公开(公告)号：US5552249A

公开(公告)日：1996-09-03

申请号：US315993

申请日：1994-09-30

Applicant: David G. Jensen ,  Daniel R. Tichenor

Inventor： David G. Jensen ,  Daniel R. Tichenor

IPC: G03F1/68 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/42 ,  H01Q15/00 ,  H01Q15/14 ,  H05K1/00 ,  H05K3/00 ,  H05K3/06 ,  G03F9/00

CPC classification number: H05K3/0082 ,  G03F1/68 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/422 ,  H01Q1/425 ,  H01Q15/0013 ,  H01Q15/141 ,  H05K1/0284 ,  H05K2201/09018 ,  H05K2203/056 ,  H05K3/0002 ,  H05K3/0032 ,  H05K3/064 ,  H05K3/067

Abstract: Parts having complexly curved, frequency selective surfaces can be manufactured with a high degree of precision using a three-dimensional conformal mask. The mask has a transparent substrate and a patterned opaque layer on the substrate. The layer may be patterned by laser ablation. Alternatively, the patterning of the opaque layer can be accomplished by applying a layer of photosensitive material over the opaque layer and then defining temporary and permanent areas thereof. The temporary areas of the photosensitive layer and the opaque layer are removed sequentially to define the transparent portions of the mask. Parts are made by intimately mating the mask and a part body to which a layer of metal and a layer of photosensitive material have been applied, and exposing the part to radiation through the mask. The exposed part is then chemically developed, the layer of metal is etched, and the remainder of the layer of photosensitive material is removed to complete the patterning of the part body surface. The mask is preferably made using a high precision laser etch system to sharply define the transparent portions of the mask and maximize the precision of the patterning on the subsequently made parts.

Abstract translation: 可以使用三维适形掩模以高精度制造具有复弯曲频率选择性表面的部件。 掩模在基底上具有透明基底和图案化不透明层。 该层可以通过激光烧蚀来图案化。 或者，不透明层的图案化可以通过在不透明层上施加一层感光材料，然后限定其临时和永久的区域来实现。 依次除去感光层和不透明层的临时区域以限定掩模的透明部分。 部件通过将掩模和已经施加有金属层和感光材料层的部件体紧密地配合并且将部件暴露于通过掩模的辐射而制成。 然后将暴露的部分化学显影，蚀刻金属层，除去感光材料层的其余部分以完成部件体表面的图案化。 该掩模优选地使用高精度激光蚀刻系统来制造，以锐利地限定掩模的透明部分，并使后续制造的部件上的图案化的精度最大化。

公开(公告)号：US5650249A

公开(公告)日：1997-07-22

申请号：US464252

申请日：1995-06-05

Applicant: Dennis L. Dull ,  David G. Jensen ,  Daniel R. Tichenor

Inventor： Dennis L. Dull ,  David G. Jensen ,  Daniel R. Tichenor

IPC: C23F1/02 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/42 ,  H01Q15/00 ,  H05K1/00 ,  H05K3/00 ,  H05K3/06 ,  G03F9/00

CPC classification number: C23F1/02 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/425 ,  H01Q15/0013 ,  H05K3/0082 ,  H05K1/0284 ,  H05K2201/09018 ,  H05K2203/056 ,  H05K3/0002 ,  H05K3/0032 ,  H05K3/064 ,  H05K3/067

Abstract: Radomes having complexly curved, frequency selective surfaces are made with a high degree of precision to assure part-to-part uniformity in electrical performance using a three-dimensional conformal mask and a precision etch process. The mask has a transparent substrate and a patterned opaque layer on the substrate. We expose photosensitive material overlying a thin film metal layer (generally deposited on a dielectric) through the mask. Metal exposed by patterning the photosensitive material is etched with a CuCl.sub.2 and chloride salt solution, and the remainder of the layer of photosensitive material is removed to complete the patterning.

Abstract translation: 具有复杂弯曲的频率选择表面的放射体具有高精确度，以使用三维适形掩模和精密蚀刻工艺来确保电性能的零件间均匀性。 掩模在基底上具有透明基底和图案化不透明层。 我们通过掩模曝光覆盖在薄膜金属层（通常沉积在电介质上）的感光材料。 用CuCl 2和氯化物盐溶液蚀刻通过图案化感光材料暴露的金属，并除去感光材料层的其余部分以完成图案化。

公开(公告)号：US5633105A

公开(公告)日：1997-05-27

申请号：US464232

申请日：1995-06-05

Applicant: David G. Jensen ,  Daniel R. Tichenor

Inventor： David G. Jensen ,  Daniel R. Tichenor

IPC: G03F1/68 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/42 ,  H01Q15/00 ,  H01Q15/14 ,  H05K1/00 ,  H05K3/00 ,  H05K3/06 ,  G03C3/00

