公开(公告)号：US20240363308A1

公开(公告)日：2024-10-31

申请号：US18139999

申请日：2023-04-27

Applicant: National Technology & Engineering Solutions of Sandia, LLC

Inventor： Jeffrey Daniel ENGERER ,  Nicholas Andrew ANDERSON ,  Lindsay LAWLESS

IPC: H01J37/32 ,  G01N25/00 ,  H01J37/16 ,  H01J37/18 ,  H05B3/00

CPC classification number: H01J37/32082 ,  G01N25/00 ,  H01J37/165 ,  H01J37/18 ,  H01J37/32715 ,  H05B3/0033 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/16 ,  H01J2237/24585

Abstract: An apparatus for thermal ablation testing is provided. The apparatus comprises a chamber; an optically transparent window in the chamber; a sample holder inside the chamber; a test sample in the sample holder; a number of bare-wire thermocouples connected to the test sample, wherein the thermocouples generate temperature data in the form of voltage; a mass balance inside the chamber, wherein the mass balance is configured to hold the sample holder and dynamically detect changes in mass of the test sample; an external radiant heat source configured to heat the test sample through the window; a plasma source configured to generate a number of atomic species in the chamber; and a pyrometer directed at the test sample.

公开(公告)号：US20240258077A1

公开(公告)日：2024-08-01

申请号：US18634508

申请日：2024-04-12

Applicant: NANOTECH INC.

Inventor： Dong Ho CHA

IPC: H01J37/32 ,  C23C16/50

CPC classification number: H01J37/32504 ,  C23C16/50 ,  H01J37/32183 ,  H01J37/32568 ,  H01J37/32651 ,  H01J37/32834 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/332

Abstract: The present invention relates to a technology for increasing the reliability of measurement by preventing the contamination of a self-plasma chamber provided in order to monitor a deposition operation performed in a process chamber, and has a shielding means capable of preventing an inflow of negative electrode material, which is generated by a sputtering phenomenon, into a discharge chamber when a positive charge of plasma, which is generated in the self-plasma chamber, collides with a negative electrode.

公开(公告)号：US20240062990A1

公开(公告)日：2024-02-22

申请号：US17891028

申请日：2022-08-18

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Sean Kashy ,  Yehuda Zur

IPC: H01J37/317 ,  H01L21/285 ,  C23C16/48 ,  C23C16/16

CPC classification number: H01J37/3178 ,  H01L21/28568 ,  C23C16/486 ,  C23C16/16 ,  H01J2237/026 ,  H01J2237/006

Abstract: A system for depositing material over a sample in a localized region of the sample, the system including: a vacuum chamber; a thermal mass disposed outside the vacuum chamber; a sample support configured to hold a sample within the vacuum chamber during a sample evaluation process; a charged particle beam column configured to direct a charged particle beam into the vacuum chamber toward the sample such that the charged particle beam collides with the sample in a deposition region; a gas injection system configured to deliver a process gas to the deposition region of the sample; and a thermal isolation shield spaced apart from and disposed between the gas injection system and the sample, wherein the thermal isolation shield has a high thermal conductivity and a low emissivity and is thermally coupled to the thermal mass to transfer heat radiated from the gas injection system to the thermal mass.

公开(公告)号：US11664207B2

公开(公告)日：2023-05-30

申请号：US16531782

申请日：2019-08-05

Applicant: TOKYO ELECTRON LIMITED

Inventor： Masato Shinada ,  Hiroyuki Toshima

IPC: C23C14/34 ,  H01J37/34 ,  C23C14/50 ,  H01L21/67 ,  H01L21/677

CPC classification number: H01J37/3417 ,  C23C14/34 ,  C23C14/505 ,  H01J37/3429 ,  H01J37/3435 ,  H01J37/3447 ,  H01J2237/026 ,  H01J2237/20214 ,  H01J2237/20228 ,  H01J2237/332 ,  H01L21/67167 ,  H01L21/67196 ,  H01L21/67207 ,  H01L21/67742

Abstract: A film-forming apparatus comprises: a processing chamber defining a processing space, a first sputter-particle emitter and a second sputter-particle emitter having targets, respectively, from which sputter-particles are emitted in different oblique directions in the processing space, a sputter-particle blocking plate having a passage hole through which the sputter particles emitted from the first sputter-particle emitter and the second sputter-particle emitter pass, a substrate support configured to support a substrate and provided at a side opposite the first sputter-particle emitter and the second sputter-particle emitter with respect to the sputter-particle blocking plate in the processing space, a substrate moving mechanism configured to linearly move the substrate supported on the substrate support, and a controller configured to control the emission of sputter-particles from the first sputter-particle emitter and the second sputter-particle emitter while controlling the substrate moving mechanism to move the substrate linearly.

