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公开(公告)号：US11094505B2
公开(公告)日：2021-08-17
申请号：US15644535
申请日：2017-07-07
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki
Abstract: Examples of a substrate processing apparatus include a signal transmitter that outputs a command signal, and an RF generator that receives the command signal, starts to output traveling wave power simultaneously with a first transition of the command signal, measures a delay time, which is a time period after the first transition of the command signal until a predetermined power-applied state is achieved on a receiving side of the traveling wave power, and stops outputting the traveling wave power when the delay time elapses after a second transition of the command signal.
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公开(公告)号：US12218269B2
公开(公告)日：2025-02-04
申请号：US17172082
申请日：2021-02-10
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki
Abstract: Examples of a substrate processing apparatus includes a chamber configured to contain a stage, a light receiving device configured to receive light inside the chamber, and a substrate transfer apparatus that includes a shaft and a rotation arm configured to rotate with rotation of the shaft and is configured to supply a plurality of light beams having different amounts of light to the light receiving device.
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公开(公告)号：US20220415701A1
公开(公告)日：2022-12-29
申请号：US17847470
申请日：2022-06-23
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki
IPC: H01L21/687 , B25J11/00 , B25J15/00 , H01J37/32
Abstract: A substrate processing apparatus is disclosed. An exemplary substrate processing apparatus includes a reaction chamber; a susceptor plate positioned within the reaction chamber, constructed and arranged to support a substrate, and provided with one or more holes; a substrate lift mechanism comprising: a plurality of lift pins to support the substrate; and a lift pin support member to move the lift pins; in a vertical direction through the one or more holes; a substrate transfer robot provided with one or more robotic arms to transfer the substrate to a position above the lift pins; and a gas supply unit constructed and arranged to face the susceptor plate; wherein the gas supply unit is constructed and arranged to move in the vertical direction thereby positioning the gas supply unit in a processing position in the reaction chamber.
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公开(公告)号：US20210257509A1
公开(公告)日：2021-08-19
申请号：US17172082
申请日：2021-02-10
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki
IPC: H01L31/18
Abstract: Examples of a substrate processing apparatus includes a chamber configured to contain a stage, a light receiving device configured to receive light inside the chamber, and a substrate transfer apparatus that includes a shaft and a rotation arm configured to rotate with rotation of the shaft and is configured to supply a plurality of light beams having different amounts of light to the light receiving device.
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Patent Agency Ranking
公开(公告)号：US20190013181A1
公开(公告)日：2019-01-10
申请号：US15644535
申请日：2017-07-07
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki
IPC: H01J37/32
Abstract: Examples of a substrate processing apparatus include a signal transmitter that outputs a command signal, and an RF generator that receives the command signal, starts to output traveling wave power simultaneously with a first transition of the command signal, measures a delay time, which is a time period after the first transition of the command signal until a predetermined power-applied state is achieved on a receiving side of the traveling wave power, and stops outputting the traveling wave power when the delay time elapses after a second transition of the command signal.
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公开(公告)号：US20250126924A1
公开(公告)日：2025-04-17
申请号：US19001665
申请日：2024-12-26
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki
Abstract: Examples of a substrate processing apparatus includes a chamber configured to contain a stage, a light receiving device configured to receive light inside the chamber, and a substrate transfer apparatus that includes a shaft and a rotation arm configured to rotate with rotation of the shaft and is configured to supply a plurality of light beams having different amounts of light to the light receiving device.
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公开(公告)号：US11823873B2
公开(公告)日：2023-11-21
申请号：US16780505
申请日：2020-02-03
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki
IPC: H01L21/67 , H01J37/32 , H01L21/687 , H05B6/06 , H05B6/10
CPC classification number: H01J37/32724 , H01L21/67248 , H01L21/68764 , H01L21/68771 , H01L21/68792 , H05B6/06 , H05B6/107 , H01J2237/20214 , H01J2237/24585
Abstract: Examples of a substrate processing apparatus includes a substrate carrier apparatus including a shaft, at least one carrier arm that is fixed to the shaft and rotates as the shaft rotates, and at least one thermometer fixed to the carrier arm, a susceptor, a heater that heats the susceptor, a temperature regulator that controls the heater, and a control unit that acquires a measured temperature, which is a surface temperature, of the susceptor obtained by the thermometer by bringing the carrier arm close to the susceptor and control the temperature regulator.
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公开(公告)号：US20230326783A1
公开(公告)日：2023-10-12
申请号：US18131552
申请日：2023-04-06
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki , Takahiro Murakami
IPC: H01L21/687 , H01L21/67 , B25J11/00 , B25J13/08
CPC classification number: H01L21/68707 , B25J13/08 , B25J11/0095 , H01L21/67259
Abstract: A substrate processing apparatus is disclosed. Exemplary substrate processing apparatus includes a plurality of reaction chambers; a plurality of susceptors disposed within the reaction chambers and configured to support a substrate; a substrate transfer robot disposed within the substrate processing apparatus, comprising: a rotation arm comprising a plurality of arms, the arms configured to transfer the substrate between the reaction chambers; and a rotation shaft connected to the plurality of arms; a motor configured to rotate the rotation shaft; a motor controller configured to drive the motor; and a first sensor with a portion disposed on at least one of the plurality of arms.
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公开(公告)号：US10777445B2
公开(公告)日：2020-09-15
申请号：US16212555
申请日：2018-12-06
Applicant: ASM IP Holding B.V.
Inventor： Kazuhiro Nishiwaki
IPC: H01L21/687 , H01L21/67 , H01L21/677 , H01L21/68
Abstract: Examples of a substrate processing apparatus includes a susceptor, a plurality of three or more susceptor pins configured to protrude from an upper surface of the susceptor or be positioned below the upper surface of the susceptor, a transfer arm configured to provide a substrate onto the susceptor or take out a substrate on the susceptor, a plurality of sensors configured to individually detect contact or non-contact of a substrate with the plurality of susceptor pins individually, and a control device configured to monitor a detection result of the plurality of sensors and determine abnormality when an order of variations in a contact state of the substrate with the plurality of susceptor pins is not a predetermined order or when a time difference between the variations in the contact state of the substrate with the plurality of susceptor pins is not within a predetermined time difference range.
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