CPC classification number: H05K3/0082 ,  G03F1/68 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/422 ,  H01Q1/425 ,  H01Q15/0013 ,  H01Q15/141 ,  H05K1/0284 ,  H05K2201/09018 ,  H05K2203/056 ,  H05K3/0002 ,  H05K3/0032 ,  H05K3/064 ,  H05K3/067

Abstract: A conformal mask permits the manufacture of precision frequency selective surfaces (FSS) that have patterns on complexly curved surfaces. These FSSs are used in precision radomes. The mask has a transparent substrate and a patterned opaque layer on the substrate. The layer may be patterned by laser ablation. Alternatively, the patterning of the opaque layer can be accomplished by applying a layer of photosensitive material over the opaque layer and then defining temporary and permanent areas thereof. The temporary areas of the photosensitive layer and the opaque layer are removed sequentially to define the transparent portions of the mask. Parts are made by intimately mating the mask and a part body to which a layer of metal and a layer of photosensitive material have been applied, and exposing the part to radiation through the mask. The exposed part is then chemically developed, the layer of metal is etched, and the remainder of the layer of photosensitive material is removed to complete the patterning of the part body surface. The mask is preferably made using a high precision laser etch system to sharply define the transparent portions of the mask and maximize the precision of the patterning on the subsequently made parts.

Abstract translation: 共形掩模允许制造在复杂曲面上具有图案的精密频率选择表面（FSS）。 这些FSS用于精密天线罩。 掩模在基底上具有透明基底和图案化不透明层。 该层可以通过激光烧蚀来图案化。 或者，不透明层的图案化可以通过在不透明层上施加一层感光材料，然后限定其临时和永久的区域来实现。 依次除去感光层和不透明层的临时区域以限定掩模的透明部分。 部件通过将掩模和已经施加有金属层和感光材料层的部件体紧密地配合并且将部件暴露于通过掩模的辐射而制成。 然后将暴露的部分化学显影，蚀刻金属层，除去感光材料层的其余部分以完成部件体表面的图案化。 该掩模优选地使用高精度激光蚀刻系统来制造，以锐利地限定掩模的透明部分，并使后续制造的部件上的图案化的精度最大化。

公开(公告)号：US5567554A

公开(公告)日：1996-10-22

申请号：US461923

申请日：1995-06-05

Applicant: David G. Jensen ,  Daniel R. Tichenor

Inventor： David G. Jensen ,  Daniel R. Tichenor

IPC: G03F1/68 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/42 ,  H01Q15/00 ,  H01Q15/14 ,  H05K1/00 ,  H05K3/00 ,  H05K3/06 ,  G03F9/00

CPC classification number: H05K3/0082 ,  G03F1/68 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/422 ,  H01Q1/425 ,  H01Q15/0013 ,  H01Q15/141 ,  H05K1/0284 ,  H05K2201/09018 ,  H05K2203/056 ,  H05K3/0002 ,  H05K3/0032 ,  H05K3/064 ,  H05K3/067

Abstract: A conformal mask permits the manufacture of precision frequency selective surface that have patterns on complexly curved surfaces. The mask has a transparent substrate and a patterned opaque layer on the substrate. The layer may be patterned by laser ablation. Alternatively, the patterning of the opaque layer can be accomplished by applying a layer of photosensitive material over the opaque layer and then defining temporary and permanent areas thereof. The temporary areas of the photosensitive layer and the opaque layer are removed sequentially to define the transparent portions of the mask. Parts are made by intimately mating the mask and a part body to which a layer of metal and a layer of photosensitive material have been applied, and exposing the part to radiation through the mask. The exposed part is then chemically developed, the layer of metal is etched, and the remainder of the layer of photosensitive material is removed to complete the patterning of the part body surface. The mask is preferably made using a high precision laser etch system to sharply define the transparent portions of the mask and maximize the precision of the patterning on the subsequently made parts.

Abstract translation: 适形掩模允许制造在复杂曲面上具有图案的精密频率选择表面。 掩模在基底上具有透明基底和图案化不透明层。 该层可以通过激光烧蚀来图案化。 或者，不透明层的图案化可以通过在不透明层上施加一层感光材料，然后限定其临时和永久的区域来实现。 依次除去感光层和不透明层的临时区域以限定掩模的透明部分。 部件通过将掩模和已经施加有金属层和感光材料层的部件体紧密地配合并且将部件暴露于通过掩模的辐射而制成。 然后将暴露的部分化学显影，蚀刻金属层，除去感光材料层的其余部分以完成部件体表面的图案化。 该掩模优选地使用高精度激光蚀刻系统来制造，以锐利地限定掩模的透明部分，并使后续制造的部件上的图案化的精度最大化。

公开(公告)号：US4990213A

公开(公告)日：1991-02-05

申请号：US277587

申请日：1988-11-29

Applicant: Christopher L. Brown ,  Harry C. Ashcraft ,  Daniel R. Tichenor ,  Robert M. Garcia