公开(公告)号：US09653261B2

公开(公告)日：2017-05-16

申请号：US14400569

申请日：2013-05-14

Applicant: MAPPER LITHOGRAPHY IP B.V.

Inventor： Alexander Hendrik Vincent Van Veen ,  Willem Henk Urbanus

IPC: G03B27/52 ,  H01J37/317 ,  H01J37/09 ,  H01J37/30 ,  B82Y10/00 ,  B82Y40/00

CPC classification number: H01J37/09 ,  B82Y10/00 ,  B82Y40/00 ,  H01J37/147 ,  H01J37/3007 ,  H01J37/302 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/002 ,  H01J2237/026 ,  H01J2237/0262 ,  H01J2237/0264 ,  H01J2237/16 ,  H01J2237/182 ,  H01J2237/188

Abstract: The invention relates to a charged particle lithography system for exposing a target. The system includes a charged particle beam generator for generating a charged particle beam; an aperture array (6) for forming a plurality of beamlets from the charged particle beam; and a beamlet projector (12) for projecting the beamlets onto a surface of the target. The charged particle beam generator includes a charged particle source (3) for generating a diverging charged particle beam; a collimator system (5a,5b,5c,5d; 72;300) for refracting the diverging charged particle beam; and a cooling arrangement (203) for removing heat from the collimator system, the cooling arrangement comprising a body surrounding at least a portion of the collimator system.

公开(公告)号：US09572240B2

公开(公告)日：2017-02-14

申请号：US15107824

申请日：2014-12-12

Applicant: USHIO DENKI KABUSHIKI KAISHA

Inventor： Gota Niimi ,  Hironobu Yabuta

IPC: H05G2/00 ,  F21V14/04 ,  H01J37/16 ,  H01J37/32

CPC classification number: H05G2/003 ,  F21V14/04 ,  G03F7/70033 ,  G03F7/70916 ,  H01J37/16 ,  H01J37/3244 ,  H01J37/3266 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/028 ,  H05G2/008

Abstract: Disclosed herein a light source apparatus that is capable of suppressing a light transmission rate of a debris trap to be lowered and a reflection rate in a light condenser mirror to be lowered. In the light source apparatus, a shielding member is provided having an aperture is provided in front of a stationary type foil trap to limit a solid angle of light emitted from a high temperature plasma. Furthermore, the stationary type foil trap is provided with a driving mechanism to allow the foil trap to be revolved such that an adhesion part of the debris of the foil trap is deviated from a position of the foil trap facing the aperture.

Abstract translation: 这里公开了一种光源装置，其能够抑制要降低的碎屑陷阱的光透射率和降低聚光镜中的反射率。 在光源装置中，设置有在固定型箔捕获器的前方设置有孔径以限制从高温等离子体发射的光的立体角的屏蔽构件。 此外，固定式箔捕获器设置有驱动机构，以允许箔捕获器旋转，使得箔捕获器的碎屑的粘附部分偏离面向孔的箔捕获器的位置。

公开(公告)号：US20160056024A1

公开(公告)日：2016-02-25

申请号：US14522066

申请日：2014-10-23

Applicant: APPLIED MATERIALS, INC.

Inventor： WILLIAM JOHANSON ,  FUHONG ZHANG ,  ADOLPH MILLER ALLEN ,  YU LIU

IPC: H01J37/34 ,  C23C14/34

CPC classification number: H01J37/347 ,  C23C14/3492 ,  C23C14/50 ,  C23C14/54 ,  C23C14/542 ,  H01J37/32623 ,  H01J37/32733 ,  H01J2237/026

Abstract: Embodiments of improved methods and apparatus for maintaining low non-uniformity over the course of the life of a target are provided herein. In some embodiments, a method of processing a substrate in a physical vapor deposition chamber includes: disposing a substrate atop a substrate support having a cover ring that surrounds the substrate support such that an upper surface of the substrate is positioned at a first distance above an upper surface of the cover ring; sputtering a source material from a target disposed opposite the substrate support to deposit a film atop the substrate while maintaining the first distance; and lowering the substrate support with respect to the cover ring and sputtering the source material from the target to deposit films atop subsequent substrates over a life of the target.

