Light integrator for film scanning with enhanced suppression of artifacts due to scratches and debris
    81.
    发明授权
    Light integrator for film scanning with enhanced suppression of artifacts due to scratches and debris 失效
    用于电影扫描的光积分器,由于划痕和碎片而增强了对人造物的抑制

    公开(公告)号:US06710329B1

    公开(公告)日:2004-03-23

    申请号:US10242261

    申请日:2002-09-12

    CPC classification number: H04N1/02835 G01J1/04 H04N1/02815 H04N1/0284

    Abstract: A light integrator produces diffuse illumination from a beam of light wherein image artifacts due to debris within the integrator are suppressed. The light integrator includes an integrator block having an elongated cylindrical light integrating cavity enclosed by end walls and a longitudinal cylindrical chamber wall having a diffusely reflecting interior surface The chamber wall includes a longitudinally extending output slit for emitting light from the cavity. A dust-free zone exists within the cavity in the shape of a sector of a circle within which contaminants cannot come to rest without producing visible artifacts, wherein the origin of the sector is located at or nearby a plane of the original. An elongated light pipe extends into the cavity through one of the end walls, where the light pipe has an input port at one end thereof for introducing the beam of light and a treatment along its length for emitting light entering its port into the cavity. At least one of the end walls forms a support for the elongated light pipe so that the light pipe extends along a length of the integrating cavity outside of the dust-free zone and in relation to the chamber wall thereof to direct light emitted therefrom toward the diffusely reflecting interior surface.

    Abstract translation: 光积分器从光束产生漫射照明,其中由积分器内的碎片引起的图像伪影被抑制。 光积分器包括积分器块,其具有由端壁包围的细长的圆柱形光积分腔和具有漫反射内表面的纵向圆柱形腔壁。腔室壁包括用于从空腔发射光的纵向延伸的输出狭缝。 空腔内的无尘区以圆形扇形的形状存在,污染物不会在其中产生可见的伪像而停留,其中扇形的原点位于原始的平面或其附近。 细长的光管通过一个端壁延伸到空腔中,其中光管在其一端具有用于引入光束的输入端口和沿其长度的处理,用于发射进入其端口的光进入空腔。 端壁中的至少一个形成用于细长光管的支撑件,使得光管沿着无尘区域外部的积分腔的长度延伸并且相对于其室壁将从其发射的光引导到 漫反射内表面。

    Illuminance measurement apparatus and exposure apparatus
    82.
    发明授权
    Illuminance measurement apparatus and exposure apparatus 失效
    照度测量装置和曝光装置

    公开(公告)号:US06690455B2

    公开(公告)日:2004-02-10

    申请号:US09813857

    申请日:2001-03-22

    Abstract: An illuminance measurement apparatus for measuring the illuminance of illumination light on an image plane of a projection optical system of an exposure apparatus designed to project the image of a pattern from an illuminated mask on a substrate held on a substrate stage by the projection optical system, including an illuminance meter detachably attached to the substrate stage, the illuminance meter having an illuminance detector, a transmitter for wirelessly transmitting a measurement result of the illuminance detector, a storage cell, and a photoelectric converter for converting part of the illumination light photoelectrically and storing it in the storage cell, and a receiver for receiving the wireless signal including the measurement results transmitted by the transmitter.

    Abstract translation: 一种照度测量装置,用于测量曝光装置的投影光学系统的图像平面上的照明光,该曝光装置被设计成通过投影光学系统将保持在基板台上的照明掩模上的图案的图像投射到基板台上, 包括可拆卸地附接到基板台的照度计,所述照度计具有照度检测器,用于无线发送照度检测器的测量结果的发送器,存储单元和用于将照明光的一部分光电转换并存储的光电转换器 在存储单元中,以及接收器,用于接收包括由发送器发送的测量结果的无线信号。

    Calibrating a focused beam of energy in a solid freeform fabrication apparatus by measuring the propagation characteristics of the beam
    83.
    发明授权
    Calibrating a focused beam of energy in a solid freeform fabrication apparatus by measuring the propagation characteristics of the beam 有权
    通过测量光束的传播特性,在固体自由形状制造装置中校准聚焦光束

    公开(公告)号:US06646728B1

    公开(公告)日:2003-11-11

    申请号:US09901163

    申请日:2001-07-09

    CPC classification number: G01J1/4257 B23K26/705 B29C64/135 B33Y30/00 B33Y40/00

    Abstract: The invention relates in general to calibrating a focused beam of energy in a solid freeform fabrication apparatus, and, in particular, to a method of measuring the propagation characteristics of the beam to produce beam propagation data. The beam propagation data can be used to verify that the beam is operating within tolerance, and/or produce a response that can be used to further calibrate the beam. The invention is particularly useful in determining asymmetric conditions in the beam. The beam propagation data is produced in accord with the “M2” standard for characterizing a beam. In one embodiment, the response indicates the beam is unacceptable for use in the apparatus. In another embodiment, the response is provided to calibrate the focal position of the beam. In still another embodiment, the response is provided to an adjustable beam that eliminates the asymmetric condition.

