Abstract:
The present invention relates to novel tin amino-alkoxide complexes and a method for preparing the same, precisely novel tin amino-alkoxide complexes represented by formula 1 and useful as a precursor for tin and tin oxide thin films and a precursor for the production of nano-sized tin and tin oxide particles and a method for preparing the same. In formula 1, A is linear or branched (C2-C10) alkylene substituted or not substituted with halogen; R1 and R2 are independently linear or branched (C1-C7) alkyl substituted or not substituted with halogen. Sn[O-A-NR1R2]2 [Formula 1]
Abstract:
The present invention relates to novel tin amino-alkoxide complexes and a method for preparing the same, precisely novel tin amino-alkoxide complexes represented by formula 1 and useful as a precursor for tin and tin oxide thin films and a precursor for the production of nano-sized tin and tin oxide particles and a method for preparing the same. In formula 1, A is linear or branched (C2-C10) alkylene substituted or not substituted with halogen; R1 and R2 are independently linear or branched (C1-C7) alkyl substituted or not substituted with halogen. Sn[O-A-NR1R2]2 [Formula 1]
Abstract:
A hard baking apparatus which is capable of evenly heating a semiconductor substrate when a photoresist pattern of the semiconductor substrate is hard baked. The apparatus for hard baking a photoresist pattern including: a chamber; a chuck installed at a lower portion in the chamber on which a semiconductor substrate is mounted; a heating unit installed at an upper portion in the chamber; and a unit installed at a lower portion of the heating unit for evenly distributing light.