Inventor： Christopher L. Brown ,  Harry C. Ashcraft ,  Daniel R. Tichenor ,  Robert M. Garcia

IPC: B29C70/38

CPC classification number: B29C70/545 ,  B29C70/32 ,  B29C70/388 ,  Y10T156/1343

Abstract: Improved apparatus for dispensing tape of a thermoplastic matrix composite material onto a recipient surface comprising in combination support means for mounting a reel of tape; feed means for unwinding the tape from the reel and advancing it along a path of travel to the mandrel; a guillotine knife in the path of travel for cutting the tape at a predetermined angle with respect to the path of travel; a slotted, box-type pre-heater for the tape located in the path of travel following the knife for providing heat to the tape; a heated pressure roller located in the path of travel following the pre-heater for providing additional heat to the tape for effecting a process operating temperature and for applying the required pressure to the tape for lamination of the tape onto the recipient surface; cooling means located in the path of travel beyond the pressure roller for reducing the process heat from the laminated tape on the recipient surface and to smoothing it for thereby obtain the desired surface finish; and additional means operatively positioned with respect to the pressure roller, tape and recipient surface for placing an interference film between the pressure roller and the tape to prevent sticking of the tape to the pressure roller. Also disclosed is the method of operating such apparatus.

Abstract translation: 改进的用于将热塑性基质复合材料的带分配到受体表面上的装置，包括用于安装卷带的组合支撑装置; 进给装置，用于将卷带从卷轴上展开并使其沿行进路径前进到心轴; 行走路径中的断头刀相对于行进路线以预定角度切割带; 位于跟随刀的行进路径中的带状的盒式预热器，用于向带提供热量; 位于跟随预热器的行进路径中的加热压力辊，用于向胶带提供额外的热量以实现工艺操作温度，并将所需的压力施加到胶带上以将胶带层压到接收器表面上; 冷却装置位于超过压力辊的行进路径中，用于减少来自受体表面上的层压带的工艺热量并使其平滑化，从而获得所需的表面光洁度; 以及相对于加压辊，带和接收器表面可操作地定位的附加装置，用于在压力辊和带之间放置干涉膜，以防止带粘附到压力辊上。 还公开了操作这种装置的方法。

公开(公告)号：US5395718A

公开(公告)日：1995-03-07

申请号：US978322

申请日：1992-11-18

Applicant: David G. Jensen ,  Daniel R. Tichenor

Inventor： David G. Jensen ,  Daniel R. Tichenor

IPC: G03F1/68 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/42 ,  H01Q15/00 ,  H01Q15/14 ,  H05K1/00 ,  H05K3/00 ,  H05K3/06 ,  G03F9/00

CPC classification number: H05K3/0082 ,  G03F1/68 ,  G03F7/00 ,  G03F7/24 ,  H01Q1/422 ,  H01Q1/425 ,  H01Q15/0013 ,  H01Q15/141 ,  H05K1/0284 ,  H05K2201/09018 ,  H05K2203/056 ,  H05K3/0002 ,  H05K3/0032 ,  H05K3/064 ,  H05K3/067

Abstract: Parts having complexly curved, frequency selective surfaces can be manufactured with a high degree of precision using a three-dimensional conformal mask. The mask has a transparent substrate and a patterned opaque layer on the substrate. The layer may be patterned by laser ablation. Alternatively, the patterning of the opaque layer can be accomplished by applying a layer of photosensitive material over the opaque layer and then defining temporary and permanent areas thereof. The temporary areas of the photosensitive layer and the opaque layer are removed sequentially to define the transparent portions of the mask. Parts are made by intimately mating the mask and a part body to which a layer of metal and a layer of photosensitive material have been applied, and exposing the part to radiation through the mask. The exposed part is then chemically developed, the layer of metal is etched, and the remainder of the layer of photosensitive material is removed to complete the patterning of the part body surface. The mask is preferably made using a high precision laser etch system to sharply define the transparent portions of the mask and maximize the precision of the patterning on the subsequently made parts.

Abstract translation: 可以使用三维适形掩模以高精度制造具有复弯曲频率选择性表面的部件。 掩模在基底上具有透明基底和图案化不透明层。 该层可以通过激光烧蚀来图案化。 或者，不透明层的图案化可以通过在不透明层上施加一层感光材料，然后限定其临时和永久的区域来实现。 依次除去感光层和不透明层的临时区域以限定掩模的透明部分。 部件通过将掩模和已经施加有金属层和感光材料层的部件体紧密地配合并且将部件暴露于通过掩模的辐射而制成。 然后将暴露的部分化学显影，蚀刻金属层，除去感光材料层的其余部分以完成部件体表面的图案化。 该掩模优选地使用高精度激光蚀刻系统来制造，以锐利地限定掩模的透明部分，并使后续制造的部件上的图案化的精度最大化。