    Abstract translation: 本发明一般涉及在固体自由形状制造装置中校准聚焦光束,尤其涉及一种测量光束传播特性以产生光束传播数据的方法。 光束传播数据可用于验证光束是否在容差内运行,和/或产生可用于进一步校准光束的响应。 本发明特别可用于确定光束中的不对称条件。 光束传播数据是根据用于表征光束的“M”标准产生的。 在一个实施例中,响应指示该波束对于在该装置中使用是不可接受的。 在另一个实施例中,提供响应以校准光束的焦点位置。 在另一个实施例中,将响应提供给消除不对称状态的可调节光束。

    Cold light UV irradiation device
    84.
    发明授权
    Cold light UV irradiation device 失效
    冷光紫外线照射装置

    公开(公告)号:US06621087B1

    公开(公告)日:2003-09-16

    申请号:US09623784

    申请日:2000-09-08

    Abstract: A cold light UV irradiation device is used for curing UV paint and UV printing dyes on heat-sensitive substrates (12,13). It is used, for example, in plants for printing on packaging foils or in the production line for CD□s (Compact Discs) and DVD□s (Digital Versatile Discs). The irradiation devices used until now emit in addition to the UV radiation also a high portion of heat radiation (IR Radiation) onto the substrate (12,13), which often leads to deformation and brittleness of the substrate. The present invention allows an effective separation of the UV radiation from the IR radiation. With short beam paths, a high UV intensity with a low heat load of the substrate is realized.

    Abstract translation: 冷光UV照射装置用于固化UV感光基材上的UV涂料和UV印刷染料(12,13)。 它用于例如在用于在包装箔上印刷的工厂或用于CDsquares(致密盘)和DVDsquares(数字通用盘)的生产线中。 直到现在使用的照射装置除了UV辐射之外还释放到衬底(12,13)上的大部分热辐射(IR辐射),这通常导致衬底的变形和脆性。 本发明允许UV辐射与IR辐射的有效分离。 利用短光束路径,实现了具有低衬底热负荷的高UV强度。

    System and method for measuring the quality of an illumination field from a laser line illumination system
    85.
    发明授权
    System and method for measuring the quality of an illumination field from a laser line illumination system 失效
    用于测量来自激光线照明系统的照明场的质量的系统和方法

    公开(公告)号:US06618131B1

    公开(公告)日:2003-09-09

    申请号:US09854612

    申请日:2001-05-14

    Applicant: John F. Nolan

    Inventor: John F. Nolan

    CPC classification number: G01J1/4257

    Abstract: A system is disclosed for analyzing an illumination field of a line of laser illumination. The system includes a first movable unit, a second movable unit, and a sensor unit. The first movable unit includes a first opening through which at least a portion of the illumination field may pass. The first movable unit is adapted for movement in a first direction. The sensor unit is adapted to receive illumination and to produce a sensor output signal representative a characteristic of the illumination field. The second movable unit includes a second opening through which at least a portion of the illumination field may pass. The second movable unit is positioned between the first movable unit and the sensor unit and is adapted for movement between at least a first position in which very little or no light from the illumination field may reach the sensor unit, and a second position in which a relatively high amount of light from the illumination field may reach the sensor unit.

    Abstract translation: 公开了一种用于分析激光照射线的照明场的系统。 该系统包括第一可移动单元,第二可移动单元和传感器单元。 第一可移动单元包括第一开口,照明场的至少一部分可以通过该第一开口。 第一可移动单元适于沿第一方向运动。 传感器单元适于接收照明并产生表示照明场的特征的传感器输出信号。 第二可移动单元包括第二开口,照明场的至少一部分可以穿过该第二开口。 第二可移动单元位于第一可移动单元和传感器单元之间,并且适于在至少第一位置和第二位置之间移动,在第一位置中,来自照明区域的光很少或不能到达传感器单元, 来自照明区域的相对高的光量可能到达传感器单元。

    Self-propelled infrared emission aerial target
    86.
    发明授权
    Self-propelled infrared emission aerial target 失效
    自走红外发射空中目标

    公开(公告)号:US06600165B1

    公开(公告)日:2003-07-29

    申请号:US09330133

    申请日:1999-06-11

    CPC classification number: F41J9/08

    Abstract: A self-propelled infrared emission aerial target has an aircraft- or a missile-shaped body and a nose, wings and/or control surfaces, a system for feeding fuel and oxidizer to a combustion chamber in which combustion gases are produced and for supplying the combustion gases to a propulsion nozzle, and an infrared radiation emitter. The target has at least one conduit connecting the combustion chamber or propulsion nozzle of the propulsion system to a nose, wing and/or control surface of the target, or to an outside element attached thereto.

