公开(公告)号：US20240062990A1

公开(公告)日：2024-02-22

申请号：US17891028

申请日：2022-08-18

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Sean Kashy ,  Yehuda Zur

IPC: H01J37/317 ,  H01L21/285 ,  C23C16/48 ,  C23C16/16

CPC classification number: H01J37/3178 ,  H01L21/28568 ,  C23C16/486 ,  C23C16/16 ,  H01J2237/026 ,  H01J2237/006

Abstract: A system for depositing material over a sample in a localized region of the sample, the system including: a vacuum chamber; a thermal mass disposed outside the vacuum chamber; a sample support configured to hold a sample within the vacuum chamber during a sample evaluation process; a charged particle beam column configured to direct a charged particle beam into the vacuum chamber toward the sample such that the charged particle beam collides with the sample in a deposition region; a gas injection system configured to deliver a process gas to the deposition region of the sample; and a thermal isolation shield spaced apart from and disposed between the gas injection system and the sample, wherein the thermal isolation shield has a high thermal conductivity and a low emissivity and is thermally coupled to the thermal mass to transfer heat radiated from the gas injection system to the thermal mass.