公开(公告)号：US06924087B2

公开(公告)日：2005-08-02

申请号：US10397359

申请日：2003-03-27

Applicant: Yehoshua Yeshurun ,  Meir Hefetz ,  Erwin Berenschot ,  Meint de Boer ,  Dominique Maria Altpeter ,  Garrit Boom

Inventor： Yehoshua Yeshurun ,  Meir Hefetz ,  Erwin Berenschot ,  Meint de Boer ,  Dominique Maria Altpeter ,  Garrit Boom

IPC: A61M37/00 ,  G03F7/00 ,  A61M5/32 ,  A61M5/158

CPC classification number: A61M37/0015 ,  A61M2037/003 ,  A61M2037/0053 ,  G03F7/00 ,  G03F7/0035 ,  Y10S430/167

Abstract: A method for producing microneedles. The method including disposing a first layer of a radiation sensitive polymer on to a working surface and selectively irradiating the first layer such that the first layer has at least one irradiated region and at least one non-irradiated region. The method also including developing the first layer so as to selectively remove one of the at least one irradiated region and the at least one non-irradiated region such that, at least part of at least one remaining region at least partially defines a form of at least part of a microneedle structure. A microneedle structure including a plurality of microneedles at least partially formed from a radiation sensitive polymer.

Abstract translation: 一种生产微针的方法。 该方法包括将辐射敏感聚合物的第一层设置在工作表面上并选择性地照射第一层，使得第一层具有至少一个照射区域和至少一个未照射区域。 该方法还包括显影第一层以便选择性地去除至少一个照射区域和至少一个未照射区域中的一个，使得至少一个剩余区域的至少一部分至少部分地限定了 至少部分微针结构。 包括至少部分由辐射敏感聚合物形成的多个微针的微针结构。