. A dust-free zone exists within the cavity in the shape of a sector of a circle within which contaminants cannot come to rest without producing visible artifacts, wherein the origin of the sector is located at or nearby a plane of the original. An elongated light pipe extends into the cavity through one of the end walls, where the light pipe has an input port at one end thereof for introducing the beam of light and a treatment along its length for emitting light entering its port into the cavity. At least one of the end walls forms a support for the elongated light pipe so that the light pipe extends along a length of the integrating cavity outside of the dust-free zone and in relation to the chamber wall thereof to direct light emitted therefrom toward the diffusely reflecting interior surface.
Abstract:
An illuminance measurement apparatus for measuring the illuminance of illumination light on an image plane of a projection optical system of an exposure apparatus designed to project the image of a pattern from an illuminated mask on a substrate held on a substrate stage by the projection optical system, including an illuminance meter detachably attached to the substrate stage, the illuminance meter having an illuminance detector, a transmitter for wirelessly transmitting a measurement result of the illuminance detector, a storage cell, and a photoelectric converter for converting part of the illumination light photoelectrically and storing it in the storage cell, and a receiver for receiving the wireless signal including the measurement results transmitted by the transmitter.
Abstract:
The invention relates in general to calibrating a focused beam of energy in a solid freeform fabrication apparatus, and, in particular, to a method of measuring the propagation characteristics of the beam to produce beam propagation data. The beam propagation data can be used to verify that the beam is operating within tolerance, and/or produce a response that can be used to further calibrate the beam. The invention is particularly useful in determining asymmetric conditions in the beam. The beam propagation data is produced in accord with the “M2” standard for characterizing a beam. In one embodiment, the response indicates the beam is unacceptable for use in the apparatus. In another embodiment, the response is provided to calibrate the focal position of the beam. In still another embodiment, the response is provided to an adjustable beam that eliminates the asymmetric condition.
Abstract:
A cold light UV irradiation device is used for curing UV paint and UV printing dyes on heat-sensitive substrates (12,13). It is used, for example, in plants for printing on packaging foils or in the production line for CD□s (Compact Discs) and DVD□s (Digital Versatile Discs). The irradiation devices used until now emit in addition to the UV radiation also a high portion of heat radiation (IR Radiation) onto the substrate (12,13), which often leads to deformation and brittleness of the substrate. The present invention allows an effective separation of the UV radiation from the IR radiation. With short beam paths, a high UV intensity with a low heat load of the substrate is realized.
Abstract:
A system is disclosed for analyzing an illumination field of a line of laser illumination. The system includes a first movable unit, a second movable unit, and a sensor unit. The first movable unit includes a first opening through which at least a portion of the illumination field may pass. The first movable unit is adapted for movement in a first direction. The sensor unit is adapted to receive illumination and to produce a sensor output signal representative a characteristic of the illumination field. The second movable unit includes a second opening through which at least a portion of the illumination field may pass. The second movable unit is positioned between the first movable unit and the sensor unit and is adapted for movement between at least a first position in which very little or no light from the illumination field may reach the sensor unit, and a second position in which a relatively high amount of light from the illumination field may reach the sensor unit.
Abstract:
A self-propelled infrared emission aerial target has an aircraft- or a missile-shaped body and a nose, wings and/or control surfaces, a system for feeding fuel and oxidizer to a combustion chamber in which combustion gases are produced and for supplying the combustion gases to a propulsion nozzle, and an infrared radiation emitter. The target has at least one conduit connecting the combustion chamber or propulsion nozzle of the propulsion system to a nose, wing and/or control surface of the target, or to an outside element attached thereto.
Abstract:
A method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern. The method includes storing information related to a light intensity distribution on a pupil plane of the predetermined optical system in a reference state, and detecting a wavefront of the predetermined optical system in an arbitrary state, on the basis of the stored information.
Abstract:
An electron-beam exposure method of segmented mask-pattern transfer type wherein a prescribed pattern is segmented into a plurality of divisions so as to form a segmented pattern in every division and exposure is made through every division one after another, so that the projection of the whole of the prescribed pattern is accomplished. The method includes the steps of carrying out the exposure through every division and transcribing a segmented pattern thereon one after another. The method also includes the steps of carrying out the correction exposure for every projection region of the segmented patterns one after another with a defocused beam of the inverse pattern of the respective segmented patterns, and thereby the proximity effect caused by the pattern exposure is corrected.
Abstract:
Radiation source for emitting radiation in pulses with a duration and at intervals within chosen ranges, comprising at least one plate-shaped radiant element (1), and at least two electrical conductors coupled to the element(s). The source also includes at least one plate-shaped surrounding, thermally conductive element (2) being thermally coupled to a radiation element at its inner edge, and being thermally coupled to a cooling device (3) at its outer surface.
Abstract:
A Correlating Shack-Hartmann wavefront sensor developed for the solar adaptive optics systems. The correlation tracker as an image stabilization technique compares a real time image with a stored reference image using a fast cross-correlation calculation. Trackers of this sort are gradually coming into widespread use at solar observatories. On of their most useful features is their ability to track an extended, low contrast, temporally evolving scene.