公开(公告)号：US20120182555A1

公开(公告)日：2012-07-19

申请号：US13226809

申请日：2011-09-07

Applicant: Eric R. Statz ,  Alan E. DeCew, JR. ,  Jonathan B. Ashcom

Inventor： Eric R. Statz ,  Alan E. DeCew, JR. ,  Jonathan B. Ashcom

IPC: G01N21/61

CPC classification number: G01N21/39 ,  G01J3/0224 ,  G01J3/26 ,  G01J3/42 ,  G01N21/274 ,  G01N21/314 ,  G01N21/3504 ,  G01N2021/1793 ,  G01N2021/3166 ,  G01N2021/3188 ,  G01N2021/3513

Abstract: A gas detector includes a receiver configured to receive light from a light source through gas, the light source having a bandwidth on the order of an absorption linewidth of the gas, the receiver including at least a first etalon having a transmission bandwidth on the order of the absorption linewidth of the gas, the transmission bandwidth of the first etalon being substantially smaller than the bandwidth of the light source. The gas detector further includes a first detector for detecting light transmitted through the first etalon, a second detector for detecting light reflected from the first etalon, and a processor that determines the quantity of gas based on the detected transmitted and reflected light. The gas detector can further include a second etalon with a transmission bandwidth approximately equal and adjacent to the transmission bandwidth of the first etalon. Alternatively, the gas detector can include a beam separator that separates the light from the light source into a first beam and a second beam, with a small deflection angle between the first beam and the second beam, thereby modifying the effective thickness of a single optical element for each beam and forming the first and second etalon in the optical element.

Abstract translation: 气体检测器包括：接收器，被配置为通过气体接收来自光源的光，所述光源具有大约为气体吸收线宽度的带宽，所述接收器至少包括第一标准具，所述第一标准具具有按照 气体的吸收线宽度，第一标准具的传输带宽显着小于光源的带宽。 气体检测器还包括用于检测通过第一标准具传输的光的第一检测器，用于检测从第一标准具反射的光的第二检测器，以及基于检测到的透射和反射光来确定气体量的处理器。 气体检测器还可以包括第二标准具，其传输带宽近似相等并且与第一标准具的传输带宽相邻。 或者，气体检测器可以包括光束分离器，其将来自光源的光分离成第一光束和第二光束，第一光束和第二光束之间具有小的偏转角，由此修改单个光学器件的有效厚度 元件，并在光学元件中形成第一和第二标准具。

公开(公告)号：US20090320529A1

公开(公告)日：2009-12-31

申请号：US12534202

申请日：2009-08-03

Applicant: Chris Schaffer ,  Andre Brodeur ,  Rafael R. Gattass ,  Jonathan B. Ashcom ,  Eric Mazur

Inventor： Chris Schaffer ,  Andre Brodeur ,  Rafael R. Gattass ,  Jonathan B. Ashcom ,  Eric Mazur

IPC: C03B37/09

CPC classification number: C03C23/0025 ,  G02B6/125 ,  G02B6/13 ,  G02B2006/1215

Abstract: Thermal 3-D microstructuring of photonic structures is provided by depositing laser energy by non-linear absorption into a focal volume about each point of a substrate to be micromachined at a rate greater than the rate that it diffuses thereout to produce a point source of heat in a region of the bulk larger than the focal volume about each point that structurally alters the region of the bulk larger than the focal volume about each point, and by dragging the point source of heat thereby provided point-to-point along any linear and non-linear path to fabricate photonic structures in the bulk of the substrate. Exemplary optical waveguides and optical beamsplitters are thermally micromachined in 3-D in the bulk of a glass substrate. The total number of pulses incident to each point is controlled, either by varying the rate that the point source of heat is scanned point-to-point and/or by varying the repetition rate of the laser, to select the mode supported by the waveguide or beamsplitter to be micromachined. A wide range of passive and active optical and other devices may be thermally micromachined.

