公开(公告)号：US20170077042A1

公开(公告)日：2017-03-16

申请号：US15362258

申请日：2016-11-28

Applicant: Apic Yamada Corporation

Inventor： Kazuhiko KOBAYASHI ,  Keisuke SUDA

IPC: H01L23/552 ,  H01L21/3205 ,  H01L23/00 ,  H01L21/326

CPC classification number: H01L23/552 ,  B05B5/025 ,  B05B5/14 ,  B29C33/58 ,  B29C33/72 ,  G03F7/0002 ,  G03F7/164 ,  H01L21/3205 ,  H01L21/321 ,  H01L21/326 ,  H01L21/6715 ,  H01L24/19 ,  H01L24/24 ,  H01L24/48 ,  H01L24/76 ,  H01L24/82 ,  H01L24/85 ,  H01L25/0657 ,  H01L2224/32145 ,  H01L2224/451 ,  H01L2224/45144 ,  H01L2224/45147 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/8592 ,  H01L2225/06524 ,  H01L2225/06537 ,  H01L2225/06562 ,  H01L2924/00011 ,  H01L2924/12041 ,  H01L2924/1461 ,  H01L2924/181 ,  H01L2924/3025 ,  H05K1/11 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/01005

Abstract: Provided is a resist film forming device which uses an electrostatic spray device which is capable of forming a thin film with a uniform thickness on a workpiece. A resist film forming device (100), which forms a resist film (108) on a substrate by electrostatic spraying, comprises: a nozzle (102) which, upon application of a prescribed voltage, sprays liquid particles which form the raw material for a resist film (108) toward a substrate (105) having stepped portions (105a); a driving means (111) for causing relative movement of the substrate (105) or the nozzle (102); and a control means (110) for controlling such that the resist film (108) is formed on the substrate (105) having the stepped portions (105a) by the liquid particles.

Abstract translation: 提供了一种使用能够在工件上形成厚度均匀的薄膜的静电喷涂装置的抗蚀剂膜形成装置。 通过静电喷涂在基板上形成抗蚀剂膜（108）的抗蚀膜形成装置（100）包括：喷嘴（102），其在施加规定电压时喷射形成原料的液体颗粒 抗蚀剂膜（108）朝向具有台阶部（105a）的基板（105）。 用于引起所述基板（105）或所述喷嘴（102）的相对运动的驱动装置（111）; 以及控制装置（110），用于控制使得通过液体颗粒在具有台阶部分（105a）的基板（105）上形成抗蚀剂膜（108）。

公开(公告)号：US20150303151A1

公开(公告)日：2015-10-22

申请号：US14648587

申请日：2013-11-11

Applicant: APIC YAMADA CORPORATION

Inventor： Kazuhiko KOBAYASHI ,  Keisuke SUDA

IPC: H01L23/552 ,  H05K1/11 ,  H01L21/321 ,  H01L21/3205

CPC classification number: H01L23/552 ,  B05B5/025 ,  B05B5/14 ,  B29C33/58 ,  B29C33/72 ,  G03F7/0002 ,  G03F7/164 ,  H01L21/3205 ,  H01L21/321 ,  H01L21/326 ,  H01L21/6715 ,  H01L24/19 ,  H01L24/24 ,  H01L24/48 ,  H01L24/76 ,  H01L24/82 ,  H01L24/85 ,  H01L2224/32145 ,  H01L2224/451 ,  H01L2224/45144 ,  H01L2224/45147 ,  H01L2224/48091 ,  H01L2224/73265 ,  H01L2224/73267 ,  H01L2224/8592 ,  H01L2924/00011 ,  H01L2924/12041 ,  H01L2924/1461 ,  H01L2924/181 ,  H01L2924/3025 ,  H05K1/11 ,  H01L2924/00014 ,  H01L2924/00 ,  H01L2924/01005

Abstract: Provided is a resist film forming device which uses an electrostatic spray device which is capable of forming a thin film with a uniform thickness on a workpiece. A resist film forming device (100), which forms a resist film (108) on a substrate by electrostatic spraying, comprises: a nozzle (102) which, upon application of a prescribed voltage, sprays liquid particles which form the raw material for a resist film (108) toward a substrate (105) having stepped portions (105a); a driving means (111) for causing relative movement of the substrate (105) or the nozzle (102); and a control means (110) for controlling such that the resist film (108) is formed on the substrate (105) having the stepped portions (105a) by the liquid particles.

Abstract translation: 提供了一种使用能够在工件上形成厚度均匀的薄膜的静电喷涂装置的抗蚀剂膜形成装置。 通过静电喷涂在基板上形成抗蚀剂膜（108）的抗蚀膜形成装置（100）包括：喷嘴（102），其在施加规定电压时喷射形成原料的液体颗粒 抗蚀剂膜（108）朝向具有台阶部（105a）的基板（105）。 用于引起所述基板（105）或所述喷嘴（102）的相对运动的驱动装置（111）; 以及控制装置（110），用于控制使得通过液体颗粒在具有台阶部分（105a）的基板（105）上形成抗蚀剂膜（108）。