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公开(公告)号:US20190094012A1
公开(公告)日:2019-03-28
申请号:US16206467
申请日:2018-11-30
Applicant: Applejack 199 L.P.
Inventor: Wojciech Jan WALECKI
Abstract: Inspecting a multilayer sample may include receiving, at a beam splitter, light and splitting the light into first and second portions; combining, at the beam splitter, the first portion of the light after being reflected from a multilayer sample and the second portion of the light after being reflected from a reflector; receiving, at a computer-controlled system for analyzing Fabry-Perot fringes, the combined light and spectrally analyzing the combined light to determine a value of a total power impinging a slit of the system for analyzing Fabry-Perot fringes; determining an optical path difference (OPD); recording an interferogram that plots the value versus the OPD for the OPD; performing the previous acts of the method one or more additional times with a different OPD; and using the interferogram for each of the different OPDs to determine the thicknesses and order of the layers of the multilayer sample.
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公开(公告)号:US20190086191A1
公开(公告)日:2019-03-21
申请号:US16192626
申请日:2018-11-15
Applicant: Applejack 199 L.P.
Inventor: Wojciech Jan WALECKI
Abstract: A system for inspecting a slab of material may include an optical fiber, a broadband light source configured to emit light having wavelengths of 780-1800 nanometers over the optical fiber, a beam-forming assembly configured to receive the light over the optical fiber and direct the light toward a slab of material, the beam-forming assembly may be configured to maintain the position of one or more elements within the beam-forming assembly despite changes in environmental temperature; a computer-controlled etalon filter configured to receive the light over the optical fiber, filter the light, and direct the light over the optical fiber; and a computer-controlled spectrometer configured to receive the light over the optical fiber after the light has been filtered by the etalon filter and after the light has been reflected from or transmitted through the slab of material and spectrally analyze the light.
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公开(公告)号:US20200049488A1
公开(公告)日:2020-02-13
申请号:US16165451
申请日:2018-10-19
Applicant: APPLEJACK 199 L.P.
Inventor: Wojciech Jan WALECKI
IPC: G01B11/06
Abstract: Operations related to error reduction in measurement of samples of materials may include operations in which a first distance measurement may be obtained between a first probe and a first surface of a sample at a first time mark. Additionally, the operations may include obtaining a second distance measurement between a second probe and a second surface of the sample at a second time mark. Operations may further include obtaining a third distance measurement between the first probe and the first surface of a sample at a third time mark, and determining a fourth distance measurement between the first probe and the first surface of the sample at the second time mark. In addition, the operations may include determining a thickness of the sample, including an error term due to vibration of the sample. The error term may be discounted from the thickness of the sample.
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公开(公告)号:US20190120611A1
公开(公告)日:2019-04-25
申请号:US16174053
申请日:2018-10-29
Applicant: Applejack 199 L.P.
Inventor: Wojciech Jan WALECKI , Alexander PRAVDIVTSEV
Abstract: Inspecting a multilayer sample. In one example embodiment, a method may receiving, at a beam splitter, light and splitting the light into first and second portions; combining, at the beam splitter, the first portion of the light after being reflected from a multilayer sample and the second portion of the light after being reflected from a reflector; receiving, at a computer-controlled system for analyzing Fabry-Perot fringes, the combined light and spectrally analyzing the combined light to determine a value of a total power impinging a slit of the system for analyzing Fabry-Perot fringes; determining an optical path difference (OPD); recording an interferogram that plots the value versus the OPD for the OPD; performing the previous acts of the method one or more additional times with a different OPD; and using the interferogram for each of the different OPDs to determine the thicknesses and order of the layers of the multilayer sample.
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