Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing
    1.
    发明授权
    Method and apparatus for providing an electrostatic chuck with reduced plasma penetration and arcing 有权
    用于提供具有降低的等离子体穿透和电弧放电的静电卡盘的方法和装置

    公开(公告)号:US07848076B2

    公开(公告)日:2010-12-07

    申请号:US11888311

    申请日:2007-07-31

    CPC classification number: H01L21/6831 H01L21/6833 Y10T279/23

    Abstract: A method and apparatus for providing a fluid distribution element for an electrostatic chuck that reduces plasma formation and arcing within heat transfer fluid passages. One embodiment comprises a plate and a dielectric component, where the dielectric component is inserted into the plate. The plate is adapted to be positioned within a channel to define a plenum, wherein the dielectric component provides at least a portion of a fluid passage coupled to the plenum. A porous dielectric layer, formed upon the dielectric component, provides at least another portion of a fluid passage coupled to the plenum. In other embodiments, the fluid distribution element comprises various arrangements of components to define a fluid passage that does not provide a line-of-sight path from the support surface for a substrate to a plenum.

    Abstract translation: 一种用于提供用于静电卡盘的流体分配元件的方法和装置,其减少了传热流体通道内的等离子体形成和电弧。 一个实施例包括板和电介质部件,其中介电部件插入板中。 板适于被定位在通道内以限定通风室,其中介电部件提供耦合到集气室的流体通道的至少一部分。 形成在电介质部件上的多孔介电层提供至少另一部分与气室相连的流体通道。 在其他实施例中,流体分配元件包括各种组件的布置,以限定流体通道,该流体通道不提供从用于基底的支撑表面到气室的视线路径。

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