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公开(公告)号:US20130256558A1
公开(公告)日:2013-10-03
申请号:US13433748
申请日:2012-03-29
Applicant: Christian DIETL , Gerald SCHMID , Bernd SCHINDLER , Gerd BENNER , Thilo MANDLER , Marco MATIJEVIC
Inventor: Christian DIETL , Gerald SCHMID , Bernd SCHINDLER , Gerd BENNER , Thilo MANDLER , Marco MATIJEVIC
CPC classification number: H01J37/26 , H01J2237/002 , H01J2237/022 , H01J2237/028 , H01J2237/0453
Abstract: An apparatus for contaminants being deposited thereon in a particle beam device, and also the particle beam device including the apparatus, are provided. This apparatus may be an anticontaminator. The apparatus according to the system described herein may include at least one cooling unit. The cooling unit may provide at least one cooled surface on which contaminants in a particle beam device are deposited. The apparatus according to the system described herein may further include at least one aperture unit. The aperture unit may be arranged at a motion device for moving the aperture unit relative to the cooling unit. Furthermore, the aperture unit may have at least one aperture opening. The cooling unit may be connected to the aperture unit by at least one first flexible thermal conductor.
Abstract translation: 提供了一种用于在粒子束装置中沉积污染物的装置,以及包括该装置的粒子束装置。 该装置可以是抗贴片机。 根据本文描述的系统的装置可以包括至少一个冷却单元。 冷却单元可以提供至少一个冷却表面,颗粒束装置中的污染物沉积在该冷却表面上。 根据本文描述的系统的装置还可以包括至少一个孔单元。 孔单元可以布置在用于相对于冷却单元移动孔单元的运动装置。 此外,孔单元可以具有至少一个孔口。 冷却单元可以由至少一个第一柔性热导体连接到孔单元。