METHOD FOR MANUFACTURING A MICROELECTROMECHANICAL DEVICE AND CORRESPONDING DEVICE

    公开(公告)号:US20180346325A1

    公开(公告)日:2018-12-06

    申请号:US15780478

    申请日:2016-11-15

    Inventor: Joël COLLET

    CPC classification number: B81C1/00333

    Abstract: An electromechanical device includes a stack consisting of an insulating layer inserted between two solid layers. The device also includes a micromechanical structure suspended above a recess and a nanometric structure suspended above the recess. The relevant position of the nanometric structure relative to the micrometric structure is defined by the delimitation of the contours of the two structures by etching a first surface of a substrate consisting of a solid layer so as to obtain trenches that define the structures.

    Mechanical Oscillator and Associated Production Method

    公开(公告)号:US20180004161A1

    公开(公告)日:2018-01-04

    申请号:US15544754

    申请日:2016-02-12

    CPC classification number: G04B17/066 B81B3/0081 F16F1/021 G04B17/04 G04B17/22

    Abstract: A mechanical oscillator endowed with a strip, with the aforesaid strip incorporating a first silicon layer having a crystal lattice extending along a first direction of one plane, a thermal compensation layer composed of a material having a Young's modulus thermal coefficient of opposite sign to that of the silicon, and a second silicon layer having a crystal lattice extending in a second direction of the plane, with the first and direction being offset at an angle of 45° within the plane of the layers, and with the thermal compensation layer extending between the first and second silicon layers.

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