公开(公告)号：US09747092B2

公开(公告)日：2017-08-29

申请号：US14711641

申请日：2015-05-13

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori

IPC: G06F9/445 ,  H04L29/08 ,  G05B15/02 ,  G05B19/042

CPC classification number: G06F8/61 ,  G05B15/02 ,  G05B19/0426 ,  G05B2219/13164 ,  H04L67/10

Abstract: A substrate processing system includes a main controller, a module controller connected to the main controller, the module controller controlling a device on the basis of a command from the main controller, and a programmable logic controller connected to the module controller, wherein the module controller automatically downloads, from the main controller, module controller software to be used for control of the module controller, PLC software to be used for control of the programmable logic controller, and an automatic transfer software for automatically transferring the PLC software to the programmable logic controller.

公开(公告)号：US20250132140A1

公开(公告)日：2025-04-24

申请号：US18999398

申请日：2024-12-23

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori

IPC: H01J37/32

Abstract: Examples of a method of manufacturing a semiconductor device includes, in treatment of a substrate with the use of a plasma, acquiring an RF waveform from a reactor through an Ether CAT in real time, the RF waveform being a waveform relating to an electric power to be applied to an RF plate, and adjusting, by using the RF waveform, the electric power to be applied to the RF plate.

公开(公告)号：US10331115B2

公开(公告)日：2019-06-25

申请号：US15362363

申请日：2016-11-28

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori

IPC: G05B21/02 ,  G06F16/16 ,  H01J37/32

Abstract: A substrate processing system includes a module controller that creates a log file in which a data count corresponding to timing of sampling operation data is added to the operation data of a module sampled in a predetermined sampling period, a main control apparatus that is connected to the module controller, receives the log file and start time information indicating a time at which collection of the operation data included in the log file starts from the module controller, converts the data count to a time stamp from the start time information and creates a data file including the time stamp and the operation data, and a host computer that receives the data file provided from the main control apparatus.

公开(公告)号：US12217946B2

公开(公告)日：2025-02-04

申请号：US17499790

申请日：2021-10-12

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori

IPC: H01J37/32

Abstract: Examples of a method of manufacturing a semiconductor device includes, in treatment of a substrate with the use of a plasma, acquiring an RF waveform from a reactor through an Ether CAT in real time, the RF waveform being a waveform relating to an electric power to be applied to an RF plate, and adjusting, by using the RF waveform, the electric power to be applied to the RF plate.

公开(公告)号：US09778941B2

公开(公告)日：2017-10-03

申请号：US14444107

申请日：2014-07-28

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori

IPC: G05B19/418 ,  H04L29/06 ,  G06F9/445

CPC classification number: G06F9/44505 ,  G05B19/41845 ,  H04L63/10

Abstract: A substrate processing system includes a main control unit having a configuration file in which ID information and detail information about devices for processing a substrate is recorded, the detail information includes information needed for controlling the devices, and a module controller having a list file obtained by converting the configuration file into a readable form, the module controller controlling the devices described in the list file on the basis of instructions from the main control unit. The module controller automatically adds, to the list file, ID information and detail information about a new device newly connected to the module controller to establish a condition under which the new device can be controlled.

公开(公告)号：US11940785B2

公开(公告)日：2024-03-26

申请号：US17498999

申请日：2021-10-12

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori

IPC: G05B23/02 ,  H01L21/67

CPC classification number: G05B23/0283 ,  G05B23/0235 ,  G05B23/0272 ,  H01L21/67017 ,  H01L21/67253 ,  H01L21/67011

Abstract: Examples of a predictive maintenance method includes determining whether analog data measured in a substrate treatment that has used a recipe exceeds an allowable threshold which corresponds to the recipe and has been determined beforehand, and notifying, in a case where it is determined that the analog data exceeds the allowable threshold in the determination, a user that a relating module which has been associated with the analog data beforehand has deteriorated.

公开(公告)号：US20230203654A1

公开(公告)日：2023-06-29

申请号：US18147631

申请日：2022-12-28

Applicant: ASM IP Holding, B.V.

Inventor： Paridhi Gupta ,  Taku Omori ,  Cheuk Li ,  Aadil Vora ,  Todd Dunn

IPC: C23C16/455 ,  C23C16/52

CPC classification number: C23C16/45544 ,  C23C16/52 ,  C23C16/45587

Abstract: Apparatus and method for semiconductor substrate processing are presented. For devices such as valves used for semiconductor substrate processing especially a process like ALD, there is a need to monitor and control the exact time taken from the signal to open and close the valves so that delay times may be controlled. In an embodiment, an apparatus comprising a reactor, a valve, a process controller and a valve monitor system is presented. The process controller may be operationally connected to the valve and may be provided with a memory. The sensors may be either electrical or optical sensors.

公开(公告)号：US08790743B1

公开(公告)日：2014-07-29

申请号：US13784388

申请日：2013-03-04

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori ,  Naoki Inoue ,  Wataru Adachi

IPC: C23C16/52

CPC classification number: C23C16/52 ,  C23C16/45536 ,  H01J37/32146 ,  H01J37/32935 ,  H01J37/32981 ,  H01J37/3299

Abstract: A method for processing a substrate in a reactor by pulsing RF power, includes: applying RF power in pulses in the reactor to process the substrate; monitoring data from the reactor indicative of anomalous pulses of RF power, including data from a photo sensor equipped in the reactor; counting the number of anomalous pulses of RF power in the monitored data; determining whether or not the number of anomalous pulses of RF power is acceptable; and initiating a pre-designated sequence if the number of anomalous pulses of RF power is determined to be unacceptable.

Abstract translation: 一种用于通过脉冲RF功率来处理反应器中的衬底的方法，包括：在反应器中以脉冲施加RF功率以处理衬底; 监测来自反应堆的指示RF功率的异常脉冲的数据，包括来自安装在反应器中的光传感器的数据; 对监测数据中的RF功率的异常脉冲数进行计数; 确定RF功率的异常脉冲数是否可接受; 以及如果RF功率的异常脉冲数被确定为不可接受，则启动预定序列。

公开(公告)号：US20220122808A1

公开(公告)日：2022-04-21

申请号：US17499790

申请日：2021-10-12

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori

IPC: H01J37/32

Abstract: Examples of a method of manufacturing a semiconductor device includes, in treatment of a substrate with the use of a plasma, acquiring an RF waveform from a reactor through an Ether CAT in real time, the RF waveform being a waveform relating to an electric power to be applied to an RF plate, and adjusting, by using the RF waveform, the electric power to be applied to the RF plate.

公开(公告)号：US20220121196A1

公开(公告)日：2022-04-21

申请号：US17498999

申请日：2021-10-12

Applicant: ASM IP Holding B.V.

Inventor： Taku Omori

IPC: G05B23/02 ,  H01L21/67

Abstract: Examples of a predictive maintenance method includes determining whether analog data measured in a substrate treatment that has used a recipe exceeds an allowable threshold which corresponds to the recipe and has been determined beforehand, and notifying, in a case where it is determined that the analog data exceeds the allowable threshold in the determination, a user that a relating module which has been associated with the analog data beforehand has deteriorated.