公开(公告)号：US4976815A

公开(公告)日：1990-12-11

申请号：US426208

申请日：1989-10-25

Applicant: Yutaka Hiratsuka ,  Tadahiro Ohmi ,  Junichi Murota ,  Yoshio Fujisaki ,  Masato Noda ,  Yoshimitsu Kitada ,  Terutaka Sahara

Inventor： Yutaka Hiratsuka ,  Tadahiro Ohmi ,  Junichi Murota ,  Yoshio Fujisaki ,  Masato Noda ,  Yoshimitsu Kitada ,  Terutaka Sahara

IPC: B01L1/00 ,  H01L21/00 ,  H01L21/304 ,  H01L21/306

CPC classification number: H01L21/67023

Abstract: A draft chamber is located within a clean room for sequentially immersing and processing carriers such as silicone wafers in a plurality of solution vessels provided in the draft chamber. In the draft chamber, a first air flow moves in a substantially horizontal direction from the front portion of the draft chamber toward the rear portion above the surfaces of solutions contained in chemical solution vessels which generate toxic gasses and a second air flow moves downward from the ceiling of the draft chamber. Thus, the toxic gasses generated from the chemical solution vessels are prevented from leaking into the clean room.

Abstract translation: 抽气室位于洁净室内，用于在设置在通风室中的多个溶液容器中顺序浸渍和处理诸如硅胶片的载体。 在通气室中，第一气流沿着大致水平的方向从引流室的前部朝向包含在产生有毒气体的化学溶液容器中的溶液表面上方的后部移动，并且第二气流从 起草室的天花板。 因此，防止从化学溶液容器产生的有毒气体泄漏到洁净室中。

公开(公告)号：US20100192974A1

公开(公告)日：2010-08-05

申请号：US12756504

申请日：2010-04-08

Applicant: Youichirou MATSUMOTO ,  Teiichirou IKEDA ,  Shin YOSHIZAWA ,  Terutaka SAHARA ,  Nobuo TSUMAKI ,  Yoshimitsu KITADA

Inventor： Youichirou MATSUMOTO ,  Teiichirou IKEDA ,  Shin YOSHIZAWA ,  Terutaka SAHARA ,  Nobuo TSUMAKI ,  Yoshimitsu KITADA

IPC: B08B3/12

CPC classification number: B08B3/12 ,  B06B2201/71 ,  B08B3/02 ,  B08B2203/0288 ,  G10K11/352

Abstract: An ultrasonic cleaning method in which ultrasonic cleaning of a contamination attached to a surface of an object to be cleaned is performed by directing toward the object to be cleaned, a cleaning liquid to which ultrasonic waves are applied by alternately focusing first ultrasonic waves having a frequency of 1 to 10 MHz and second ultrasonic waves having a frequency equal to or lower than ½ of that of the first ultrasonic waves. A focus position adjustment device is used to adjust the distance of the focus position relative to the surface of the object to be cleaned, and a moving device is used to movie at least one of the ultrasonic wave generation device and a support base for the object so that the effect of the ultrasonic waves generated by the ultrasonic wave generation device on the surface of the object to be cleaned is uniform.

Abstract translation: 一种超声波清洗方法，其中通过朝向待清洁物体的方向引导附着在待清洁物体的表面上的污染物的超声波清洗，通过交替聚焦具有频率的第一超声波来施加超声波的清洗液体 1MHz至10MHz的频率，以及具有等于或低于第一超声波的频率的1/2的频率的第二超声波。 焦点位置调整装置用于调整聚焦位置相对于待清洁物体的表面的距离，并且使用移动装置拍摄超声波产生装置和物体的支撑基底中的至少一个 使得由超声波产生装置产生的超声波对被清洁物体的表面的影响是均匀的。

公开(公告)号：US20090025761A1

公开(公告)日：2009-01-29

申请号：US11577120

申请日：2005-10-06

Applicant: Youichirou Matsumoto ,  Teiichirou Ikeda ,  Shin Yoshizawa ,  Terutaka Sahara ,  Nobuo Tsumaki ,  Yoshimitsu Kitada

Inventor： Youichirou Matsumoto ,  Teiichirou Ikeda ,  Shin Yoshizawa ,  Terutaka Sahara ,  Nobuo Tsumaki ,  Yoshimitsu Kitada

IPC: B08B13/00

CPC classification number: B08B3/12 ,  B06B2201/71 ,  B08B3/02 ,  B08B2203/0288 ,  G10K11/352

Abstract: An ultrasonic cleaning apparatus which performs ultrasonic cleaning of a contamination attached to a surface of an object to be cleaned, by using a cleaning liquid to which ultrasonic waves are applied has a cleaning bath pooling the cleaning liquid, a support base on which the object to be cleaned is supported in the cleaning liquid, ultrasonic wave generation device for alternately focusing first ultrasonic waves having a frequency of 1 to 10 MHz and second ultrasonic waves having a frequency equal to or lower than ½ of that of the first ultrasonic waves toward the object to be cleaned, a focus position adjustment device of adjusting the distance between a focus position for the focus and the surface of the object to be cleaned, and moving device of moving at least any one of the ultrasonic wave generation device and the support base so that the effect on the surface of the object to be cleaned of the ultrasonic waves generated by the ultrasonic wave generation device is uniform.

Abstract translation: 一种超声波清洗装置，其通过使用施加了超声波的清洗液对附着在待清洁物体的表面上的污染物进行超声波清洗，具有将清洗液收集在一起的清洗液， 清洗液被支撑在清洗液中，超声波产生装置用于交替聚焦具有1至10MHz的频率的第一超声波和具有等于或低于第一超声波的频率的1/2的第二超声波朝向物体 要被清洁的焦点位置调节装置，调整焦点的焦点位置和待清洁物体的表面之间的距离以及移动超声波产生装置和支撑基底中的至少一个的移动装置， 由超声波发生装置产生的超声波对待清洁物体的表面的影响是均匀的。