Abstract translation: 本文提供了用于在目标寿命期间保持低不均匀性的改进方法和装置的实施例。 在一些实施例中，在物理气相沉积室中处理衬底的方法包括：在衬底支撑件顶部设置衬底，衬底支撑件具有围绕衬底支撑件的覆盖环，使得衬底的上表面位于第一距离 盖环的上表面; 从与衬底支撑件相对布置的靶溅射源材料，以在保持第一距离的同时在衬底上沉积膜; 以及相对于所述盖环降低所述基板支撑件并从所述靶溅射所述源材料以在所述目标的寿命期间将膜沉积在随后的基板上。

公开(公告)号：US09196451B2

公开(公告)日：2015-11-24

申请号：US13353032

申请日：2012-01-18

Applicant: Shouyin Zhang ,  Noel Smith ,  Walter Skoczylas

Inventor： Shouyin Zhang ,  Noel Smith ,  Walter Skoczylas

IPC: H01J27/00 ,  H01J37/08 ,  H01J27/16

CPC classification number: H01J37/08 ,  H01J27/16 ,  H01J2237/002 ,  H01J2237/006 ,  H01J2237/026 ,  H01J2237/038 ,  H01J2237/0815 ,  H01J2237/31749

Abstract: An inductively coupled plasma source for a focused charged particle beam system includes a dielectric liquid that insulates and cools the plasma chamber. A flow restrictor at an electrical potential that is a large fraction of the plasma potential reducing arcing because the voltage drop in the gas occurs primarily at relative high pressure.

Abstract translation: 用于聚焦带电粒子束系统的电感耦合等离子体源包括绝缘和冷却等离子体室的电介质液体。 由于气体中的电压降主要发生在相对较高的压力下，电流下的流量限制器是等离子体电位降低电弧的大部分。

公开(公告)号：US20150028225A1

公开(公告)日：2015-01-29

申请号：US14337470

申请日：2014-07-22

Applicant: Carl Zeiss Microscopy GmbH

Inventor： Lorenz Lechner

IPC: H01J37/20 ,  B32B38/10 ,  B32B38/00

CPC classification number: H01J37/20 ,  B32B38/0004 ,  B32B38/10 ,  H01J2237/026 ,  H01J2237/31745 ,  Y10T156/1052

Abstract: A method for manufacturing a TEM-lamella is disclosed. The method includes: disposing a self-supporting protective structure on a surface of a substrate; bonding the protective structure to the substrate; cutting out a lamella from the substrate using a particle beam so that the lamella remains bonded to at least a portion of the protective structure; fastening a first tool to the lamella; and moving away the lamella from a residual portion of the substrate by moving the first tool relative to the substrate.

Abstract translation: 公开了一种制造TEM片的方法。 该方法包括：在衬底的表面上设置自支撑保护结构; 将保护结构粘合到基底上; 使用粒子束从衬底切出薄片，使得薄片保持结合到保护结构的至少一部分; 将第一工具固定到薄片上; 并且通过相对于基底移动第一工具从薄片的剩余部分移开薄片。

公开(公告)号：US20140353518A1

公开(公告)日：2014-12-04

申请号：US14291766

申请日：2014-05-30

Applicant: SEN CORPORATION

Inventor： Masateru Sato

IPC: H01J27/02

CPC classification number: H01J37/08 ,  H01J27/024 ,  H01J37/3171 ,  H01J2237/0213 ,  H01J2237/022 ,  H01J2237/026 ,  H01J2237/032 ,  H01J2237/036 ,  H01J2237/038 ,  H01J2237/08 ,  H01J2237/31701

Abstract: An insulation structure provided among a plurality of electrodes for extraction of an ion beam from a plasma generating section is provided. The insulation structure includes an insulation member including a first part connected to a first electrode and a second part connected to a second electrode and configured to support the first electrode to the second electrode, a first cover surrounding at least a part of the first part to protect the first part from contamination particles, and a second cover surrounding at least a part of the second part to protect the second part from contamination particles. At least one of the first part and the second part is made of a machinable ceramic or a porous ceramic.

Abstract translation: 提供了用于从等离子体产生部分提取离子束的多个电极之间设置的绝缘结构。 绝缘结构包括绝缘构件，该绝缘构件包括连接到第一电极的第一部分和连接到第二电极的第二部分，并被配置为将第一电极支撑到第二电极，第一盖围绕第一部分的至少一部分， 保护第一部分免受污染颗粒，以及围绕第二部分的至少一部分的第二盖，以保护第二部分免受污染颗粒。 第一部分和第二部分中的至少一个由可机加工的陶瓷或多孔陶瓷制成。