公开(公告)号：US20150130354A1

公开(公告)日：2015-05-14

申请号：US14537037

申请日：2014-11-10

Applicant: APPLIED MATERIALS, INC.

Inventor： Gary LERAY ,  Valentin Nikolov TODOROW

IPC: H01J37/32

CPC classification number: H01J37/32165 ,  H01J37/32082 ,  H01J37/32146 ,  H01J37/32155 ,  H01J37/32183

Abstract: Methods and apparatus for frequency tuning in process chambers using dual level pulsed power are provided herein. In some embodiments, a method for frequency tuning may include providing a first pulsed power at a first frequency while the first frequency is adjusted to a second frequency, wherein the first frequency is a last known tuned frequency at the first pulsed power, storing the second frequency as the last known tuned frequency at the first pulsed power, providing a second pulsed power at a third frequency while the third frequency is adjusted to a fourth frequency, wherein the first pulsed power and the second pulsed power are different and non-zero, and wherein the third frequency is a last known tuned frequency at the second pulsed power, and storing the fourth frequency as the last known tuned frequency at the second pulsed power.

Abstract translation: 本文提供了使用双电平脉冲功率的处理室中频率调谐的方法和装置。 在一些实施例中，用于频率调谐的方法可以包括：在第一频率被调整到第二频率的同时提供第一频率的第一脉冲功率，其中第一频率是第一脉冲功率处的最后已知的调谐频率， 频率作为第一脉冲功率处的最后已知的调谐频率，在第三频率被调整到第四频率时提供第二脉冲功率，其中第一脉冲功率和第二脉冲功率不同且不为零， 并且其中所述第三频率是所述第二脉冲功率处的最后已知的调谐频率，并且将所述第四频率存储为所述第二脉冲功率处的最后已知的调谐频率。