Abstract translation: 光子结构的热3-D微结构化是通过将激光能量通过非线性吸收沉积到围绕基底的每个点的焦点体积中以将其以大于其扩散的速率的速率微加工而产生点热源 在围绕每个点的体积大于焦点体积的区域中，其结构上改变大于围绕每个点的焦点体积的体积的区域，并且通过拖动点光源，从而沿着任何线性和 非线性路径以在基底的大部分中制造光子结构。 示例性光波导和光分束器在玻璃基板的主体中在3-D中热微加工。 通过改变点对点源点对点速率和/或通过改变激光器的重复频率来控制入射到每个点的脉冲总数，以选择波导支持的模式 或分束器进行微加工。 多种无源和有源光学和其他器件可能是热微加工的。

公开(公告)号：US08599381B2

公开(公告)日：2013-12-03

申请号：US13226809

申请日：2011-09-07

Applicant: Eric R. Statz ,  Alan E. DeCew, Jr. ,  Jonathan B. Ashcom

Inventor： Eric R. Statz ,  Alan E. DeCew, Jr. ,  Jonathan B. Ashcom

IPC: G01N21/00 ,  G01N21/39

CPC classification number: G01N21/39 ,  G01J3/0224 ,  G01J3/26 ,  G01J3/42 ,  G01N21/274 ,  G01N21/314 ,  G01N21/3504 ,  G01N2021/1793 ,  G01N2021/3166 ,  G01N2021/3188 ,  G01N2021/3513

Abstract: A gas detector includes a receiver configured to receive light from a light source through gas, the light source having a bandwidth on the order of an absorption linewidth of the gas, the receiver including at least a first etalon having a transmission bandwidth on the order of the absorption linewidth of the gas, the transmission bandwidth of the first etalon being substantially smaller than the bandwidth of the light source. The gas detector further includes a first detector for detecting light transmitted through the first etalon, a second detector for detecting light reflected from the first etalon, and a processor that determines the quantity of gas based on the detected transmitted and reflected light. The gas detector can further include a second etalon with a transmission bandwidth approximately equal and adjacent to the transmission bandwidth of the first etalon. Alternatively, the gas detector can include a beam separator that separates the light from the light source into a first beam and a second beam, with a small deflection angle between the first beam and the second beam, thereby modifying the effective thickness of a single optical element for each beam and forming the first and second etalon in the optical element.

Abstract translation: 气体检测器包括：接收器，被配置为通过气体接收来自光源的光，所述光源具有大约为气体吸收线宽度的带宽，所述接收器至少包括第一标准具，传输带宽为 气体的吸收线宽度，第一标准具的传输带宽显着小于光源的带宽。 气体检测器还包括用于检测通过第一标准具传输的光的第一检测器，用于检测从第一标准具反射的光的第二检测器，以及基于检测到的透射和反射光来确定气体量的处理器。 气体检测器还可以包括第二标准具，其传输带宽近似相等并且与第一标准具的传输带宽相邻。 或者，气体检测器可以包括光束分离器，其将来自光源的光分离成第一光束和第二光束，第一光束和第二光束之间具有小的偏转角，由此修改单个光学器件的有效厚度 元件，并在光学元件中形成第一和第二标准具。

公开(公告)号：US07568365B2

公开(公告)日：2009-08-04

申请号：US10136160

申请日：2002-05-01

Applicant: Chris Schaffer ,  André Brodeur ,  Rafael R. Gattass ,  Jonathan B. Ashcom ,  Eric Mazur

Inventor： Chris Schaffer ,  André Brodeur ,  Rafael R. Gattass ,  Jonathan B. Ashcom ,  Eric Mazur

IPC: C03B32/00

CPC classification number: C03C23/0025 ,  G02B6/125 ,  G02B6/13 ,  G02B2006/1215

Abstract: Thermal 3-D microstructuring of photonic structures is provided by depositing laser energy by non-linear absorption into a focal volume about each point of a substrate to be micromachined at a rate greater than the rate that it diffuses thereout to produce a point source of heat in a region of the bulk larger than the focal volume about each point that structurally alters the region of the bulk larger than the focal volume about each point, and by dragging the point source of heat thereby provided point-to-point along any linear and non-linear path to fabricate photonic structures in the bulk of the substrate. Exemplary optical waveguides and optical beamsplitters are thermally micromachined in 3-D in the bulk of a glass substrate. The total number of pulses incident to each point is controlled, either by varying the rate that the point source of heat is scanned point-to-point and/or by varying the repetition rate of the laser, to select the mode supported by the waveguide or beamsplitter to be micromachined. A wide range of passive and active optical and other devices may be thermally micromachined.