公开(公告)号：US20150042976A1

公开(公告)日：2015-02-12

申请号：US14526023

申请日：2014-10-28

Applicant: ASML Holding N.V.

Inventor： Darya AMIN-SHAHIDI

IPC: G03F7/20

CPC classification number: G03F7/70725 ,  G03F7/707

Abstract: In a lithographic apparatus, slippage of a patterning device is substantially eliminated during movement of a patterning device stage by providing a magnetostrictive actuator to apply an accelerating force to the patterning device to compensate for forces that would otherwise tend to cause slippage when the patterning device stage moves.

Abstract translation: 在光刻设备中，通过提供磁致伸缩致动器来在图案形成装置台的移动期间基本上消除了图案形成装置的滑动，以将图形装置的加速力施加到图案形成装置以补偿当图案形成装置台阶上将趋于导致滑动的力 移动。