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Patent Agency Ranking
公开(公告)号：US20110179996A1
公开(公告)日：2011-07-28
申请号：US12980158
申请日：2010-12-28
Applicant: Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
Inventor： Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
CPC classification number: H01L51/0011 , B05C21/005 , C23C14/04 , C23C14/042
Abstract: A deposition mask and mask assembly having the same capable of improving deposition effieiency is discussed. Both ends of the deposition mask have a pointed cross section such that at least a part of the neighboring deposition masks overlap each other at a boundary therebetween when deposition masks are consecutively arranged in parallel.
Abstract translation: 讨论了具有能够提高沉积效率的沉积掩模和掩模组件。 沉积掩模的两端具有尖锐的横截面，使得当沉积掩模平行连续排列时，相邻沉积掩模的至少一部分在它们之间的边界处彼此重叠。
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公开(公告)号：US20110185966A1
公开(公告)日：2011-08-04
申请号：US12980511
申请日：2010-12-29
Applicant: Il Hyun LEE , Tae Hyung Kim , Chong Hyun Park
Inventor： Il Hyun LEE , Tae Hyung Kim , Chong Hyun Park
IPC: B05C11/00
CPC classification number: B05C11/00
Abstract: A mask assembly capable of improving organic material deposition efficiency is disclosed. The mask assembly comprises: a plurality of deposition masks; a frame coupled to the plurality of deposition masks arranged continuously; and a bonding portion for joining adjacent deposition masks.
Abstract translation: 公开了一种能够提高有机材料沉积效率的面罩组件。 掩模组件包括：多个沉积掩模; 耦合到连续布置的多个沉积掩模的框架; 以及用于连接相邻的沉积掩模的接合部分。
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公开(公告)号：US08776718B2
公开(公告)日：2014-07-15
申请号：US12980158
申请日：2010-12-28
Applicant: Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
Inventor： Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
IPC: B05C11/00
CPC classification number: H01L51/0011 , B05C21/005 , C23C14/04 , C23C14/042
Abstract: A deposition mask and mask assembly having the same capable of improving deposition efficiency is discussed. Both ends of the deposition mask have a pointed cross section such that at least a part of the neighboring deposition masks overlap each other at a boundary therebetween when deposition masks are consecutively arranged in parallel.
Abstract translation: 讨论了具有能够提高沉积效率的沉积掩模和掩模组件。 沉积掩模的两端具有尖锐的横截面，使得当沉积掩模平行连续排列时，相邻沉积掩模的至少一部分在它们之间的边界处彼此重叠。
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4.发明授权Mask assembly having a plurality of projections at a boundary of adjacent two deposition masks 有权掩模组件在相邻的两个沉积掩模的边界处具有多个突起公开(公告)号：US09004002B2
公开(公告)日：2015-04-14
申请号：US12978831
申请日：2010-12-27
Applicant: Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
Inventor： Chong-Hyun Park , Tae-Hyung Kim , Il-Hyun Lee
CPC classification number: C23C14/042 , B05C11/00 , B05C21/005 , B05D1/32 , B32B2457/202 , C23C16/042 , H01L51/0011
Abstract: A mask assembly is disclosed to improve organic material deposition efficiency including: a plurality of deposition masks, at least one of opposite ends of each of the plurality of deposition masks is formed to have a plurality of projections, which form at least one boundary aperture region at a boundary of adjacent two deposition masks.
Abstract translation: 公开了一种用于改善有机材料沉积效率的掩模组件，包括：多个沉积掩模，多个沉积掩模中的每一个的相对端中的至少一个形成为具有多个突起，其形成至少一个边界孔径区域 在相邻的两个沉积掩模的边界处。
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公开(公告)号：US20110185965A1
公开(公告)日：2011-08-04
申请号：US12978831
申请日：2010-12-27
Applicant: Chong-Hyun PARK , Tae-Hyun KIM , Il-Hyun LEE
Inventor： Chong-Hyun PARK , Tae-Hyun KIM , Il-Hyun LEE
IPC: B05C11/00
CPC classification number: C23C14/042 , B05C11/00 , B05C21/005 , B05D1/32 , B32B2457/202 , C23C16/042 , H01L51/0011
Abstract: A mask assembly is disclosed to improve organic material deposition efficiency including: a plurality of deposition masks, at least one of opposite ends of each of the plurality of deposition masks is formed to have a plurality of projections, which form at least one boundary aperture region at a boundary of adjacent two deposition masks.
Abstract translation: 公开了一种用于改善有机材料沉积效率的掩模组件，包括：多个沉积掩模，多个沉积掩模中的每一个的相对端中的至少一个形成为具有多个突起，其形成至少一个边界孔径区域 在相邻的两个沉积掩模的边界处。
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