    Abstract translation: 自推进红外发射空中目标具有飞机或导弹形体以及鼻翼,翼和/或控制表面,用于将燃料和氧化剂供给到其中产生燃烧气体的燃烧室的系统, 燃烧气体到推进喷嘴和红外辐射发射器。 目标具有将推进系统的燃烧室或推进喷嘴连接到靶的鼻,翼和/或控制表面或连接到其上的外部元件的至少一个导管。

    Wavefront measuring method and projection exposure apparatus
    87.
    发明授权
    Wavefront measuring method and projection exposure apparatus 有权
    波前测量方法和投影曝光装置

    公开(公告)号:US06597440B1

    公开(公告)日:2003-07-22

    申请号:US09542341

    申请日:2000-04-05

    Applicant: Ryo Sasaki

    Inventor: Ryo Sasaki

    CPC classification number: G03F7/706 G01J9/00

    Abstract: A method of measuring a wavefront aberration of a predetermined optical system being serviceable for imaging a pattern. The method includes storing information related to a light intensity distribution on a pupil plane of the predetermined optical system in a reference state, and detecting a wavefront of the predetermined optical system in an arbitrary state, on the basis of the stored information.

    Abstract translation: 一种测量可用于对图案成像的预定光学系统的波前像差的方法。 该方法包括:在参考状态下将与光强度分布相关的信息存储在预定光学系统的光瞳平面上,并且基于存储的信息检测任意状态下的预定光学系统的波前。

    Method of electron-beam exposure and mask and electron-beam exposure system used therein
    88.
    发明授权
    Method of electron-beam exposure and mask and electron-beam exposure system used therein 失效
    电子束曝光方法及其中使用的掩模和电子束曝光系统

    公开(公告)号:US06597001B1

    公开(公告)日:2003-07-22

    申请号:US09712220

    申请日:2000-11-15

    Abstract: An electron-beam exposure method of segmented mask-pattern transfer type wherein a prescribed pattern is segmented into a plurality of divisions so as to form a segmented pattern in every division and exposure is made through every division one after another, so that the projection of the whole of the prescribed pattern is accomplished. The method includes the steps of carrying out the exposure through every division and transcribing a segmented pattern thereon one after another. The method also includes the steps of carrying out the correction exposure for every projection region of the segmented patterns one after another with a defocused beam of the inverse pattern of the respective segmented patterns, and thereby the proximity effect caused by the pattern exposure is corrected.

    Abstract translation: 分割掩模图案转印类型的电子束曝光方法,其中规定的图案被分割成多个分割,以便在每个分割和曝光中形成分割图案,并通过每个划分一个接一个地进行投影 整个规定的模式都完成了。 该方法包括以下步骤:通过每个划分进行曝光,并且一个接一个地转录分割图案。 该方法还包括以下步骤:用相应分割图案的逆图案的散焦光束一个接一个地对分割图案的每个投影区域执行校正曝光,从而校正由图案曝光引起的邻近效应。

    Radiation source
    89.
    发明授权
    Radiation source 有权
    辐射源

    公开(公告)号:US06573521B1

    公开(公告)日:2003-06-03

    申请号:US09720421

    申请日:2000-12-22

    Applicant: Steinar Lind

    Inventor: Steinar Lind

    CPC classification number: G01J3/10

    Abstract: Radiation source for emitting radiation in pulses with a duration and at intervals within chosen ranges, comprising at least one plate-shaped radiant element (1), and at least two electrical conductors coupled to the element(s). The source also includes at least one plate-shaped surrounding, thermally conductive element (2) being thermally coupled to a radiation element at its inner edge, and being thermally coupled to a cooling device (3) at its outer surface.

    Abstract translation: 用于以具有持续时间并且在选定范围内的间隔的脉冲发射辐射的辐射源,包括至少一个板状辐射元件(1),以及耦合到所述元件的至少两个电导体。 源还包括在其内边缘处热耦合到辐射元件的至少一个板状周围导热元件(2),并且在其外表面处热耦合到冷却装置(3)。

    Correlating shack-hartmann wavefront sensor
    90.
    发明授权
    Correlating shack-hartmann wavefront sensor 失效
    相关shack-hartmann波前传感器

    公开(公告)号:US06563572B1

    公开(公告)日:2003-05-13

    申请号:US09721080

    申请日:2000-12-07

    CPC classification number: G01J9/00

    Abstract: A Correlating Shack-Hartmann wavefront sensor developed for the solar adaptive optics systems. The correlation tracker as an image stabilization technique compares a real time image with a stored reference image using a fast cross-correlation calculation. Trackers of this sort are gradually coming into widespread use at solar observatories. On of their most useful features is their ability to track an extended, low contrast, temporally evolving scene.

    Abstract translation: 为太阳能适应光学系统开发的相关Shack-Hartmann波前传感器。 作为图像稳定技术的相关跟踪器使用快速互相关计算将实时图像与存储的参考图像进行比较。 这样的追踪者正逐渐在太阳能观测台广泛使用。 关于他们最有用的功能是他们追踪延伸,低对比度和时间演变的场景的能力。

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