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公开(公告)号：US10209058B1
公开(公告)日：2019-02-19
申请号：US15914445
申请日：2018-03-07
Applicant: APPLEJACK 199 L.P.
Inventor： Wojciech J Walecki
Abstract: The present subject matter at-least provides an apparatus for characterization of a slab of a material. The apparatus comprises a plurality of frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material at at-least one location, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the plurality of OCT probes for simultaneously actuating one or more elements in each of said OCT probes to at-least cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference-pattern with respect to each of said OCT probes to thereby determine at least one of thickness and topography of the slab of the material.
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公开(公告)号：US10935777B2
公开(公告)日：2021-03-02
申请号：US16573923
申请日：2019-09-17
Applicant: APPLEJACK 199 L.P.
Inventor： Mihail Mihaylov , Wojciech J Walecki , Jae Ryu
Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.
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公开(公告)号：US11073372B2
公开(公告)日：2021-07-27
申请号：US16741610
申请日：2020-01-13
Applicant: APPLEJACK 199 L.P.
Inventor： Wojciech J Walecki
Abstract: The present subject matter at least provides an apparatus for characterization of a slab of a material. The apparatus comprises two or more frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the OCT probes for simultaneously actuating elements in each of the OCT probes to cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference pattern with respect to each of the OCT probes to thereby determine at least one of thickness and topography of the slab of the material. Further, in some embodiments, the slab of material may include a passivation layer. The apparatus may be configured to determine a thickness of the passivation layer.
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公开(公告)号：US10563975B1
公开(公告)日：2020-02-18
申请号：US16045434
申请日：2018-07-25
Applicant: APPLEJACK 199 L.P.
Inventor： Wojciech J Walecki
Abstract: According to an aspect of one or more embodiments, the present subject matter describes an apparatus for inspecting a slab of a material. The apparatus comprises a first and second low-coherence sensor configured to irradiate a first and second side of a slab of material with first light having a first polarization and second light having a second polarization, and thereafter configured to detect a reflection. A first polarizer is configured to allow reflected first light having the first polarization to pass through, and reject a second-light cross-talk portion having the second polarization. A second polarizer is configured to allow reflected second light having the second polarization to pass through, and reject a first-light cross-talk portion having the first polarization. Further, a computing-system is configured to receive signals representing the reflected first light and the reflected second light; and analyze the reflected first light and the reflected second light.
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Patent Agency Ranking
公开(公告)号：US11163144B2
公开(公告)日：2021-11-02
申请号：US17147393
申请日：2021-01-12
Applicant: APPLEJACK 199 L.P.
Inventor： Mihail Mihaylov , Wojciech J Walecki , Jae Ryu
Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.
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公开(公告)号：US11112234B2
公开(公告)日：2021-09-07
申请号：US16741632
申请日：2020-01-13
Applicant: APPLEJACK 199 L.P.
Inventor： Wojciech J Walecki
Abstract: The present subject matter at least provides an apparatus for inspecting a slab of material including a passivation layer. The apparatus includes a frequency-domain optical-coherence tomography (OCT) probe configured to irradiate the slab of material, and detect radiation reflected from the slab of material. The apparatus also includes a spectral-analysis module configured to analyze at least an interference pattern with respect to the OCT probe to thereby determine a thickness of the slab of the material. The apparatus also includes a thin-film gauge configure to determine a thickness of the passivation layer such that the determined thickness of the slab of material may be adjusted baes on the thickness of the passivation layer.
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公开(公告)号：US11105611B2
公开(公告)日：2021-08-31
申请号：US15980375
申请日：2018-05-15
Applicant: APPLEJACK 199 L.P.
Inventor： Wojciech J Walecki , Wei-Chun Hung , Raphael Morency
Abstract: A method and apparatus for non-contact measurement of stress in a thin-film deposited on a substrate is disclosed. The method may include positioning a substrate on a plurality of support-elements, the substrate having a thin-film deposited thereupon. A first-polynomial may be defined for representing a surface of the substrate that is in contact with the support elements. A second-polynomial may be determined based on an optimization determination of potential-energy acting upon the substrate. A finite-order polynomial may be created by calculating a product of the first and second polynomials to represent a shape of the surface of the substrate as a model of the surface. Thereafter, stress in the substrate may be determined based on fitting the model of the surface with a measured topographical data of the surface.
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公开(公告)号：US10551163B2
公开(公告)日：2020-02-04
申请号：US16277582
申请日：2019-02-15
Applicant: APPLEJACK 199 L.P.
Inventor： Wojciech J Walecki
Abstract: The present subject matter at-least provides an apparatus for characterization of a slab of a material. The apparatus comprises a plurality of frequency-domain optical-coherence tomography (FD-OCT) probes configured for irradiating the slab of material at at-least one location, and detecting radiation reflected from the slab of material or transmitted there-through. Further, a centralized actuation-mechanism is connected to the plurality of OCT probes for simultaneously actuating one or more elements in each of said OCT probes to at-least cause a synchronized detection of the radiation from the slab of material. A spectral-analysis module is provided for analyzing at least an interference pattern with respect to each of said OCT probes to thereby determine at least one of thickness and topography of the slab of the material.
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公开(公告)号：US10416430B2
公开(公告)日：2019-09-17
申请号：US15786911
申请日：2017-10-18
Applicant: APPLEJACK 199 L.P.
Inventor： Wojciech J Walecki , Mihail Mihaylov , Jae Ryu
Abstract: The present subject matter includes a method of focusing of an optical imaging apparatus. The method comprises causing illumination of an object using an illuminating beam to thereby cause generation of a scattered beam. A first set of luminous parameters are derived from a first detected position of a luminous representation formed by the scattered beam from the object. The illumination-beam is focused upon the object by triggering a movement of the object along an optical-axis in a first direction, the first direction being based a numerical-representation of the first set of luminous parameters. A second set of luminous parameters are derived from a second detected position of the luminous-representation of the object, the second detected position being related to the first detected position and the movement of the object. The focusing of the illumination beam is ceased based at-least on a numerical-representation of the second set of luminous parameters.
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