Abstract:
The present invention is related to the field of semiconductor processing equipment and methods and provides, in particular, methods and equipment for the sustained, high-volume production of Group III-V compound semiconductor material suitable for fabrication of optic and electronic components, for use as substrates for epitaxial deposition, for wafers and so forth. In preferred embodiments, these methods and equipment are optimized for producing Group III-N (nitrogen) compound semiconductor wafers and specifically for producing GaN wafers. Specifically, the precursor is provided at a mass flow of at least 50 g Group III element/hour for a time of at least 48 hours to facilitate high volume manufacture of the semiconductor material. Advantageously, the mass flow of the gaseous Group III precursor is controlled to deliver the desired amount.
Abstract:
The present invention is an apparatus and process for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, e) a second manifold for delivering the process chemical from the process container to a process tool; f) a solvent recovery container for containing used solvent and removed process chemical, and, g) a solvent evaporator to differentially remove solvent from process chemical in the solvent recovery container by entrainment in a carrier gas, vacuum removal, heating or combinations thereof. The containers can be baffled on their inert gas inlets. The cabinet can be heated.
Abstract:
A container having two ports; first block valve having two diaphragm valves, each valve having a valve seat side and a diaphragm side, each valve seat side faces the other valve seat side, and connected to the first end of a dispense conduit, one diaphragm side connected to a first port, and another diaphragm side connected to vent and or vacuum; a second valve connected to a push gas conduit and a second port.
Abstract:
A high purity chemical storage and delivery system and process with secondary containment, comprising; a cabinet for containing a canister of high purity chemical, a manifold in the cabinet for fluid connection between the canister and the cabinet for controllably dispensing high purity chemical; a control unit for controlling the dispensing of high purity chemical from the canister and the cabinet for a downstream use, a closeable opening in the cabinet for allowing loading and unloading of the canister from the cabinet, at least one door for closing the opening, a liquid tight secondary containment door in the opening for closing off a portion of the opening such that the secondary containment door is sized so that the portion is sufficient to define a volume in conjunction with the cabinet to contain the entire high purity chemical liquid contents of the canister.
Abstract:
A vessel for conveying a precursor fluid from the vessel, comprising: an interior volume having an upper volume and a lower volume, wherein the two volumes are in communication and the lower volume contains precursor; a lid comprising a fluid inlet directing carrier gas into the vessel, a “T” fluid outlet, a sidewall having an upper lip wherein the upper lip contacts the lid; a separator interposed between the lid and the sidewall wherein the separator resides adjacent the upper lip and segments the interior volume into the upper volume and a lower volume; and an inlet plenum in communication with the fluid inlet having a plenum chamber opening towards the separator to direct the carrier gas through the separator and towards the precursor. A method for using the apparatus is also disclosed.
Abstract:
The present invention is a bubbler having a diptube inlet ending in a bubble size reducing outlet and at least one baffle disc positioned between the outlet of the diptube and the outlet of the bubbler to provide a narrow annular space between the baffle disc and the wall of the bubbler to prevent liquid droplets from entering the outlet to the bubbler. The bubble size reducing outlet is an elongated cylindrical porous metal frit situated in a sump of approximately the same dimensions. A metal frit is placed at the inlet of the outlet of the bubbler. The present invention is also a process of delivering a chemical precursor from a bubbler vessel having the above structure.
Abstract:
A vessel for conveying a precursor fluid from the vessel, comprising: an interior volume having an upper volume and a lower volume, wherein the two volumes are in communication and the lower volume contains precursor; a lid comprising a fluid inlet directing carrier gas into the vessel, a “T” fluid outlet, a sidewall having an upper lip wherein the upper lip contacts the lid; a separator interposed between the lid and the sidewall wherein the separator resides adjacent the upper lip and segments the interior volume into the upper volume and a lower volume; and an inlet plenum in communication with the fluid inlet having a plenum chamber opening towards the separator to direct the carrier gas through the separator and towards the precursor. A method for using the apparatus is also disclosed.
Abstract:
The present invention is a bubbler having a diptube inlet ending in a bubble size reducing outlet and at least one baffle disc positioned between the outlet of the diptube and the outlet of the bubbler to provide a narrow annular space between the baffle disc and the wall of the bubbler to prevent liquid droplets from entering the outlet to the bubbler. The bubble size reducing outlet is an elongated cylindrical porous metal frit situated in a sump of approximately the same dimensions. A metal frit is placed at the inlet of the outlet of the bubbler. The present invention is also a process of delivering a chemical precursor from a bubbler vessel having the above structure.
Abstract:
The present invention is a container having a diptube inlet, at least one baffle disc positioned between the outlet of the diptube and the outlet of the container to provide a narrow annular space between the baffle disc and the sidewall of the container to prevent liquid droplets from entering the outlet to the container and the inner surface of the container sidewall and an annular, radially inward projecting deflector ledge on the sidewall, proximate the baffle disc. The present invention is also a process of delivering a chemical precursor from a container having the above structure. Liquid and vapor delivery are both contemplated.
Abstract:
The present invention is an apparatus for storing and delivering a low vapor pressure process chemical to a process tool for semiconductor fabrication, comprising: a) a bulk container for storing the process chemical; b) a process container for delivering the process chemical to the process tool; c) a first manifold for delivering process chemical from the bulk container to the process container; d) a solvent container containing a quantity of solvent, and; e) a second manifold for delivering the process chemical from the process container to a process tool. A process for using the apparatus is also contemplated.