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公开(公告)号:US20240036485A1
公开(公告)日:2024-02-01
申请号:US18269191
申请日:2021-12-02
Applicant: ASML Netheriands B. V. , ASML Holding N.V.
Inventor: Arjan Johannes Anton BEUKMAN , Sebastianus Adrianus GOORDEN , Stephen ROUX , Sergel SOKOLOV , Filippo ALPEGGIANI
CPC classification number: G03F9/7065 , G03F7/70625 , G03F9/7046
Abstract: A method includes irradiating a target structure with sequential illumination shots, directing scattered beams from the target structure towards an imaging detector, generating a detection signal using the imaging detector, and determining a property of the target structure based on at least the detection signal. An integration time for each illumination shot of the sequential illumination shots is selected so to reduce a low frequency error.
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公开(公告)号:US20240371599A1
公开(公告)日:2024-11-07
申请号:US18772486
申请日:2024-07-15
Applicant: ASML Netheriands B. V.
Inventor: Yixiang WANG , Shibing Liu , Shanhul Cao , Kangsheng Qiu , Juying Dou , Ying Luo , Yinglong Li , Qiang Li , Ronald Van Der Wilk , Jan-Gerard Cornelis Ven Der Toorn
IPC: H01J37/20 , H01L21/683
Abstract: Systems and methods for wafer grounding and wafer grounding location adjustment are disclosed. A first method may include receiving a first value of an electric characteristic associated with the wafer being grounded by an electric signal; determining a first control parameter using at least the first value; and controlling a characteristic of the electric signal using the first control parameter and the first value. A second method for adjusting a grounding location for a wafer may include terminating an electric connection between the wafer and at least one grounding pin in contact the wafer; adjusting a relative position between the wafer and the grounding pin; and restoring the electric connection between the grounding pin and the wafer. A third method may include causing a grounding pin to penetrate through a coating on the wafer by impact; and establishing an electrical connection between the grounding pin and the wafer.
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